Abstract:
In the production of crops in agriculture, horticulture, etc., due to factors such as damages caused by harmful bugs and the like still being significant and the emergence of harmful bugs resistant to existing drugs, there has been a demand for the development of a new agricultural/horticultural harmful-bug control agent. Further, in rearing of animals such as livestock and companion animals (pets), since infection by a parasite causes significant pain to animals and leads to enormous economic loss in livestock, there has been a demand for the development of a new external parasite control agent for animals and a new internal parasite control agent for animals. The present invention provides: a compound represented by general formula (1) {in the formula, X represents CH
Abstract:
In the production of agricultural and horticultural crops, etc., damages caused by pest insects, etc. are still significant, and, therefore, the development of novel pest control agents has been required due to factors such as the emergence of pest insects resistant to conventional chemicals. The present invention provides a compound represented by general formula (1) [wherein: X and Y represent an oxygen atom or a sulfur atom; Z represents a hydroxyl group, etc.; R
Abstract:
In the production of agricultural and horticultural crops, etc., damages caused by pest insects, etc. are still significant, and, therefore, the development of novel pest control agents has been required due to factors such as the emergence of pest insects resistant to conventional chemicals. The present invention provides a compound represented by general formula (1) [wherein: X and Y represent an oxygen atom or a sulfur atom; Z represents a hydroxyl group, etc.; R
Abstract:
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition capable of forming a fine pattern by photolithography and forming an insulating film without performing heat treatment at >200°C and having no problem that a carrier is trapped and the degree of charge transfer is reduced when used as a gate insulating film of an organic thin film transistor. SOLUTION: The photosensitive resin composition contains a polysiloxane compound having a unit represented by general formulae (1) to (4) and a photo radical generator. In the formula (1), R 1 denotes a hydrogen atom or a methyl group and R 2 denotes a 1-5C alkylene group which may have a substituted alkyl group. In the formula (2), R 3 denotes a hydrogen atom or a 1-4C alkyl group. In the formula (3), R 4 denotes a 1-6C alkyl group or a 5 or 6C cycloalkyl group. In the formula (4), R 5 denotes a hydrogen atom or a 1-4C alkyl group. COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a pigment functional material improved in an optical amplification function and excellent in stability and durability. SOLUTION: This pigment functional material is obtained by intercalating the organic pigment with a deoxyribonucleic acid and/or deoxyribonucleic acid salt, and dispersing the intercalated pigment material in a polymer matrix. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a silicon-containing curable composition which is excellent in crack resistance, hardness and outgassing property and useful for an electrical/electronic material and the like.SOLUTION: A silicon-containing curable composition contains a prepolymer (A) containing two or more Si-H groups in one molecule, obtained by bringing one or more cyclic siloxane compounds (α) represented by formula (1) and a specific divinyl compound or isocyanurate compound into a hydrosilylation reaction, and a specific vinyl group-terminated or epoxy group-terminated polysiloxane-containing polymer.