Abstract:
PURPOSE: A sensor for an immersion system, a table, and a lithography apparatus are provided to obtain resistance against immersion, exposed radiation, and quantum. CONSTITUTION: A sensing device(SD) senses the property of a radiation beam. A transparent layer(TL) covers a sensor. The transparent layer allows radiation beams to pass. An opaque patterning layer is positioned between the transparent layer and the sensing device.
Abstract:
PROBLEM TO BE SOLVED: To provide a sensor effective for a liquid immersion apparatus.SOLUTION: This sensor includes a detector, a transparent layer and an opaque pattern layer. The detector is configured to sense a characteristic of a radiation beam. The transparent layer is configured to allow the passage of the radiation beam therethrough. The transparent layer covers the detector. The opaque pattern layer is configured to impart a pattern to the radiation beam. The patterning layer is provided with an opening, and a filling material is arranged in the opening. The filling material is transparent to the radiation beam and has a refractive index identical to that of the transparent layer.
Abstract:
PROBLEM TO BE SOLVED: To provide a substrate table having a sensor which resolves one or more existing difficulties.SOLUTION: A substrate table comprises a sensor which includes a material block provided with a material layer opaque to radiation. The material layer has at least one window configured to permit transmission of radiation. The sensor comprises a wavelength conversion material located at the window, and a waveguide located so as to receive radiation emitted from the wavelength conversion material. The waveguide is embedded in the material block, and configured to direct the radiation emitted from the wavelength conversion material toward a detector through the material block.