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    IMAGING APPARATUS
    2.
    发明专利
    IMAGING APPARATUS 审中-公开

    公开(公告)号：JP2003100626A

    公开(公告)日：2003-04-04

    申请号：JP2002245963

    申请日：2002-07-23

    Applicant: ASML NETHERLANDS BV

    Inventor： BLEEKER ARNO JAN ,  DE JAGER PIETER WILLEM HERMAN ,  HINTERSTEINER JASON DOUGLAS ,  KRUIZINGA BORGERT ,  MCCARTHY MATTHEW EUGENE ,  OSKOTSKY MARK ,  RYZHIKOV LEV ,  SAKIN LEV ,  SMIRNOV STANISLAV ,  SNIJDERS BART ,  VAN DER MAST KAREL DIEDERICK ,  VISSER HUIBERT

    IPC: G03F7/20 ,  H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To provide an imaging apparatus capable of using for the manufacture of an integrated circuit and other (semiconductor) devices as a commercially charming alternative plan instead of using a conventional lithographic projector (a method using a mask). SOLUTION: The imaging apparatus comprises a radiant ray system for supplying a projection beam of radiant ray, a supporting structure for supporting a pattern forming means effecting a pattern formation in accordance with the desired pattern, a substrate table for retaining a substrate, and a projection system for projecting a beam formed through the pattern formation on the target part of the substrate. The pattern formation means comprises a plurality of individual pattern formation subelements to produce subbeams formed through pattern formation, by using respective subelements. The imaging apparatus comprises a combining means for combining a plurality of subbeams formed through the pattern formation, to a single image formed through the pattern formation.

    Calibration of spatial light modulator
    3.
    发明专利
    Calibration of spatial light modulator 有权
    空调光调制器校准

    公开(公告)号：JP2009163242A

    公开(公告)日：2009-07-23

    申请号：JP2008323792

    申请日：2008-12-19

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VISSER HUIBERT ,  HENDRICUS HOEKS MARTINUS H ,  KRUIZINGA BORGERT ,  STREEFKERK BOB ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VAN ZWET ERWIN JOHN ,  ROLAND NICOLAS MARIA FAHNER ,  MEIJERINK MARCUS GERHARDUS HEN ,  NICOLAS CORNELIS JOHANNES VAN ,  HAR VAN HIMBERGEN

    IPC: G03F7/20 ,  G02B26/08 ,  H01L21/027

    CPC classification number: G03F7/70291 ,  G03F7/70516

    Abstract: PROBLEM TO BE SOLVED: To provide a system and a method for more easily using an array of individually controllable elements in a lithographic apparatus. SOLUTION: The present invention relates to an apparatus and a method used to calibrate an array of individually controllable elements within a lithographic apparatus. A calibration unit can switch between a first state in which modulated beam of radiation passes into a projection system for projecting the modulated beam of radiation onto a substrate, and a second state in which a portion of the modulated beam of radiation is inspected by the calibration unit. The calibration unit generates calibration data, or alternatively, updates calibration data, based on the inspection of the modulated beam of radiation. An array controller uses the calibration data to provide control signals to elements of an array of individually controllable elements which are subsequently configured in response to the control signals. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于在光刻设备中更容易地使用独立可控元件阵列的系统和方法。 解决方案：本发明涉及一种用于校准光刻设备内单独可控元件阵列的设备和方法。 校准单元可以在第一状态和第二状态之间进行切换，其中调制的辐射束通过投影系统以将经调制的辐射束投影到衬底上，以及第二状态，其中调制的辐射束的一部分通过校准 单元。 校准单元产生校准数据，或者替代地，基于调制的辐射束的检查更新校准数据。 阵列控制器使用校准数据来向单独可控元件的阵列的元件提供控制信号，随后可以响应于控制信号而被配置。 版权所有（C）2009，JPO＆INPIT

    RADIATION SYSTEM
    5.
    发明申请
    RADIATION SYSTEM 审中-公开
    辐射系统

    公开(公告)号：WO2016139055A3

    公开(公告)日：2016-10-27

    申请号：PCT/EP2016053216

    申请日：2016-02-16

    Applicant: ASML NETHERLANDS BV

    Inventor： NIENHUYS HAN-KWANG ,  BOGAART ERIK WILLEM ,  DONKER RILPHO LUDOVICUS ,  KRUIZINGA BORGERT ,  LOOPSTRA ERIK ROELOF ,  BOTMA HAKO ,  DE VRIES GOSSE CHARLES ,  FRIJNS OLAV WALDEMAR VLADIMIR ,  BASELMANS JOHANNES JACOBUS MATHEUS

