公开(公告)号：AT534706T

公开(公告)日：2011-12-15

申请号：AT06713654

申请日：2006-02-14

Applicant: ADEKA CORP

Inventor： OMI JINICHI ,  SAKAMAKI KOICHI ,  MORITA HIROSHI ,  SAITO MASAKO

IPC: C08L83/14 ,  C08G77/12 ,  C08G77/50 ,  C08G77/52

公开(公告)号：EP2216682A4

公开(公告)日：2012-05-02

申请号：EP08850248

申请日：2008-11-12

Applicant: ADEKA CORP

Inventor： MORITA HIROSHI ,  SATO HIROMI ,  KOBAYASHI ATSUSHI ,  OMI JINICHI ,  SAITO SEIICHI

IPC: G03F7/075 ,  C08G77/16 ,  C08G77/50 ,  C08K5/23 ,  C08L83/06 ,  G03F7/023 ,  G03F7/40 ,  H01L23/29

CPC classification number: C08G77/50 ,  C08G77/14 ,  C08G77/80 ,  C08K5/235 ,  C08K5/5419 ,  C08L83/06 ,  G03F7/0233 ,  G03F7/0758 ,  G03F7/40 ,  H01L23/296 ,  H01L2924/0002 ,  H01L2924/12044 ,  Y10S430/115 ,  Y10S430/12 ,  Y10S430/124 ,  H01L2924/00

公开(公告)号：EP2772505A4

公开(公告)日：2015-06-24

申请号：EP12844453

申请日：2012-10-22

Applicant: ADEKA CORP

Inventor： HARA KENJI ,  IWASHIMA TOMOYUKI ,  OMI JINICHI ,  SAITO SEIICHI

IPC: C08G59/17 ,  C07F7/21 ,  C08F290/14

CPC classification number: C07F7/21 ,  C08F290/142

公开(公告)号：EP1852469A4

公开(公告)日：2010-08-11

申请号：EP06713654

申请日：2006-02-14

Applicant: ADEKA CORP

Inventor： OMI JINICHI ,  SAKAMAKI KOICHI ,  MORITA HIROSHI ,  SAITO MASAKO

IPC: C08L83/14 ,  C08G77/12 ,  C08G77/50 ,  C08G77/52

CPC classification number: C08G77/52 ,  C08G77/045 ,  C08G77/12 ,  C08G77/20 ,  C08G77/70 ,  C08K5/56 ,  C08L83/04 ,  C08L83/14 ,  C08L83/00 ,  C08L2666/52

公开(公告)号：JP2008231068A

公开(公告)日：2008-10-02

申请号：JP2007075991

申请日：2007-03-23

Applicant: Adeka Corp ,  株式会社Adeka

Inventor： MORITA HIROSHI ,  SATO HIROMI ,  OMI JINICHI ,  SAITO SEIICHI

IPC: C07F7/21 ,  G03F7/039 ,  G03F7/075

CPC classification number: C07F7/21 ,  G03F7/0045 ,  G03F7/0755 ,  G03F7/0757

Abstract: PROBLEM TO BE SOLVED: To provide a cyclosiloxane compound capable of giving a positive resist composition having excellent physical properties as a resist, and to provide a positive resist composition using the cyclosiloxane compound.
SOLUTION: The cyclosiloxane compound is produced by the hydrosilylation of a compound expressed by formula (1) and/or a compound prepared by the hydrosilylation of the compound expressed by formula (1) with a divinyl compound expressed by formula (2): CH
2 =CH-R
2 -CH=CH
2 , and a compound expressed by formula (3): CH
2 =CR
3 -(R
4 )
h -T.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供能够提供具有优异物理性能的正性抗蚀剂组合物作为抗蚀剂的环硅氧烷化合物，并提供使用该环硅氧烷化合物的正性抗蚀剂组合物。 解决方案：通过式（1）表示的化合物的氢化硅烷化和/或通过式（1）表示的化合物的氢化硅烷化由式（2）表示的二乙烯基化合物制备的化合物来制备环硅氧烷化合物， CH 3 = CH-R 2 SP-CH = CH 2 ，由式（3）表示的化合物：CH 2 = CR 3 - （R 4 ）ħ -T。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2006200360A

公开(公告)日：2006-08-03

申请号：JP2006124070

申请日：2006-04-27

Applicant: Adeka Corp ,  Tateyama Kensetsu Kk ,  Tokyo Metro Co Ltd ,  東京地下鉄株式会社 ,  株式会社Adeka ,  館山建設株式会社

