公开(公告)号：US20240280907A1

公开(公告)日：2024-08-22

申请号：US18567053

申请日：2022-04-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Hasret ERCISLI ,  Alina-Ionela DOBAN ,  Norbertus Josephus Martinus VAN DEN NIEUWELAAR ,  Jean-Philippe Xavier VAN DAMME ,  Frederik Eduard DE JONG

IPC: G03F7/20 ,  H01L21/66

CPC classification number: G03F7/2002 ,  H01L22/20

Abstract: A method for determining thermally-induced deformation of a structure in a lithographic apparatus, the method including: obtaining timing data for a structure in a lithographic apparatus, wherein the timing data includes timing data for the current state of the structure and timing history data that includes timing data for at least one previous state of the structure; and using one or more models to determine thermally-induced deformation data for the structure in dependence on the timing history data and the timing data for the current state of the structure.

公开(公告)号：US20240295832A1

公开(公告)日：2024-09-05

申请号：US18573025

申请日：2022-06-13

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Jean-Philippe Xavier VAN DAMME ,  Richard John JOHNSON ,  Raaja Ganapathy SUBRAMANIAN

IPC: G03F7/00

CPC classification number: G03F7/70858 ,  G03F7/70508 ,  G03F7/70533

Abstract: Embodiments herein describe systems, methods, and devices for thermal conditioning of patterning devices at a litho-graphic apparatus. A patterning device cooling system for thermally conditioning a patterning device (202) of a lithographic apparatus is described, the cooling system including a thermal conditioner that thermally conditions the patterning device, and a controller that controls the thermal conditioner to determine a temperature state of the patterning device, determine a production state of the litho-graphic apparatus, and thermally condition the patterning device for exposures based on the temperature state and a production state of the lithographic apparatus.

公开(公告)号：US20200174381A1

公开(公告)日：2020-06-04

申请号：US16615810

申请日：2018-04-18

Applicant: ASML Netherlands B.V.

Inventor： Jean-Philippe Xavier VAN DAMME ,  Laurentius Johannes Adrianus VAN BOKHOVEN ,  Petrus Franciscus VAN GILS ,  Gerben PIETERSE

IPC: G03F7/20

Abstract: The invention relates to a setpoint generator for moving a patterning device of a lithographic apparatus, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the setpoint generator comprises a finite number of movement profiles for the patterning device, and wherein the setpoint generator is configured to select one of the finite number of movement profiles based on a desired movement profile and to output the selected movement profile as a setpoint for the patterning device.

公开(公告)号：US20190121248A1

公开(公告)日：2019-04-25

申请号：US16090713

申请日：2017-03-08

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Günes NAKIBOGLU ,  Lowell Lane BAKER ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Hakki Ergün CEKLI ,  Geoffrey Alan SCHULTZ ,  Laurentius Johannes Adrianus VAN BOKHOVEN ,  Frank Johannes Jacobus VAN BOXTEL ,  Jean-Philippe Xavier VAN DAMME ,  Christopher Charles WARD

IPC: G03F7/20

CPC classification number: G03F7/70875

Abstract: A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.

公开(公告)号：US20180095369A1

公开(公告)日：2018-04-05

申请号：US15565082

申请日：2016-03-24

Applicant: ASML Netherlands B.V.

Inventor： Kevin VAN DE RUIT ,  Bart Dinand PAARHUIS ,  Jean-Philippe Xavier VAN DAMME ,  Johannes ONVLEE ,  Cornelis Melchior BROUWER ,  Pieter Jacob KRAMER

IPC: G03F7/20 ,  G03F1/62

CPC classification number: G03F7/70983 ,  G01B2210/56 ,  G03F1/62 ,  G03F7/2002 ,  G03F7/70258 ,  G03F7/7085

Abstract: A lithographic apparatus including a support to support a patterning device, a substrate table to hold a substrate, and a projection system to project a radiation beam patterned by the patterning device onto a target portion of the substrate. A transparent layer is provided to protect the pattering device. The apparatus further includes a transparent layer deformation-determining device to determine a deformation profile of the transparent layer, the deformation profile of the transparent layer expressing a deformation of the transparent layer during a scanning movement of the lithographic apparatus, and a compensator device which is configured to control the projection system, the substrate table and/or the support in response to the deformation profile of the transparent layer to compensate for the deformation of the transparent layer during the scanning movement of the apparatus.