公开(公告)号：KR20100089792A

公开(公告)日：2010-08-12

申请号：KR20100010162

申请日：2010-02-03

Applicant: ASML NETHERLANDS BV

Inventor： WUISTER SANDER FREDERIK ,  DIJKSMAN JOHAN FREDERIK ,  KRUIJT STEGEMAN YVONNE WENDELA ,  LAMMERS JEROEN HERMAN ,  VAN DER TEMPEL LEENDERT

IPC: H01L21/027

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  B29C59/022

Abstract: PURPOSE: An imprint lithography method and an apparatus thereof are provided to prevent a defect formed on an imprint medium by adding surfactant to an imprint template. CONSTITUTION: A planarization layer and a transfer layer are formed on a substrate. An UV- hardened resin(10) is formed on the planarization layer and the transfer layer. A quartz template(12) is formed on the UV- hardened resin. The UV- hardened resin is hardened by UV radiation(14). The quartz template and the UV- hardened resin are separated from each other.

Abstract translation: 目的：提供压印光刻方法及其装置，以通过将表面活性剂添加到压印模板来防止在压印介质上形成的缺陷。 构成：在基板上形成平坦化层和转印层。 在平坦化层和转印层上形成UV-硬化树脂（10）。 在UV硬化树脂上形成石英模板（12）。 紫外线硬化树脂通过紫外线辐射（14）硬化。 石英模板和UV硬化树脂彼此分离。

公开(公告)号：JP2011040736A

公开(公告)日：2011-02-24

申请号：JP2010162398

申请日：2010-07-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KOOLE ROELOF ,  WUISTER SANDER FREDERIK

IPC: H01L21/027 ,  B29C59/02

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

Abstract: PROBLEM TO BE SOLVED: To provide an imprint lithography apparatus that can suppress excessive use of gas. SOLUTION: The apparatus includes: an imprint template arrangement used for imprinting a pattern on a substrate 22 provided with a predetermined amount of imprintable medium 24; a substrate holder 20 configured to hold the substrate 22; and a chamber 40 having an inlet 42 to allow gas to flow into the chamber 40 and an outlet 44 to allow gas to flow out of the chamber 40, wherein the chamber 40 in use contains a gaseous atmosphere. The inlet 42 and the outlet 44 of the chamber 40 are connected to other constituent elements of a gas circulation system. The constituent elements include a gas circulation driver 48 configured to circulate gas in the gas circulation system and/or a gas purification unit 50 configured to purify the gas as it circulates in the gas circulation system. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供可以抑制气体的过度使用的压印光刻设备。 该装置包括：用于在设置有预定量的可压印介质24的基板22上压印图案的印模模板布置; 构造成保持基板22的基板保持件20; 以及具有入口42的腔室40，以允许气体流入腔室40和出口44，以允许气体流出腔室40，其中使用中的腔室40含有气体气氛。 室40的入口42和出口44连接到气体循环系统的其它构成元件。 构成要素包括：气体循环驱动器48，被配置为在气体循环系统中循环气体;和/或气体净化单元50，被配置为在气体循环系统中循环时净化气体。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2009081421A

公开(公告)日：2009-04-16

申请号：JP2008211243

申请日：2008-08-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： WUISTER SANDER FREDERIK ,  DIJKSMAN JOHAN FREDERIK ,  KRUIJT-STEGEMAN YVONNE WENDELA ,  SCHRAM IVAR ,  LAMMERS JEROEN HERMAN ,  SCHROEDERS RICHARD JOSEPH MARI

IPC: H01L21/027 ,  B29C59/02

CPC classification number: H01L21/683 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  Y10S269/903

Abstract: PROBLEM TO BE SOLVED: To provide a chuck apparatus provided with a second surface portion deflecting gas over a substrate held on a first surface portion, and holding the substrate. SOLUTION: The chuck apparatus includes the first surface portion on which the substrate is to be held and the second surface portion adjacent to the first surface portion and extending at least partially around an edge of the first surface portion and which, in use, is arranged to deflect gas over the first surface portion and thus the substrate that is to be held on the first surface portion. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种卡盘装置，其具有在保持在第一表面部分上的基板上偏转气体的第二表面部分，并且保持基板。 解决方案：卡盘装置包括要保持基板的第一表面部分和与第一表面部分相邻的第二表面部分并且至少部分地围绕第一表面部分的边缘延伸并且在使用中 被布置成使气体偏转在第一表面部分上，并因此偏转待保持在第一表面部分上的基底。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009141328A

公开(公告)日：2009-06-25

申请号：JP2008262679

申请日：2008-10-09

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KRUIJT-STEGEMAN YVONNE WENDELA ,  KNAAPEN RAYMOND JACOBUS WILHEL ,  DIJKSMAN JOHAN FREDERIK ,  WUISTER SANDER FREDERIK ,  SCHRAM IVAR

