公开(公告)号：JP2011176311A

公开(公告)日：2011-09-08

申请号：JP2011033006

申请日：2011-02-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE VRIES GOSSE CHARLES ,  BUIS EDWIN JOHAN

IPC: H01L21/027

CPC classification number: G03B27/54 ,  G03F7/70883 ,  G03F7/70891

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus and method that correct deformation of an optical element.
SOLUTION: The lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device. A substrate table is constructed to hold a substrate, and a projection system is configured to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus includes a heater arrangement HA that includes an electron beam generator 50 configured to generate an electron beam, and an electron beam guide arrangement 52 configured to guide the electron beam onto the optical element of the lithographic apparatus. The optical element 56 forms a part of the illumination system or the projection system of the lithographic apparatus which, in use, is traversed by the radiation beam. The heater arrangement HA is controllable to provide a distribution of heat on the optical element 56 by deflection of the electron beam 54.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种校正光学元件的变形的光刻设备和方法。 解决方案：光刻设备包括被配置为调节辐射束和构造成支撑图案形成装置的支撑件的照明系统。 衬底台被构造成保持衬底，并且投影系统被配置为将图案化的辐射束投影到衬底的目标部分上。 光刻设备包括加热器装置HA，其包括被配置为产生电子束的电子束发生器50以及被配置为将电子束引导到光刻设备的光学元件上的电子束引导装置52。 光学元件56形成照明系统的一部分或光刻设备的投影系统，其在使用中被辐射束穿过。 加热器装置HA是可控的，以通过电子束54的偏转在光学元件56上提供热分布。（C）2011，JPO和INPIT

公开(公告)号：JP2012227526A

公开(公告)日：2012-11-15

申请号：JP2012088448

申请日：2012-04-09

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE VRIES GOSSE CHARLES ,  JAN BERNARD PLECHELMUS VAN SCHOOT ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  MARIA VAN AERLE NICOLAAS ALDEGONDA JAN

IPC: H01L21/027 ,  G02B5/02 ,  G02B5/08

CPC classification number: G03F7/70575 ,  G03F7/70075 ,  G03F7/70116 ,  G03F7/70158 ,  G03F7/70191

Abstract: PROBLEM TO BE SOLVED: To provide an optical apparatus capable of reducing unwanted wavelengths of radiation, and a lithographic apparatus.SOLUTION: In an EUV (extreme ultraviolet) lithographic apparatus, an illumination system includes a multifaceted field mirror and a multifaceted pupil mirror. Field facet mirrors in mirrors focus EUV radiation onto a particular associated pupil facet mirror, from which the EUV radiation is directed to a target area. Each of the field facet mirrors is changed so as to scatter unwanted DUV (deep ultraviolet) radiation into a large range of directions. The majority of DUV falls onto neighboring pupil facet mirrors in the pupil mirrors, so that the amount of EUV radiation reaching target E is suppressed in comparison to the wanted EUV radiation. Because the distance between mirrors is much greater than the width of an individual pupil facet mirror, the excellent DUV suppression can be achieved with only a narrow scattering angle.

Abstract translation: 要解决的问题：提供能够减少辐射的不需要的波长的光学装置和光刻设备。 解决方案：在EUV（极紫外）光刻设备中，照明系统包括多面视野镜和多面瞳孔镜。 镜子中的场面反射镜将EUV辐射聚焦到特定的相关瞳孔面反射镜上，EUV辐射从该反射镜朝向目标区域。 改变每个场面反射镜以将不需要的DUV（深紫外）辐射散射到大范围的方向上。 DUV的大部分落在光瞳镜中的相邻瞳孔面反射镜上，从而与所需的EUV辐射相比，达到目标E的EUV辐射量被抑制。 因为镜子之间的距离远大于单个瞳孔面反射镜的宽度，所以只有窄的散射角可以实现出色的DUV抑制。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：WO2017036717A3

公开(公告)日：2017-08-17

申请号：PCT/EP2016068513

申请日：2016-08-03

Applicant: ASML NETHERLANDS BV

Inventor： DE VRIES GOSSE CHARLES ,  NIENHUYS HAN-KWANG

IPC: G02B5/18 ,  G02B6/293 ,  G02B27/10 ,  G03F7/20 ,  H01S3/09

CPC classification number: G03F7/70991 ,  G02B5/1838 ,  G02B5/1857 ,  G02B5/1861 ,  G02B6/29314 ,  G02B27/1086 ,  G02B27/1093 ,  G03F7/70025 ,  G03F7/70033 ,  G03F7/70158 ,  G03F7/70208 ,  G03F7/70316 ,  G03F7/7055 ,  G03F7/70566 ,  H01S3/0903

Abstract: A beam-splitting apparatus (40) arranged to receive an input radiation beam (B) and split the input radiation beam (B) into a plurality of output radiation beams (Ba - Bj). The beam-splitting apparatus (40) comprising a plurality of reflective diffraction gratings (41-45) arranged to receive a radiation beam and configured to form a diffraction pattern comprising a plurality of diffraction orders, at least some of the reflective diffraction gratings (42-45) being arranged to receive a 0th diffraction order formed at another of the reflective diffraction gratings (41-44). The reflective diffraction gratings are arranged such that the optical path of each output radiation beam (Ba - Bj) includes no more than one instance of a diffraction order which is not a 0th diffraction order.

