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公开(公告)号：US11429029B2
公开(公告)日：2022-08-30
申请号：US17081325
申请日：2020-10-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Maurits Van Der Schaar , Patrick Warnaar , Youping Zhang , Arie Jeffrey Den Boef , Feng Xiao , Martin Ebert
Abstract: A method includes projecting an illumination beam of radiation onto a metrology target on a substrate, detecting radiation reflected from the metrology target on the substrate, and determining a characteristic of a feature on the substrate based on the detected radiation, wherein a polarization state of the detected radiation is controllably selected to optimize a quality of the detected radiation.
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公开(公告)号：US20190064677A1
公开(公告)日：2019-02-28
申请号：US16174398
申请日：2018-10-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Martin Jacobus Johan Jak , Arie Jeffrey den Boef , Martin Ebert
CPC classification number: G03F7/70191 , G01B11/26 , G01N21/21 , G01N21/4788 , G01N21/9501 , G02B5/1819 , G02B5/1823 , G02B27/4255 , G02B27/4272 , G03F7/70616 , G03F7/70633 , G03F7/70683 , G03F7/7085 , G03F9/7049 , G03F9/7076
Abstract: A method, involving illuminating at least a first periodic structure of a metrology target with a first radiation beam having a first polarization, illuminating at least a second periodic structure of the metrology target with a second radiation beam having a second different polarization, combining radiation diffracted from the first periodic structure with radiation diffracted from the second periodic structure to cause interference, detecting the combined radiation using a detector, and determining a parameter of interest from the detected combined radiation.
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公开(公告)号：US10338401B2
公开(公告)日：2019-07-02
申请号：US15694398
申请日：2017-09-01
Applicant: ASML Netherlands B.V.
Inventor： Gerbrand Van Der Zouw , Martin Jacobus Johan Jak , Martin Ebert
Abstract: In an illumination system (12, 13) for a scatterometer, first and second spatial light modulators lie in a common plane and are formed by different portions of a single liquid crystal cell (260). Pre-polarizers (250) apply polarization to first and second radiation prior to the spatial light modulators. A first spatial light modulator (236-S) varies a polarization state of the first radiation in accordance with a first programmable pattern. Second spatial light modulator (236-P) varies a polarization state of the second radiation accordance with a second programmable pattern. A polarizing beam splitter (234) selectively transmits each of the spatially modulated first and second radiation to a common output path, depending on the polarization state of the radiation. In an embodiment, functions of pre-polarizers are performed by the polarizing beam splitter.
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公开(公告)号：US10133188B2
公开(公告)日：2018-11-20
申请号：US15387431
申请日：2016-12-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Martin Jacobus Johan Jak , Arie Jeffrey Den Boef , Martin Ebert
Abstract: A method, involving illuminating at least a first periodic structure of a metrology target with a first radiation beam having a first polarization, illuminating at least a second periodic structure of the metrology target with a second radiation beam having a second different polarization, combining radiation diffracted from the first periodic structure with radiation diffracted from the second periodic structure to cause interference, detecting the combined radiation using a detector, and determining a parameter of interest from the detected combined radiation.
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5.发明申请Illumination System, Inspection Apparatus Including Such an Illumination System, Inspection Method and Manufacturing Method 有权照明系统，包括这种照明系统的检查装置，检验方法和制造方法公开(公告)号：US20160025992A1
公开(公告)日：2016-01-28
申请号：US14805402
申请日：2015-07-21
Applicant: ASML Netherlands B.V.
Inventor： Gerbrand VAN DER ZOUW , Martin Jacobus Johan Jak , Martin Ebert
CPC classification number: G02B27/283 , G01J1/08 , G01N21/8806 , G01N21/9501 , G01N2021/8848 , G01N2201/0675 , G02F1/01 , G03F7/70633
Abstract: In an illumination system (12, 13) for a scatterometer, first and second spatial light modulators lie in a common plane and are formed by different portions of a single liquid crystal cell (260). Pre-polarizers (250) apply polarization to first and second radiation prior to the spatial light modulators. A first spatial light modulator (236-S) varies a polarization state of the first radiation in accordance with a first programmable pattern. Second spatial light modulator (236-P) varies a polarization state of the second radiation accordance with a second programmable pattern. A polarizing beam splitter (234) selectively transmits each of the spatially modulated first and second radiation to a common output path, depending on the polarization state of the radiation. In an embodiment, functions of pre-polarizers are performed by the polarizing beam splitter.
Abstract translation: 在用于散射仪的照明系统（12,13）中，第一和第二空间光调制器位于公共平面中，并且由单个液晶单元（260）的不同部分形成。 预偏光器（250）在空间光调制器之前将偏振应用于第一和第二辐射。 第一空间光调制器（236-S）根据第一可编程模式改变第一辐射的偏振状态。 第二空间光调制器（236-P）根据第二可编程图案改变第二辐射的偏振状态。 偏振分束器（234）根据辐射的偏振状态选择性地将空间调制的第一和第二辐射中的每一个传输到公共输出路径。 在一个实施例中，预偏振器的功能由偏振分束器执行。
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Patent Agency Ranking
公开(公告)号：US20230185990A1
公开(公告)日：2023-06-15
申请号：US18095515
申请日：2023-01-10
Applicant: ASML NETHERLANDS B.V.