    IPC: G03F7/20 ,  G02B5/02

    CPC classification number: G03F7/70191 ,  G02B5/0221 ,  G02B5/0268 ,  G02B5/0284 ,  G03F7/70025 ,  G03F7/7005 ,  G03F7/70075 ,  G03F7/70991 ,  H01S3/2308 ,  H05G2/008

    Abstract: A radiation system comprising a beam splitting apparatus configured to receive a main radiation beam and split the main radiation beam into a plurality of branch radiation beams and a radiation alteration device arranged to receive an input radiation beam and output a modified radiation beam, wherein the radiation alteration device is configured to provide an output modified radiation beam which has an increased etendue, when compared to the received input radiation beam, wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a main radiation beam and the radiation alteration device is configured to provide a modified main radiation beam to the beam splitting apparatus, or wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a branch radiation beam output from the beam splitting apparatus.

    Abstract translation: 一种辐射系统，包括分束装置，其被配置为接收主辐射束并将主辐射束分裂成多个分支辐射束，以及布置成接收输入辐射束并输出修改的辐射束的辐射改变装置，其中辐射 改变装置被配置为提供与所接收的输入辐射束相比具有增加的光密度的输出修改的辐射束，其中所述辐射改变装置被布置成使得由所述辐射改变装置接收的输入辐射束是主 辐射束和辐射改变装置被配置为向分束装置提供修改的主辐射束，或者其中辐射改变装置被布置成使得由辐射改变装置接收的输入辐射束是分支辐射束输出 从分束装置。

    RADIATION BEAM APPARATUS
    7.
    发明申请
    RADIATION BEAM APPARATUS 审中-公开
    辐射光束装置

    公开(公告)号：WO2016134892A3

    公开(公告)日：2016-10-20

    申请号：PCT/EP2016051174

    申请日：2016-01-21

    Applicant: ASML NETHERLANDS BV

    Inventor： DE VRIES GOSSE CHARLES ,  DONKER RILPHO LUDOVICUS ,  NIENHUYS HAN-KWANG ,  VAN OOSTEN ANTON BERNHARD ,  KRUIZINGA BORGERT

    IPC: G03F7/20 ,  G02B5/18

    CPC classification number: G03F7/70158 ,  G02B5/1861 ,  G02B27/4222 ,  G02B27/4255 ,  G03F7/702 ,  G03F7/70558 ,  G03F7/70991

    Abstract: An apparatus for receiving an input radiation beam at a beam receiving location and outputting from the beam receiving location one or more output radiation beams. The apparatus comprises: an optical element; and a movement mechanism. The optical element comprises a plurality of portions for receiving the input radiation beam. The movement mechanism is operable to move the plurality of portions so as selectively position each of the plurality of portions at the beam receiving location. When one of the plurality of portions is disposed in the beam receiving location it is configured to receive the input radiation beam and to scatter the input radiation beam so as to form the one or more output radiation beams. A direction of each of the one or more output radiation beams formed by each of the plurality of portions is substantially the same as a direction of a corresponding output radiation beam formed by each of the other portions. One or more properties of each of the plurality of portions differs from that of the other portions such that a power of at least one of the one or more output radiation beams formed by each of the plurality of portions is different to that of the corresponding output radiation beam formed by at least one of the other portions.

    Abstract translation: 一种用于在波束接收位置接收输入辐射束并从波束接收位置输出一个或多个输出辐射束的装置。 该装置包括：光学元件; 和运动机制。 光学元件包括用于接收输入辐射束的多个部分。 移动机构可操作以移动多个部分，以便选择性地将多个部分中的每一个位置放置在束接收位置处。 当多个部分中的一个部分设置在光束接收位置时，其被配置为接收输入辐射束并散射输入辐射束，以便形成一个或多个输出辐射束。 由多个部分中的每一个形成的一个或多个输出辐射束中的每一个的方向基本上与由每个其它部分形成的对应的输出辐射束的方向相同。 多个部分中的每个部分的一个或多个属性与其他部分的不同之处在于，由多个部分中的每一个部分形成的一个或多个输出辐射束中的至少一个的功率与相应输出的功率不同 辐射束由至少一个其它部分形成。

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