Abstract translation: 一个分束装置（40），用于接收输入辐射束（B）并将输入辐射束（B）分成多个输出辐射束（Ba-Bj）。 所述分束设备（40）包括布置成接收辐射束并被配置为形成包括多个衍射级的衍射图案的多个反射式衍射光栅（41-45），至少一些所述反射式衍射光栅（42 -45）被布置成接收在另一个反射式衍射光栅（41-44）处形成的第0衍射级。 反射式衍射光栅被布置为使得每个输出辐射束（Ba-Bj）的光路包括不多于一个衍射级数的非零级衍射级。

公开(公告)号：WO2016083120A3

公开(公告)日：2016-07-28

申请号：PCT/EP2015076179

申请日：2015-11-10

Applicant: ASML NETHERLANDS BV

Inventor： DEKKERS JEROEN ,  NIENHUYS HAN-KWANG ,  RENKENS MICHAEL JOZEF MATHIJS ,  AKKERMANS JOHANNES ANTONIUS GERARDUS ,  DE VRIES GOSSE CHARLES ,  LOOPSTRA ERIK ROELOF

IPC: G03F7/20 ,  G02B5/18 ,  G02B6/293

CPC classification number: G03F7/70158 ,  G02B5/1828 ,  G02B6/29314 ,  G03F7/70266

Abstract: An adjustable diffraction grating comprises: an optical element and a distortion mechanism. The optical element has an optical surface for receiving an input radiation beam. The optical element is provided with a plurality of closed channels below the optical surface, above each closed channel the optical surface being formed from a membrane of material. The distortion mechanism comprises one or more actuators that are operable to distort the membranes over the closed channels so as to control the shape of the optical surface and to form a periodic structure on the optical surface which acts as a diffraction grating such that the input radiation beam is diffracted from the optical element to form a plurality of angularly separated sub-beams.

Abstract translation: 可调衍射光栅包括：光学元件和失真机构。 光学元件具有用于接收输入辐射束的光学表面。 光学元件在光学表面下方设置有多个封闭通道，在每个封闭通道上方，光学表面由材料膜形成。 所述变形机构包括一个或多个致动器，所述致动器可操作以使所述膜在所述封闭通道上变形，从而控制所述光学表面的形状并且在所述光学表面上形成充当衍射光栅的周期性结构，使得所述输入辐射 光束从光学元件衍射以形成多个角度分离的子光束。

公开(公告)号：WO2016134892A3

公开(公告)日：2016-10-20

申请号：PCT/EP2016051174

申请日：2016-01-21

Applicant: ASML NETHERLANDS BV

Inventor： DE VRIES GOSSE CHARLES ,  DONKER RILPHO LUDOVICUS ,  NIENHUYS HAN-KWANG ,  VAN OOSTEN ANTON BERNHARD ,  KRUIZINGA BORGERT

IPC: G03F7/20 ,  G02B5/18

CPC classification number: G03F7/70158 ,  G02B5/1861 ,  G02B27/4222 ,  G02B27/4255 ,  G03F7/702 ,  G03F7/70558 ,  G03F7/70991

Abstract: An apparatus for receiving an input radiation beam at a beam receiving location and outputting from the beam receiving location one or more output radiation beams. The apparatus comprises: an optical element; and a movement mechanism. The optical element comprises a plurality of portions for receiving the input radiation beam. The movement mechanism is operable to move the plurality of portions so as selectively position each of the plurality of portions at the beam receiving location. When one of the plurality of portions is disposed in the beam receiving location it is configured to receive the input radiation beam and to scatter the input radiation beam so as to form the one or more output radiation beams. A direction of each of the one or more output radiation beams formed by each of the plurality of portions is substantially the same as a direction of a corresponding output radiation beam formed by each of the other portions. One or more properties of each of the plurality of portions differs from that of the other portions such that a power of at least one of the one or more output radiation beams formed by each of the plurality of portions is different to that of the corresponding output radiation beam formed by at least one of the other portions.