Inventor： TATARA HIROFUMI ,  SAEKI YOSHIHIKO ,  NAKADA RIKIZO ,  OKAZAKI TOSHIHIRO ,  OMI JINICHI ,  INOUE HIROSHI

IPC: E21D11/00

Abstract: PROBLEM TO BE SOLVED: To provide a water stopping plug sufficiently stopping water for a long time though there are uneven parts on an inner wall of a pipe or a bored hole.
SOLUTION: The water stopping plug is inserted into the bored hole for use. Two rod-shaped members 25, 26 are loosely inserted into a plug part 24 formed of a cylindrical water-swelling member 21 sandwiched by two cylindrical disk-like holding plates 22, 23. One end extending on the small disk-like holding plate 23 side of the rod-shaped members 25, 26 is curved into an L shape and the other end extending on a large disk-like holding plate 22 is threaded in the inward direction of the cylindrical water-swelling member 21. A protrusion part 27 corresponding to the rod-shaped members 25, 26 is fixed to a surface of the small disk-like holding plate 23, and a fastening nut 28 is threaded near the other end extending on the large disk-like holding plate 22 of the rod shaped members 25, 26. A cylindrical side surface of the water-swelling member 21 is brought into contact with an inner surface of the bored hole to be plugged by compressing the cylindrical water-swelling member 21 with the two disk-like holding plates 22, 23 through fastening the fastening nut 28.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：尽管在管的内壁或钻孔上存在不均匀的部分，但是为了提供长时间充分停止水的止水塞。

解决方案：将止水塞插入钻孔中使用。 两个杆状构件25,26松动地插入由夹在两个圆柱形盘状保持板22,23之间的圆柱形水膨胀构件21形成的塞子部分24中。一个在小盘状保持板23上延伸的端部 杆状构件25,26的一侧弯曲成L字形，并且在大盘形保持板22上延伸的另一端沿圆柱形水膨胀构件21的内侧方向旋入。对应于突出部27 杆状构件25,26固定在小盘状保持板23的表面，并且紧固螺母28在延伸在棒状构件的大盘状保持板22上的另一端附近被螺纹拧紧 水膨胀部件21的圆筒形侧面通过用两个盘状保持板22,23压缩圆柱形水膨胀部件21而与要钻孔的内表面接触以被堵塞 通过紧固紧固螺母28 P>版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2013108069A

公开(公告)日：2013-06-06

申请号：JP2012234570

申请日：2012-10-24

Applicant: Adeka Corp ,  株式会社Adeka

Inventor： HARA KENJI ,  IWASHIMA TOMOYUKI ,  OMI JINICHI

IPC: C08F2/48 ,  C07F7/18 ,  C08L33/14 ,  C08L63/00 ,  C09D4/00 ,  C09D163/10

CPC classification number: G03F7/0045 ,  G03F7/027 ,  G03F7/038 ,  G03F7/0755 ,  G03F7/085

Abstract: PROBLEM TO BE SOLVED: To provide a photocurable resin composition useful as a hard coating material for an image display surface of an image display device resulting in a cured product having superior adhesion and scratch resistance.SOLUTION: The photocurable resin composition comprises: (A) a polyvalent alcohol (meth)acrylate compound; (B) a photo radical generator or a heat radical generator; and (C) an epoxy (meth)acrylate compound having a specified structure, further preferably, (D) a phosphoric acid (meta)acrylate compound and/or (F) another epoxy resin.

Abstract translation: 要解决的问题：提供可用作图像显示装置的图像显示表面的硬涂层材料的光固化树脂组合物，其产生具有优异的粘合性和耐划伤性的固化产物。 光固化树脂组合物包含：（A）多元醇（甲基）丙烯酸酯化合物; （B）光自由基发生器或热激发生器; 和（C）具有特定结构的环氧（甲基）丙烯酸酯化合物，更优选（D）磷酸（甲基）丙烯酸酯化合物和/或（F）另一种环氧树脂。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2013035880A

公开(公告)日：2013-02-21

申请号：JP2011170164

申请日：2011-08-03

Applicant: Adeka Corp ,  株式会社Adeka

Inventor： MORITA HIROSHI ,  OMI JINICHI ,  SUEYOSHI TAKASHI

IPC: C08G59/62

Abstract: PROBLEM TO BE SOLVED: To provide a curing agent for an epoxy resin.SOLUTION: There is provided a specific phenol compound having a group of formula (1), a group of formula (2) and having a group of formula (2) and a group of formula (3). In formula (1), Rs are the same or different and each represents a 1-4C alkyl or 6-10C aryl; Xrepresents a group represented by general formula (4); and a denotes a number of 3-6. In formula (2), Rs are the same or different and each represents a 1-4C alkyl or 6-10C aryl; Xrepresents a group represented by general formula (4); and b denotes a number of 2-5. In formula (3), c denotes a number of 1-5, provided that b-c is a number of 0-4; R, Xand b are as defined in formula (2). In formula (4), Rrepresents a 2-10C bivalent saturated aliphatic hydrocarbon group; Rrepresents 1-4C alkyl; d denotes a number of 1-2; and e denotes a number of 0-3.