Inventor： Lotte Marloes Willems , Kaustuve Bhattacharyya , Panagiotis Pieter Bintevinos , Guangqing Chen , Martin Ebert , Pieter Jacob Mathias Hendrik Knelissen , Stephen Morgan , Maurits Van Der Schaar , Leonardus Henricus Marie Verstappen , Jen-Shiang Wang , Peter Hanzen Wardenier
CPC classification number: G06F30/20 , G03F7/705 , G03F7/70625 , G03F7/70683 , G03F7/70633 , G03F9/7046 , G06F2111/10
Abstract: A method including performing a simulation to evaluate a plurality of metrology targets and/or a plurality of metrology recipes used to measure a metrology target, identifying one or more metrology targets and/or metrology recipes from the evaluated plurality of metrology targets and/or metrology recipes, receiving measurement data of the one or more identified metrology targets and/or metrology recipes, and using the measurement data to tune a metrology target parameter or metrology recipe parameter.
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公开(公告)号：US10379445B2
公开(公告)日：2019-08-13
申请号：US16174398
申请日：2018-10-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Martin Jacobus Johan Jak , Arie Jeffrey Den Boef , Martin Ebert
IPC: G03B27/54 , G03F7/20 , G01B11/26 , G01N21/95 , G01N21/21 , G01N21/47 , G02B5/18 , G03F9/00 , G02B27/42
Abstract: A method, involving illuminating at least a first periodic structure of a metrology target with a first radiation beam having a first polarization, illuminating at least a second periodic structure of the metrology target with a second radiation beam having a second different polarization, combining radiation diffracted from the first periodic structure with radiation diffracted from the second periodic structure to cause interference, detecting the combined radiation using a detector, and determining a parameter of interest from the detected combined radiation.
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公开(公告)号：US10254658B2
公开(公告)日：2019-04-09
申请号：US15274273
申请日：2016-09-23
Applicant: ASML Netherlands B.V.
Inventor： Daan Maurits Slotboom , Arie Jeffrey Den Boef , Martin Ebert
IPC: G03F7/20
Abstract: A method of measuring a parameter of a lithographic process, the method including: illuminating a diffraction measurement target on a substrate with radiation, the measurement target including at least a first sub-target, at least a second sub-target and at least third sub-target, wherein the first, second and third sub-targets each include a periodic structure and wherein the first sub-target, second sub-target and third sub-target each have a different design and wherein at least two of the sub-targets are respectively designed for determination of a different lithographic process parameter; and detecting radiation scattered by the at least two sub-targets to obtain for that target a measurement representing the different parameters of the lithographic process.
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9.发明申请公开(公告)号：US20180088347A1
公开(公告)日：2018-03-29
申请号：US15694398
申请日：2017-09-01
Applicant: ASML Netherlands B.V.
Inventor： Gerbrand Van Der Zouw , Martin Jacobus Johan Jak , Martin Ebert
CPC classification number: G02B27/283 , G01J1/08 , G01N21/8806 , G01N21/9501 , G01N2021/8848 , G01N2201/0675 , G02F1/01 , G03F7/70633
Abstract: In an illumination system (12, 13) for a scatterometer, first and second spatial light modulators lie in a common plane and are formed by different portions of a single liquid crystal cell (260). Pre-polarizers (250) apply polarization to first and second radiation prior to the spatial light modulators. A first spatial light modulator (236-S) varies a polarization state of the first radiation in accordance with a first programmable pattern. Second spatial light modulator (236-P) varies a polarization state of the second radiation accordance with a second programmable pattern. A polarizing beam splitter (234) selectively transmits each of the spatially modulated first and second radiation to a common output path, depending on the polarization state of the radiation. In an embodiment, functions of pre-polarizers are performed by the polarizing beam splitter.
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公开(公告)号：US12204826B2
公开(公告)日：2025-01-21
申请号：US18095515
申请日：2023-01-10
Applicant: ASML NETHERLANDS B.V.
Inventor： Lotte Marloes Willems , Kaustuve Bhattacharyya , Panagiotis Pieter Bintevinos , Guangqing Chen , Martin Ebert , Pieter Jacob Mathias Hendrik Knelissen , Stephen Morgan , Maurits Van Der Schaar , Leonardus Henricus Marie Verstappen , Jen-Shiang Wang , Peter Hanzen Wardenier
IPC: G03F7/00 , G03F9/00 , G06F30/20 , G06F111/10
Abstract: A method including performing a simulation to evaluate a plurality of metrology targets and/or a plurality of metrology recipes used to measure a metrology target, identifying one or more metrology targets and/or metrology recipes from the evaluated plurality of metrology targets and/or metrology recipes, receiving measurement data of the one or more identified metrology targets and/or metrology recipes, and using the measurement data to tune a metrology target parameter or metrology recipe parameter.
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