Abstract translation: 一种用于在波束接收位置接收输入辐射束并从波束接收位置输出一个或多个输出辐射束的装置。 该装置包括：光学元件; 和运动机制。 光学元件包括用于接收输入辐射束的多个部分。 移动机构可操作以移动多个部分，以便选择性地将多个部分中的每一个位置放置在束接收位置处。 当多个部分中的一个部分设置在光束接收位置时，其被配置为接收输入辐射束并散射输入辐射束，以便形成一个或多个输出辐射束。 由多个部分中的每一个形成的一个或多个输出辐射束中的每一个的方向基本上与由每个其它部分形成的对应的输出辐射束的方向相同。 多个部分中的每个部分的一个或多个属性与其他部分的不同之处在于，由多个部分中的每一个部分形成的一个或多个输出辐射束中的至少一个的功率与相应输出的功率不同 辐射束由至少一个其它部分形成。

公开(公告)号：WO2016139055A3

公开(公告)日：2016-10-27

申请号：PCT/EP2016053216

申请日：2016-02-16

Applicant: ASML NETHERLANDS BV

Inventor： NIENHUYS HAN-KWANG ,  BOGAART ERIK WILLEM ,  DONKER RILPHO LUDOVICUS ,  KRUIZINGA BORGERT ,  LOOPSTRA ERIK ROELOF ,  BOTMA HAKO ,  DE VRIES GOSSE CHARLES ,  FRIJNS OLAV WALDEMAR VLADIMIR ,  BASELMANS JOHANNES JACOBUS MATHEUS

IPC: G03F7/20 ,  G02B5/02

CPC classification number: G03F7/70191 ,  G02B5/0221 ,  G02B5/0268 ,  G02B5/0284 ,  G03F7/70025 ,  G03F7/7005 ,  G03F7/70075 ,  G03F7/70991 ,  H01S3/2308 ,  H05G2/008

Abstract: A radiation system comprising a beam splitting apparatus configured to receive a main radiation beam and split the main radiation beam into a plurality of branch radiation beams and a radiation alteration device arranged to receive an input radiation beam and output a modified radiation beam, wherein the radiation alteration device is configured to provide an output modified radiation beam which has an increased etendue, when compared to the received input radiation beam, wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a main radiation beam and the radiation alteration device is configured to provide a modified main radiation beam to the beam splitting apparatus, or wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a branch radiation beam output from the beam splitting apparatus.

Abstract translation: 一种辐射系统，包括分束装置，其被配置为接收主辐射束并将主辐射束分裂成多个分支辐射束，以及布置成接收输入辐射束并输出修改的辐射束的辐射改变装置，其中辐射 改变装置被配置为提供与所接收的输入辐射束相比具有增加的光密度的输出修改的辐射束，其中所述辐射改变装置被布置成使得由所述辐射改变装置接收的输入辐射束是主 辐射束和辐射改变装置被配置为向分束装置提供修改的主辐射束，或者其中辐射改变装置被布置成使得由辐射改变装置接收的输入辐射束是分支辐射束输出 从分束装置。

公开(公告)号：IL312104A

公开(公告)日：2024-06-01

申请号：IL31210424

申请日：2024-04-11

Applicant: ASML NETHERLANDS BV ,  BAKKER TIES JAN WILLEM ,  DE VRIES GOSSE CHARLES ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  ENGEL MICHAEL ,  HILDENBRAND VOLKER DIRK ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  KURGANOVA EVGENIA ,  LUTTIKHUIS BERNARDUS ANTONIUS JOHANNES ,  VAN DER HAM RONALD ,  VAN LIPZIG JEROEN PETERUS JOHANNES ,  VERMEULEN PAUL ALEXANDER ,  WOLF ABRAHAM JAN

Inventor： BAKKER TIES JAN WILLEM ,  DE VRIES GOSSE CHARLES ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  ENGEL MICHAEL ,  HILDENBRAND VOLKER DIRK ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  KURGANOVA EVGENIA ,  LUTTIKHUIS BERNARDUS ANTONIUS JOHANNES ,  VAN DER HAM RONALD ,  VAN LIPZIG JEROEN PETERUS JOHANNES ,  VERMEULEN PAUL ALEXANDER ,  WOLF ABRAHAM JAN

Abstract: A lithographic apparatus comprises: an illumination system; a support structure; a substrate table; a projection system and a heating system. The illumination system is configured to condition a radiation beam. The support structure is constructed to support a reticle and pellicle assembly for receipt of the radiation beam conditioned by the illumination system. The substrate table is constructed to support a substrate. The projection system is configured to receive the radiation beam from the reticle - pellicle assembly and to project it onto the substrate. The heating system is operable to heat a pellicle of the reticle - pellicle assembly supported by the support structure. A method for using a reticle - pellicle assembly comprises: illuminating the reticle - pellicle assembly with a radiation beam so as to form a patterned image on a substrate; and heating the pellicle of the reticle - pellicle assembly using a separate heat source.