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    Lithographic apparatus and method of operating the lithography apparatus
    2.
    发明专利
    Lithographic apparatus and method of operating the lithography apparatus 有权
    平面设备和操作平面设备的方法

    公开(公告)号：JP2011082511A

    公开(公告)日：2011-04-21

    申请号：JP2010212952

    申请日：2010-09-24

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： HOEKERD KORNELIS TIJMEN ,  DE GRAAF ROELOF FREDERIK ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  VAN DER NET ANTONIUS JOHANNUS ,  KRAMER PIETER JACOB ,  KUIJPER ANTHONIE ,  MARTENS ARJAN HUBRECHT JOSEF ANNA ,  VAN DER GRAAF SANDRA ,  PADIY ALEXANDRE VIKTOROVYCH

    IPC: H01L21/027 ,  G03F7/20 ,  H01L21/304

    CPC classification number: G03F7/70925 ,  G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To supply a cleaning liquid, having a rate of a base liquid and an emulsified component within a desirable work region, to an immersion system to be cleaned. SOLUTION: A cleaning liquid supply apparatus is configured to supply an emulsified cleaning fluid to an immersion lithographic apparatus. The apparatus includes a mixer configured to mix an additive fluid from an additive fluid supply section and an immersion liquid from an immersion supply section so as to prepare the emulsified cleaning fluid, a sensor system configured to sense physical characteristics of the emulsified cleaning fluid, and a controller connected to the sensor and mixer. The controller controls the supply of the additive fluid from the additive fluid supply section to the mixer and physical characteristics of the emulsified cleaning fluid. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：将要在所需工作区域中的基础液体和乳化成分的比率的清洗液供给到要清洁的浸渍系统。 解决方案：清洁液体供给装置构造成将乳化的清洁流体供应到浸没式光刻设备。 该装置包括混合器，其被配置为将来自添加剂流体供应部分的添加剂流体和来自浸没供应部分的浸没液体混合以制备乳化清洁流体;被配置为感测乳化清洁流体的物理特性的传感器系统，以及 连接到传感器和混合器的控制器。 控制器控制添加剂流体从添加剂流体供应部分到混合器的供应以及乳化清洁流体的物理特性。 版权所有（C）2011，JPO＆INPIT

    Sensor for liquid immersion lithographic apparatus
    6.
    发明专利
    Sensor for liquid immersion lithographic apparatus 审中-公开
    传感器用于液体沉降光刻设备

    公开(公告)号：JP2011003898A

    公开(公告)日：2011-01-06

    申请号：JP2010135725

    申请日：2010-06-15

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VAN BUEL HENRICUS WILHELMUS MARIA ,  BROEKHUIJSE JEROEN THOMAS ,  PROSYENTSOV VITALIY ,  VAN DER GRAAF SANDRA ,  DZIOMKINA NINA VLADIMIROVNA

    IPC: H01L21/027

    CPC classification number: G03F7/7085 ,  G03F7/70341 ,  G03F7/70616

    Abstract: PROBLEM TO BE SOLVED: To provide a sensor effective for a liquid immersion apparatus.SOLUTION: This sensor includes a detector, a transparent layer and an opaque pattern layer. The detector is configured to sense a characteristic of a radiation beam. The transparent layer is configured to allow the passage of the radiation beam therethrough. The transparent layer covers the detector. The opaque pattern layer is configured to impart a pattern to the radiation beam. The patterning layer is provided with an opening, and a filling material is arranged in the opening. The filling material is transparent to the radiation beam and has a refractive index identical to that of the transparent layer.

    Abstract translation: 要解决的问题：提供对液浸设备有效的传感器。解决方案：该传感器包括检测器，透明层和不透明图案层。 检测器被配置为感测辐射束的特性。 透明层构造成允许辐射束通过其中。 透明层覆盖检测器。 不透明图案层被配置为赋予辐射束图案。 图形层设置有开口，并且开口中布置有填充材料。 填充材料对辐射束是透明的，并且具有与透明层相同的折射率。

    Substrate and method to use substrate
    7.
    发明专利
    Substrate and method to use substrate 有权
    基板和使用基板的方法

    公开(公告)号：JP2009016838A

    公开(公告)日：2009-01-22

    申请号：JP2008173127

    申请日：2008-07-02

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： DE JONG ANTHONIUS MARTINUS COR ,  BOUCHOMS IGOR PETRUS MARIA ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HEN ,  WANTEN PETER FRANCISCUS ,  VAN DER HEIJDEN MARCUS THEODOO ,  VAN DER DONCK JACQUES COR JOHA ,  VAN DEN BOGAARD FREDERICK JOHA ,  GROENEWOLD JAN ,  VAN DER GRAAF SANDRA ,  ZOLDESI CARMEN JULIA

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70925 ,  G03F7/70341 ,  G03F7/70916

    Abstract: PROBLEM TO BE SOLVED: To provide a method for removing contamination from a device used for lithography as an immersion liquid may be contaminated by resist separated from a substrate or the layer deposited on the substrate or particles or flakes of other materials and such contamination, and can make it difficult or impossible to correctly project a (patterned) beam of radiation on the substrate via the immersion liquid. SOLUTION: The method comprises mounting the substrate on a device, the substrate comprising a rigid support layer and a deformable layer provided on the rigid support layer, bringing the deformable layer of the substrate into contact with a surface of the device from which the contamination is removed, and introducing a relative motion between the deformable layer and the surface of the device from which the contamination is removed, thereby separating the contamination from the surface for removal, taking and removing the separated contamination. Other embodiments are described and claimed. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种从用于平版印刷的装置中去除污染物的方法作为浸没液体可能被从基底或沉积在基底上的层或其它材料的颗粒或薄片等分离的抗蚀剂污染 污染，并且可能使得难以或不可能通过浸没液体将（图案化的）辐射束正确投影到基底上。 解决方案：该方法包括将衬底安装在器件上，衬底包括刚性支撑层和设置在刚性支撑层上的可变形层，使得衬底的可变形层与器件的表面接触， 污染被去除，并且在可变形层和去除污染物的装置的表面之间引入相对运动，从而将污染物与表面分离，以除去，取出和除去分离的污染物。 描述和要求保护其他实施例。 版权所有（C）2009，JPO＆INPIT

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