Abstract:
An epoxy resin curable composition for a prepreg, comprising the following components (A) to (E): (A): a polyamide compound having a structure derived from an aromatic diamine including a phenolic hydroxyl group, the aromatic diamine having the phenolic hydroxyl group in a position adjacent to an amino group; (B): an epoxy resin; (C): an epoxy resin curing agent; (D): a filler; and (E): a solvent.
Abstract:
An epoxy resin composition is disclosed which contains (A) 1-10 weight % of a polyvalent epoxy compound, (B) 1-10 weight % of a curing agent selected among cyanate compounds and benzoxazine compounds, (C) 0.1-5 weight % of a polyvalent phenolic compound and (D) 80-97.9 weight % of a spherical filler having an elastic modulus of 300 GPa or more. The epoxy resin composition has a void fraction of 3% or less and a high elastic modulus.
Abstract:
PROBLEM TO BE SOLVED: To provide an optical fiber in which excellent heat resistance and productivity are provided and a microbend loss is suppressed even in a high temperature environment.SOLUTION: An optical fiber 1 has a covering layer 5 formed by crosslinking an energy curable resin composition containing a silicon compound on the outer periphery of a glass fiber 4 made of a core part 2 and a cladding part 3. The silicon compound contains a compound (A) represented by a specific general formula and a compound (B) represented by another specific general formula, and the content of the compound (B) relative to 100 parts by mass of the total amount of the compound (A) and compound (B) is in a range of 10-30 parts by mass.
Abstract:
PROBLEM TO BE SOLVED: To provide a manufacturing method capable of forming an optical waveguide with an optical path conversion function directly on a substrate by a simple process, the optical waveguide allowing fine processing and having high surface accuracy, and to provide the optical waveguide manufactured by the manufacturing method.SOLUTION: In a method for manufacturing an optical waveguide whose clad part is formed of a positive photosensitive resin, an inclined surface which is formed by film loss in a process of developing the positive photosensitive resin is set to an optical path conversion mirror surface. Preferably, a polysiloxane-based positive photosensitive resin is used as the positive photosensitive resin, and a core part surrounded by the clad part is formed of a negative photosensitive resin.
Abstract:
PROBLEM TO BE SOLVED: To provide a curable composition capable of providing a cured film which is free from surface tackiness, is excellent in heat resistance, and hardly causes crack even when used at high temperature for a long time.SOLUTION: The silicon-containing curable resin composition includes: an epoxysiloxane compound having at least two epoxy-containing groups and a group represented by general formula (1) in one molecule as a component (A); an epoxy siloxane compound having 1-10 silicon atoms and at least two epoxy-containing group in one molecule as a component (B); and an epoxy curable compound as a component (C). In general formula (1), R-R, which may be the same or different, each represent 1-4C alkyl or 6-10C aryl, and a represents an integer of 20-10,000.
Abstract:
PROBLEM TO BE SOLVED: To provide a compound which gives an epoxy resin composition excellent effects in terms of properties of toughness, a high glass transition temperature and a low thermal linear expansion coefficient. SOLUTION: The compound is obtained by reacting (a) an epoxy compound expressed by formula (1) with (b) a modified rubber. The epoxy resin composition contains the compound, has high adhesivity, a low thermal linear expansion coefficient, low hygroscopicity, a high glass transition temperature and excellent properties in toughness such as in tensile properties and elongation. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a curable composition which has excellent heat resistance, toughness and adhesion.SOLUTION: The curable composition contains: (A) a compound having at least two vinyl groups in the molecule; (B) a compound having at least two Si-H groups in the molecule; and (C) a hydrosilylating catalyst, and the compound in the (A) component and/or the compound in the (B) component is the compound having groups expressed by general formula (1) (in the formula, Xdenotes a residue obtained by removing two hydroxyl groups from a 2 to 25C dihydroxyl compound).