Abstract translation: 要解决的问题：提供环氧树脂的固化剂。 提供具有式（1）的基团，式（2）的基团和具有式（2）的基团和式（3）的基团的特定的酚化合物。 在式（1）中，R“相同或不同，各自表示1-4C烷基或6-10C芳基; X 1 表示通式（4）表示的基团。 a表示3-6。 在式（2）中，R“相同或不同，各自表示1-4C烷基或6-10C芳基; X 2 表示由通式（4）表示的基团。 b表示2-5。 在式（3）中，c表示1-5的数，条件是b-c为0-4的数; R 2 ，X 2 和b如公式（2）中定义。 在式（4）中，R 3 表示2-10C二价饱和脂族烃基; R 4 表示1-4C烷基; d表示1-2的数; e表示0-3的数。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2007023125A

公开(公告)日：2007-02-01

申请号：JP2005205773

申请日：2005-07-14

Applicant: Adeka Corp ,  株式会社Adeka

Inventor： SAITO MASAKO ,  OMI JINICHI ,  SAKAMAKI KOICHI ,  MORITA HIROSHI

IPC: C09D9/00

Abstract: PROBLEM TO BE SOLVED: To provide a removal agent for removing curable silicone resins even after prebaked.
SOLUTION: The removal agent for curable silicone resins has a quaternary ammonium compound expressed by general formula (1) (R
1 )
3 N
+ -R
2 -X
- [wherein R
1 expresses a 1-4C hydrocarbon group which may be straight chain or branched chain, the same or different; R
2 expresses a 6-20C hydrocarbon group which may be straight chain or branched chain; X
- expresses a monovalent anion (e.g., OH
- , Cl
- or the like)] as at least one effective ingredient.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 待解决的问题：即使在预烘烤之后也提供用于除去可固化的有机硅树脂的除去剂。 ＆lt; P＆gt;解决方案：可固化的有机硅树脂的除去剂具有通式（1）表示的季铵化合物（R 1 ）3 N SP> -R 2 -X - 其中R 1 表示可以是直链或支链的1-4C烃基， 相同或不同; R 2 表示可以是直链或支链的6-20C烃基; 作为至少一种有效成分，X - 表示一价阴离子（例如OH，SP，SP，SP，SP等）。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2010101957A

公开(公告)日：2010-05-06

申请号：JP2008270972

申请日：2008-10-21

Applicant: Adeka Corp ,  株式会社Adeka

Inventor： SAITO SEIICHI ,  MORITA HIROSHI ,  TAKENOUCHI HIROMI ,  KOBAYASHI JUN ,  OMI JINICHI

IPC: G03F7/075 ,  C08G77/16 ,  G02F1/1333 ,  G03F7/023 ,  G03F7/40 ,  H01L21/027 ,  H01L51/50 ,  H05B33/22

CPC classification number: G03F7/0757 ,  C08G77/16 ,  C08G77/18 ,  G03F7/0233 ,  G03F7/40 ,  H05B33/10 ,  H05B33/22

Abstract: PROBLEM TO BE SOLVED: To provide a positive photosensitive composition which is excellent in transparency and provides a permanent resist having such high heat resistance and chemical resistance after high-heat history that it is also used as an insulating film above an active matrix substrate, a permanent resist using the positive photosensitive composition and a method for producing the same. SOLUTION: The positive photosensitive composition includes (A) a silicone resin having at least two groups per molecule represented by general formula (1) (wherein, R 1 denotes a 1-10C alkylene group which may have a substituted hydrocarbon group, R 2 denotes a 1-4C alkyl group, a denotes an integer of 0 or 1-4, b denotes an integer of 1-3, and a+b does not exceed 5), (B) a siloxane compound having a glycidyl group, (C) diazonaphthoquinones and (D) an organic solvent. The permanent resist is produced by applying the positive photosensitive composition on a substrate and subjecting the resulting coating to exposure, alkali development and post-bake at 120-350°C. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了提供透明性优异的正性感光性组合物，并且在高热历史之后提供具有如此高的耐热性和耐化学性的永久性抗蚀剂，它也用作有源矩阵上的绝缘膜 基板，使用正性感光性组合物的永久抗蚀剂及其制造方法。 正光敏组合物包括（A）每分子具有至少两个由通式（1）表示的基团的有机硅树脂（其中，R SP 1表示1-10C亚烷基，其中， 可以具有取代的烃基，R 2是表示1-4C的烷基，a表示0或1-4的整数，b表示1-3的整数，a + b不是 超过5），（B）具有缩水甘油基的硅氧烷化合物，（C）重氮萘醌和（D）有机溶剂。 永久抗蚀剂通过将正性感光性组合物涂布在基材上并使所得涂层在120-350℃下进行曝光，碱显影和后烘烤来制造。 版权所有（C）2010，JPO＆INPIT