Sensor for liquid immersion lithographic apparatus
    2.
    发明专利
    Sensor for liquid immersion lithographic apparatus 审中-公开
    传感器用于液体沉降光刻设备

    公开(公告)号:JP2011003898A

    公开(公告)日:2011-01-06

    申请号:JP2010135725

    申请日:2010-06-15

    CPC classification number: G03F7/7085 G03F7/70341 G03F7/70616

    Abstract: PROBLEM TO BE SOLVED: To provide a sensor effective for a liquid immersion apparatus.SOLUTION: This sensor includes a detector, a transparent layer and an opaque pattern layer. The detector is configured to sense a characteristic of a radiation beam. The transparent layer is configured to allow the passage of the radiation beam therethrough. The transparent layer covers the detector. The opaque pattern layer is configured to impart a pattern to the radiation beam. The patterning layer is provided with an opening, and a filling material is arranged in the opening. The filling material is transparent to the radiation beam and has a refractive index identical to that of the transparent layer.

    Abstract translation: 要解决的问题:提供对液浸设备有效的传感器。解决方案:该传感器包括检测器,透明层和不透明图案层。 检测器被配置为感测辐射束的特性。 透明层构造成允许辐射束通过其中。 透明层覆盖检测器。 不透明图案层被配置为赋予辐射束图案。 图形层设置有开口,并且开口中布置有填充材料。 填充材料对辐射束是透明的,并且具有与透明层相同的折射率。

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