IPC: H01L21/027 ,  B29C59/02

CPC classification number: B29C59/002 ,  B29C59/02 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: PROBLEM TO BE SOLVED: To assure a desired amount of deformation by applying a desired amount of force to an imprint template.
SOLUTION: An imprint lithography apparatus includes a support structure 51 holding the imprint template. The apparatus further includes: an actuator 52 disposed between the support structure 51 and the side of the imprint template 50 and configured to impart force to the imprint template 50 when the support structure 51 holds the imprint template; and a force sensor 53 disposed between the support structure 51 and the side of the imprint template 50 when the support structure 51 holds the imprint template 50.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：通过对压印模板施加所需的力来确保所需的变形量。 解决方案：压印光刻设备包括保持压印模板的支撑结构51。 该装置还包括：致动器52，其设置在支撑结构51和压印模板50的侧面之间，并且构造成当支撑结构51保持压印模板时向压印模板50施加力; 以及当支撑结构51保持压印模板50时，设置在支撑结构51和压印模板50的侧面之间的力传感器53.版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009065135A

公开(公告)日：2009-03-26

申请号：JP2008203107

申请日：2008-08-06

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： SCHRAM IVAR ,  DIJKSMAN JOHAN FREDERIK ,  WUISTER SANDER FREDERIK ,  KRUIJT-STEGEMAN YVONNE WENDELA ,  LAMMERS JEROEN HERMAN ,  SCHROEDERS RICHARD JOSEPH MARI

IPC: H01L21/027 ,  B29C59/02

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/7035 ,  G03F7/70425 ,  G03F7/70433

Abstract: PROBLEM TO BE SOLVED: To provide an imprint lithography method and an apparatus that may obviate or mitigate the issue that a magnification error may occur in different parts of a substrate when applying patterns to the substrate and devices which are formed from these patterns may, e.g., not function consistently with respect to one another. SOLUTION: The imprint lithography method includes imprinting a plurality of patterns in an imprintable medium provided on the substrate, wherein the order in which the patterns are imprinted in the imprintable medium is such that, for the majority of the patterns, two consecutively imprinted patterns are not imprinted adjacent to one another. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供压印光刻方法和装置，其可以消除或减轻当将图案应用于基板时由基板和由这些图案形成的装置的基板的不同部分可能发生放大误差的问题 可能例如不能相对于彼此一致地运作。 压印光刻方法包括在设置在基板上的可压印介质中印刷多个图案，其中图案印刷在可压印介质中的顺序为：对于大多数图案，连续两个 印记图案不会彼此相邻印刷。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008091865A

公开(公告)日：2008-04-17

申请号：JP2007164953

申请日：2007-06-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DIJKSMAN JOHAN FREDERIK ,  PIERIK ANKE ,  VERNHOUT MARTIN MAURICE ,  WUISTER SANDER FREDERIK ,  KRUIJT-STEGEMAN YVONNE WENDELA ,  SCHRAM IVAR

IPC: H01L21/027 ,  B05C5/00 ,  B29C41/36 ,  B29C59/02 ,  B41J3/38

CPC classification number: B41J2/1429 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: PROBLEM TO BE SOLVED: To provide an imprintable medium dispenser used for imprint lithography and to provide a related method. SOLUTION: The imprintable medium dispenser includes a chamber, a nozzle, and an actuator connected to the chamber and configured to be actuated and thereby generate a pressure wave within the chamber such that imprintable medium is dispensed from the nozzle. The imprintable medium dispenser is provided with a control circuit which includes a monitoring apparatus configured to receive a transient oscillation signal generated when the actuator is actuated, and to monitor the operation of the imprintable medium dispenser by monitoring the transient oscillation signal. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供用于压印光刻的可压印介质分配器，并提供相关方法。 可压印介质分配器包括腔室，喷嘴和连接到室的致动器，并被构造成致动，从而在室内产生压力波，使得可压缩的介质从喷嘴分配。 可压印介质分配器设置有控制电路，该控制电路包括被配置为接收致动器致动时产生的瞬态振荡信号的监视装置，并且通过监视瞬时振荡信号来监视可压印介质分配器的操作。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2011043810A

公开(公告)日：2011-03-03

申请号：JP2010181487

申请日：2010-08-16

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DEN BOEF ARIE JEFFREY ,  BANINE VADIM YEVGENYEVICH ,  WUISTER SANDER FREDERIK ,  SCACCABAROZZI LUIGI

IPC: G03F1/08 ,  G01N21/956 ,  H01L21/027

CPC classification number: G01N21/95623

Abstract: PROBLEM TO BE SOLVED: To provide an inspection method and apparatus capable of eliminating problems of an existing inspection method and apparatus. SOLUTION: In an aspect, an inspection method is disclosed for detecting the presence or absence of a defect on an object comprising a recess having a physical depth. The method includes: a step of directing radiation at the object, the radiation having a wavelength that is substantially equal to twice the optical depth of the recess; a step of detecting radiation that is re-directed by the object or by a defect on the object; and a step of determining the presence or absence of a defect from the re-directed radiation. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供能够消除现有检查方法和装置的问题的检查方法和装置。 解决方案：在一方面，公开了一种用于检测包括具有物理深度的凹部的物体上是否存在缺陷的检查方法。 该方法包括：在物体处引导辐射的步骤，该辐射具有基本上等于凹部的光学深度的两倍的波长; 检测由对象重新引导的辐射或物体上的缺陷的步骤; 以及从重新定向的辐射确定缺陷的存在或不存在的步骤。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010080918A

