Patent search ap:("ASML NETHERLANDS B.V.") AND inv:"Frederik Eduard DE JONG" Page 1

1.

发明公开
METHOD AND ARRANGEMENT FOR DETERMINING THERMALLY-INDUCED DEFORMATIONS 审中-公开

公开(公告)号：US20240280907A1

公开(公告)日：2024-08-22

申请号：US18567053

申请日：2022-04-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Hasret ERCISLI , Alina-Ionela DOBAN , Norbertus Josephus Martinus VAN DEN NIEUWELAAR , Jean-Philippe Xavier VAN DAMME , Frederik Eduard DE JONG

IPC: G03F7/20 , H01L21/66

CPC classification number: G03F7/2002 , H01L22/20

Abstract: A method for determining thermally-induced deformation of a structure in a lithographic apparatus, the method including: obtaining timing data for a structure in a lithographic apparatus, wherein the timing data includes timing data for the current state of the structure and timing history data that includes timing data for at least one previous state of the structure; and using one or more models to determine thermally-induced deformation data for the structure in dependence on the timing history data and the timing data for the current state of the structure.

2.

发明申请
A METHOD AND SYSTEM FOR DETERMINING OVERLAY 有权

公开(公告)号：US20220171299A1

公开(公告)日：2022-06-02

申请号：US17599302

申请日：2020-01-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Ruud Hendrikus Martinus Johannes BLOKS , Hendrik Cornelis Anton BORGER , Frederik Eduard DE JONG , Johan Gertrudis Cornelis KUNNEN , Siebe LANDHEER , Chung-Hsun LI , Patricius Jacobus NEEFS , Georgios TSIROGIANNIS , Si-Han ZENG

IPC: G03F7/20

Abstract: A method of determining an overlay value of a substrate, the method including: obtaining temperature data that includes data on measured temperature at one or more positions on a substrate table after a substrate has been loaded onto the substrate table; and determining an overlay value of the substrate in dependence on the obtained temperature data. There is further disclosed a method of determining a performance of a clamping by a substrate table using a determined overlay value.

3.

发明申请
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD INVOLVING A HEATER 审中-公开
Title translation: 涉及加热器的平面设备和装置制造方法

公开(公告)号：US20160048085A1

公开(公告)日：2016-02-18

申请号：US14882241

申请日：2015-10-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Theodorus Petrus Maria CADEE , Johannes Henricus Wilhelmus JACOBS , Nicolaas TEN KATE , Erik Roelof LOOPSTRA , Aschwin Lodewijk Hendricus Johannes VERMEER , Jeroen Johannes Sophia Maria MERTENS , Christianus Gerardus Maria DE MOL , Marcel Johannus Elisabeth Hubertus MUITJENS , Antonius Johannus VAN DER NET , Joost Jeroen OTTENS , Johannes Anna QUAEDACKERS , Maria Elisabeth REUHMAN-HUISKEN , Marco Koert STAVENGA , Patricius Aloysius Jacobus TINNEMANS , Martinus Cornelis Maria VERHAGEN , Jacobus Johannus Leonardus Hendricus VERSPA Y , Frederik Eduard DE JONG , Koen GOORMAN , Boris MENCHTCHIKOV , Herman BOOM , Stoyan NIHTIANOV , Richard MOERMAN , Martin Frans Pierre SMEETS , Bart Leonard Peter SCHOONDERMARK , Franciscus Johannes Joseph JANSSEN , Michel RIEPEN

IPC: G03F7/20

CPC classification number: G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875

Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

Abstract translation: 描述了一种光刻设备，其具有液体供应系统，其被配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间，布置成基本上容纳该空间内的液体的阻挡构件和加热器。

4.

发明申请
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD INVOLVING A HEATER 有权

公开(公告)号：US20210063898A1

公开(公告)日：2021-03-04

申请号：US17098073

申请日：2020-11-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Theodorus Petrus Maria CADEE , Johannes Henricus Wilhelmus JACOBS , Nicolaas TEN KATE , Erik Roelof LOOPSTRA , Aschwin Lodewijk Hendricus Johannes VAN MEER , Jeroen Johannes Sophia Maria MERTENS , Christianus Gerardus Maria DE MOL , Marcel Johannus Elisabeth Hubertus MUITJENS , Antonius Johannus VAN DER NET , Joost Jeroen OTTENS , Johannes Anna QUAEDACKERS , Maria Elisabeth REUHMAN-HUISKEN , Marco Koert STAVENGA , Patricius Aloysius Jacobus TINNEMANS , Martinus Cornelis Maria VERHAGEN , Jacobus Johannus Leonardus Hendricus VERSPAY , Frederik Eduard DE JONG , Koen GOORMAN , Boris MENCHTCHIKOV , Herman BOOM , Stoyan NIHTIANOV , Richard MOERMAN , Martin Frans Pierre SMEETS , Bart Leonard Peter SCHOONDERMARK , Franciscus Johannes Joseph JANSSEN , Michel RIEPEN

IPC: G03F7/20

Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

5.

发明申请
METHOD OF DETERMINING PELLICLE DEGRADATION COMPENSATION CORRECTIONS, AND ASSOCIATED LITHOGRAPHIC APPARATUS AND COMPUTER PROGRAM 审中-公开

公开(公告)号：US20190384164A1

公开(公告)日：2019-12-19

申请号：US16485506

申请日：2018-02-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcel Theodorus Maria VAN KESSEL , Frederik Eduard DE JONG , Cornelis Melchior BROUWER , Kevin VAN DE RUIT , Chung-Hsun LI

IPC: G03F1/62 , G03F7/20

Abstract: A method for mitigating an effect of non-uniform pellicle degradation on control of a substrate patterning process and an associated lithographic apparatus. The method includes quantifying an effect of the non-uniform pellicle degradation on one or more properties of patterned features, such as one or more metrology targets, formed on the substrate by the substrate patterning process. A process control correction is then determined based on the quantification of the effect of the non-uniform pellicle degradation.