公开(公告)号：JP2011166136A

公开(公告)日：2011-08-25

申请号：JP2011020368

申请日：2011-02-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MICKAN UWE ,  VAN OOSTEN ANTON BERNHARD

IPC: H01L21/027 ,  G03F7/20

CPC classification number: H01L21/0274 ,  G03F7/70566 ,  G03F7/70625 ,  H01L21/28123 ,  H01L29/66795

Abstract: PROBLEM TO BE SOLVED: To sufficiently irradiate a resist between elements. SOLUTION: A lithography method of irradiating a resist on a substrate in which a region between a first element located on the substrate and a second element located on the substrate is filled with the resist, the first element has a first length, a first width, and a first height, the second element has a second length, a second width, and a second height, the first height is substantially equal to the second height, the first length is substantially in parallel with the second length, and a distance between opposed side walls of the first and second elements is shorter than the wavelength of radiation used for irradiating the resist, the first and second elements determining a region extended in a first direction and filled with the resist. The method includes a step of irradiating the resist with elliptical polarization radiation that is polarized at the first height and the second height perpendicularly to the first direction and substantially perpendicularly to the first and second lengths. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了充分地照射元件之间的抗蚀剂。 解决方案：在基板上照射抗蚀剂的光刻方法，其中位于基板上的第一元件与位于基板上的第二元件之间的区域被抗蚀剂填充，第一元件具有第一长度， 第一宽度和第一高度，第二元件具有第二长度，第二宽度和第二高度，第一高度基本上等于第二高度，第一长度基本上与第二长度平行，并且一 第一和第二元件的相对侧壁之间的距离短于用于照射抗蚀剂的辐射波长，第一和第二元件确定在第一方向上延伸并填充有抗蚀剂的区域。 该方法包括以垂直于第一方向并基本垂直于第一和第二长度的第一高度和第二高度偏振的椭圆偏振辐射照射抗蚀剂的步骤。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：WO2016134892A3

公开(公告)日：2016-10-20

申请号：PCT/EP2016051174

申请日：2016-01-21

Applicant: ASML NETHERLANDS BV

Inventor： DE VRIES GOSSE CHARLES ,  DONKER RILPHO LUDOVICUS ,  NIENHUYS HAN-KWANG ,  VAN OOSTEN ANTON BERNHARD ,  KRUIZINGA BORGERT

IPC: G03F7/20 ,  G02B5/18

CPC classification number: G03F7/70158 ,  G02B5/1861 ,  G02B27/4222 ,  G02B27/4255 ,  G03F7/702 ,  G03F7/70558 ,  G03F7/70991

Abstract: An apparatus for receiving an input radiation beam at a beam receiving location and outputting from the beam receiving location one or more output radiation beams. The apparatus comprises: an optical element; and a movement mechanism. The optical element comprises a plurality of portions for receiving the input radiation beam. The movement mechanism is operable to move the plurality of portions so as selectively position each of the plurality of portions at the beam receiving location. When one of the plurality of portions is disposed in the beam receiving location it is configured to receive the input radiation beam and to scatter the input radiation beam so as to form the one or more output radiation beams. A direction of each of the one or more output radiation beams formed by each of the plurality of portions is substantially the same as a direction of a corresponding output radiation beam formed by each of the other portions. One or more properties of each of the plurality of portions differs from that of the other portions such that a power of at least one of the one or more output radiation beams formed by each of the plurality of portions is different to that of the corresponding output radiation beam formed by at least one of the other portions.

Abstract translation: 一种用于在波束接收位置接收输入辐射束并从波束接收位置输出一个或多个输出辐射束的装置。 该装置包括：光学元件; 和运动机制。 光学元件包括用于接收输入辐射束的多个部分。 移动机构可操作以移动多个部分，以便选择性地将多个部分中的每一个位置放置在束接收位置处。 当多个部分中的一个部分设置在光束接收位置时，其被配置为接收输入辐射束并散射输入辐射束，以便形成一个或多个输出辐射束。 由多个部分中的每一个形成的一个或多个输出辐射束中的每一个的方向基本上与由每个其它部分形成的对应的输出辐射束的方向相同。 多个部分中的每个部分的一个或多个属性与其他部分的不同之处在于，由多个部分中的每一个部分形成的一个或多个输出辐射束中的至少一个的功率与相应输出的功率不同 辐射束由至少一个其它部分形成。