公开(公告)日：2010-04-08

申请号：JP2009143991

申请日：2009-06-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KRUIJT-STEGEMAN YVONNE WENDELA ,  VERMEULEN JOHANNES PETRUS MARTINUS ,  WUISTER SANDER FREDERIK ,  LAFARRE RAYMOND WILHELMUS LOUIS ,  JEUNINK ANDRE BERNARDUS ,  DE SCHIFFART CATHARINUS ,  JANSEN NORBERT ERWIN THERENZO

IPC: H01L21/027

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

Abstract: PROBLEM TO BE SOLVED: To provide an imprint lithography accurately controlling the force of a wide dynamic range actuator. SOLUTION: Disclosed is an imprint lithography apparatus including: a first support structure 21 for supporting a template 20; and a first actuator 22 mounted on the first support structure constituted in use such that it is disposed the first support structure and the template. The first actuator applies force to the template. The imprint lithography apparatus further includes a second support structure 40 and a second actuator 41 disposed between the second support structure and the first support structure. The second actuator applies force to the second support structure, and the moving range of the second actuator is larger than the moving range of the first actuator. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供精确控制宽动态范围致动器的力的压印光刻。 解决方案：公开了一种压印光刻设备，包括：用于支撑模板20的第一支撑结构21; 以及安装在第一支撑结构上的第一致动器22，所述第一致动器22构造在使用中，使得其布置在第一支撑结构和模板上。 第一个执行器对模板施加强制。 压印光刻设备还包括设置在第二支撑结构和第一支撑结构之间的第二支撑结构40和第二致动器41。 第二致动器对第二支撑结构施加力，并且第二致动器的移动范围大于第一致动器的移动范围。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009088484A

公开(公告)日：2009-04-23

申请号：JP2008199679

申请日：2008-08-01

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： WUISTER SANDER FREDERIK ,  BANINE VADIM YEVGENYEVICH ,  VAN HERPEN MAARTEN MARINUS JOH

IPC: H01L21/027 ,  B29C33/72 ,  B29C59/00

CPC classification number: B08B7/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: PROBLEM TO BE SOLVED: To provide a method for cleaning an imprint template.
SOLUTION: The method for cleaning a contamination 21 on the imprint template 20 constituted of any one from among patterned glass, quartz and quartz glass, and is constituted by exposing a patterned surface to a reducing fluid 46. An imprint template cleaning device is so configured, to allow the template 20 to be exposed to the fluid 46 that flows out via a tube 43 from a chamber 40.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供清洁压印模板的方法。 解决方案：用于清洁由图案化玻璃，石英和石英玻璃中的任何一个构成的压印模板20上的污染物21的方法，并且通过将图案化表面暴露于还原流体46构成。压印模板清洁装置 被配置为允许模板20暴露于经由管道43从腔室40流出的流体46。版权所有（C）2009，JPO和INPIT

公开(公告)号：JP2007194601A

公开(公告)日：2007-08-02

申请号：JP2006337999

申请日：2006-12-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DIJKSMAN JOHAN FREDERIK ,  KRUIJT-STEGEMAN YVONNE WENDELA ,  KNAAPEN RAYMOND JACOBUS ,  KRASTEV KEASSIMIR TODOROV ,  WUISTER SANDER FREDERIK ,  SCHRAM IVAR ,  VAN WINGERDEN JOHANNES

IPC: H01L21/027 ,  B29C59/02

CPC classification number: G03F9/7053 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7042 ,  Y10S977/877 ,  Y10S977/888

Abstract: PROBLEM TO BE SOLVED: To provide a method for aligning an imprint template to a target substrate in an imprint lithography. SOLUTION: An imprint medium 106 having a predetermined volume is stacked within a target area, an imprint template is moved until it contacts the imprint medium 106, and the imprint template or target area or both is subjected to lateral movement mutually under an interface tension between the target area and the imprint template. In accord with this, a material 104 less wet than substrate is provided at least to partially surround the target area of the substrate. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供在压印光刻中将压印模板对准目标衬底的方法。 解决方案：将具有预定体积的压印介质106堆叠在目标区域内，压印模板移动直到其接触压印介质106，并且压印模板或目标区域或两者在相互下相互受到横向移动 目标区域和压印模板之间的界面张力。 与此相对，至少部分地包围基板的目标区域，提供比基板湿润的材料104。 版权所有（C）2007，JPO＆INPIT