公开(公告)号：US20140176955A1

公开(公告)日：2014-06-26

申请号：US14190036

申请日：2014-02-25

Applicant: ASML Netherlands B.V.

Inventor： Andreas FUCHS ,  Maurits Van Der Schaar ,  Scott Anderson Middlebrooks ,  Panagiotis Pieter Bintevinos

IPC: G03F7/20

CPC classification number: G03F7/70633 ,  G01N21/956

Abstract: A method for determining overlay error includes measuring asymmetry of radiation reflected from each of a plurality of targets on a substrate. The plurality of targets include a predetermined overlay offset. The method also includes comparing the measured asymmetry of the radiation reflected from each of the plurality of targets to the corresponding predetermined overlay offset of the respective target. Additionally, the method includes determining the overlay error of a point on the substrate as a function of measured asymmetry reflected from the point. The function is determined by fitting a polynomial or a Fourier series to a comparison of the measured asymmetry of the radiation reflected from each of the plurality of targets to the corresponding predetermined overlay offset of the respective target. The function limits an effect of linearity error.

Abstract translation: 用于确定覆盖误差的方法包括测量从衬底上的多个靶中的每一个反射的辐射的不对称性。 多个目标包括预定的覆盖偏移。 该方法还包括将从多个目标中的每一个反射的辐射的测量的不对称性与相应目标的对应的预定叠加偏移进行比较。 另外，该方法包括根据从该点反射的测量的不对称性来确定衬底上的点的重叠误差。 通过将多项式或傅里叶级数拟合到从多个目标中的每一个反射的辐射的测量的不对称与相应目标的对应的预定叠加偏移的比较来确定该功能。 该功能限制了线性误差的影响。

公开(公告)号：US20230185990A1

公开(公告)日：2023-06-15

申请号：US18095515

申请日：2023-01-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Lotte Marloes Willems ,  Kaustuve Bhattacharyya ,  Panagiotis Pieter Bintevinos ,  Guangqing Chen ,  Martin Ebert ,  Pieter Jacob Mathias Hendrik Knelissen ,  Stephen Morgan ,  Maurits Van Der Schaar ,  Leonardus Henricus Marie Verstappen ,  Jen-Shiang Wang ,  Peter Hanzen Wardenier

IPC: G06F30/20 ,  G03F7/20 ,  G03F9/00

CPC classification number: G06F30/20 ,  G03F7/705 ,  G03F7/70625 ,  G03F7/70683 ,  G03F7/70633 ,  G03F9/7046 ,  G06F2111/10

Abstract: A method including performing a simulation to evaluate a plurality of metrology targets and/or a plurality of metrology recipes used to measure a metrology target, identifying one or more metrology targets and/or metrology recipes from the evaluated plurality of metrology targets and/or metrology recipes, receiving measurement data of the one or more identified metrology targets and/or metrology recipes, and using the measurement data to tune a metrology target parameter or metrology recipe parameter.

公开(公告)号：US09470986B2

公开(公告)日：2016-10-18

申请号：US14190036

申请日：2014-02-25

Applicant: ASML Netherlands B.V.

Inventor： Andreas Fuchs ,  Maurits Van Der Schaar ,  Scott Anderson Middlebrooks ,  Panagiotis Pieter Bintevinos

IPC: G03F7/20 ,  G01N21/956

CPC classification number: G03F7/70633 ,  G01N21/956

Abstract: A method for determining overlay error includes measuring asymmetry of radiation reflected from each of a plurality of targets on a substrate. The plurality of targets include a predetermined overlay offset. The method also includes comparing the measured asymmetry of the radiation reflected from each of the plurality of targets to the corresponding predetermined overlay offset of the respective target. Additionally, the method includes determining the overlay error of a point on the substrate as a function of measured asymmetry reflected from the point. The function is determined by fitting a polynomial or a Fourier series to a comparison of the measured asymmetry of the radiation reflected from each of the plurality of targets to the corresponding predetermined overlay offset of the respective target. The function limits an effect of linearity error.

Abstract translation: 用于确定覆盖误差的方法包括测量从衬底上的多个靶中的每一个反射的辐射的不对称性。 多个目标包括预定的覆盖偏移。 该方法还包括将从多个目标中的每一个反射的辐射的测量的不对称性与相应目标的对应的预定叠加偏移进行比较。 另外，该方法包括根据从该点反射的测量的不对称性来确定衬底上的点的重叠误差。 通过将多项式或傅里叶级数拟合到从多个目标中的每一个反射的辐射的测量的不对称与相应目标的对应的预定叠加偏移的比较来确定该功能。 该功能限制了线性误差的影响。

公开(公告)号：US12204826B2

公开(公告)日：2025-01-21

申请号：US18095515

申请日：2023-01-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Lotte Marloes Willems ,  Kaustuve Bhattacharyya ,  Panagiotis Pieter Bintevinos ,  Guangqing Chen ,  Martin Ebert ,  Pieter Jacob Mathias Hendrik Knelissen ,  Stephen Morgan ,  Maurits Van Der Schaar ,  Leonardus Henricus Marie Verstappen ,  Jen-Shiang Wang ,  Peter Hanzen Wardenier

IPC: G03F7/00 ,  G03F9/00 ,  G06F30/20 ,  G06F111/10

Abstract: A method including performing a simulation to evaluate a plurality of metrology targets and/or a plurality of metrology recipes used to measure a metrology target, identifying one or more metrology targets and/or metrology recipes from the evaluated plurality of metrology targets and/or metrology recipes, receiving measurement data of the one or more identified metrology targets and/or metrology recipes, and using the measurement data to tune a metrology target parameter or metrology recipe parameter.

公开(公告)号：US11580274B2

公开(公告)日：2023-02-14

申请号：US15559759

申请日：2016-03-24

Applicant: ASML Netherlands B.V.

Inventor： Lotte Marloes Willems ,  Kaustuve Bhattacharyya ,  Panagiotis Pieter Bintevinos ,  Guangqing Chen ,  Martin Ebert ,  Pieter Jacob Mathias Hendrik Knelissen ,  Stephen Morgan ,  Maurits Van Der Schaar ,  Leonardus Henricus Marie Verstappen ,  Jen-Shiang Wang ,  Peter Hanzen Wardenier

IPC: G03F7/20 ,  G06F30/20 ,  G03F9/00 ,  G06F111/10

Abstract: A method including performing a simulation to evaluate a plurality of metrology targets and/or a plurality of metrology recipes used to measure a metrology target, identifying one or more metrology targets and/or metrology recipes from the evaluated plurality of metrology targets and/or metrology recipes, receiving measurement data of the one or more identified metrology targets and/or metrology recipes, and using the measurement data to tune a metrology target parameter or metrology recipe parameter.