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    Imprint lithography method and apparatus
    1.
    发明公开
    Imprint lithography method and apparatus 有权
    印刷方法和装置

    公开(公告)号：KR20100089792A

    公开(公告)日：2010-08-12

    申请号：KR20100010162

    申请日：2010-02-03

    Applicant: ASML NETHERLANDS BV

    Inventor： WUISTER SANDER FREDERIK ,  DIJKSMAN JOHAN FREDERIK ,  KRUIJT STEGEMAN YVONNE WENDELA ,  LAMMERS JEROEN HERMAN ,  VAN DER TEMPEL LEENDERT

    IPC: H01L21/027

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  B29C59/022

    Abstract: PURPOSE: An imprint lithography method and an apparatus thereof are provided to prevent a defect formed on an imprint medium by adding surfactant to an imprint template. CONSTITUTION: A planarization layer and a transfer layer are formed on a substrate. An UV- hardened resin(10) is formed on the planarization layer and the transfer layer. A quartz template(12) is formed on the UV- hardened resin. The UV- hardened resin is hardened by UV radiation(14). The quartz template and the UV- hardened resin are separated from each other.

    Abstract translation: 目的：提供压印光刻方法及其装置，以通过将表面活性剂添加到压印模板来防止在压印介质上形成的缺陷。 构成：在基板上形成平坦化层和转印层。 在平坦化层和转印层上形成UV-硬化树脂（10）。 在UV硬化树脂上形成石英模板（12）。 紫外线硬化树脂通过紫外线辐射（14）硬化。 石英模板和UV硬化树脂彼此分离。

    Lithography meandering order
    2.
    发明专利
    Lithography meandering order 有权
    LITHOGRAPHY MEANDERING ORDER

    公开(公告)号：JP2009065135A

    公开(公告)日：2009-03-26

    申请号：JP2008203107

    申请日：2008-08-06

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： SCHRAM IVAR ,  DIJKSMAN JOHAN FREDERIK ,  WUISTER SANDER FREDERIK ,  KRUIJT-STEGEMAN YVONNE WENDELA ,  LAMMERS JEROEN HERMAN ,  SCHROEDERS RICHARD JOSEPH MARI

    IPC: H01L21/027 ,  B29C59/02

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/7035 ,  G03F7/70425 ,  G03F7/70433

    Abstract: PROBLEM TO BE SOLVED: To provide an imprint lithography method and an apparatus that may obviate or mitigate the issue that a magnification error may occur in different parts of a substrate when applying patterns to the substrate and devices which are formed from these patterns may, e.g., not function consistently with respect to one another. SOLUTION: The imprint lithography method includes imprinting a plurality of patterns in an imprintable medium provided on the substrate, wherein the order in which the patterns are imprinted in the imprintable medium is such that, for the majority of the patterns, two consecutively imprinted patterns are not imprinted adjacent to one another. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供压印光刻方法和装置，其可以消除或减轻当将图案应用于基板时由基板和由这些图案形成的装置的基板的不同部分可能发生放大误差的问题 可能例如不能相对于彼此一致地运作。 压印光刻方法包括在设置在基板上的可压印介质中印刷多个图案，其中图案印刷在可压印介质中的顺序为：对于大多数图案，连续两个 印记图案不会彼此相邻印刷。 版权所有（C）2009，JPO＆INPIT

    Imprint lithography
    3.
    发明专利
    Imprint lithography 有权
    IMPRINT LITHOGRAPHY

    公开(公告)号：JP2009081421A

    公开(公告)日：2009-04-16

    申请号：JP2008211243

    申请日：2008-08-20

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： WUISTER SANDER FREDERIK ,  DIJKSMAN JOHAN FREDERIK ,  KRUIJT-STEGEMAN YVONNE WENDELA ,  SCHRAM IVAR ,  LAMMERS JEROEN HERMAN ,  SCHROEDERS RICHARD JOSEPH MARI

    IPC: H01L21/027 ,  B29C59/02

    CPC classification number: H01L21/683 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  Y10S269/903

    Abstract: PROBLEM TO BE SOLVED: To provide a chuck apparatus provided with a second surface portion deflecting gas over a substrate held on a first surface portion, and holding the substrate. SOLUTION: The chuck apparatus includes the first surface portion on which the substrate is to be held and the second surface portion adjacent to the first surface portion and extending at least partially around an edge of the first surface portion and which, in use, is arranged to deflect gas over the first surface portion and thus the substrate that is to be held on the first surface portion. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种卡盘装置，其具有在保持在第一表面部分上的基板上偏转气体的第二表面部分，并且保持基板。 解决方案：卡盘装置包括要保持基板的第一表面部分和与第一表面部分相邻的第二表面部分并且至少部分地围绕第一表面部分的边缘延伸并且在使用中 被布置成使气体偏转在第一表面部分上，并因此偏转待保持在第一表面部分上的基底。 版权所有（C）2009，JPO＆INPIT

    Imprint lithography
    4.
    发明专利
    Imprint lithography 有权
    IMPRINT LITHOGRAPHY

    公开(公告)号：JP2008042187A

    公开(公告)日：2008-02-21

    申请号：JP2007182903

    申请日：2007-07-12

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： SCHRAM IVAR ,  DIJKSMAN JOHAN F ,  WUISTER SANDER F ,  KRUIJT-STEGEMAN YVONNE W ,  LAMMERS JEROEN HERMAN

    IPC: H01L21/027 ,  B41J2/01 ,  B82B3/00

    CPC classification number: B05D5/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    Abstract: PROBLEM TO BE SOLVED: To provide an improved imprint lithography method and equipment capable of eliminating or reducing variation in physical property of an imprintable medium, etc. SOLUTION: A method of depositing the imprintable medium onto a target area of a substrate for the imprint lithography is disclosed. The method includes moving the substrate, a print head comprising a nozzle to eject an imprintable medium onto the substrate, or both, relative to the other in a first direction across the target area while ejecting a first series of droplets of imprintable medium onto the substrate, and moving the substrate, the print head, or both, relative to the other in a second opposing direction across the target area while ejecting a second series of droplets of imprintable medium onto the substrate on or adjacent to droplets from the first series of droplets. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供能够消除或减少可压印介质的物理性能的改进的压印光刻方法和设备等。解决方案：一种将可压印介质沉积到目标区域上的方法 公开了一种用于压印光刻的衬底。 该方法包括移动基板，包括喷嘴的打印头，以在横过目标区域的第一方向上相对于另一方弹出可压印介质，同时将可压印介质的第一系列液滴喷射到基板上 并且相对于另一个在第二相对方向上跨过目标区域移动基板，打印头或两者，同时在第一系列液滴上或与液滴相邻的基板上喷射可压印介质的第二系列液滴 。 版权所有（C）2008，JPO＆INPIT

    Apparatus and method for imprint lithography
    5.
    发明专利
    Apparatus and method for imprint lithography 有权
    装置和方法用于印刷图

    公开(公告)号：JP2011082514A

    公开(公告)日：2011-04-21

    申请号：JP2010220095

    申请日：2010-09-30

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： LAMMERS JEROEN HERMAN ,  WUISTER SANDER FREDERIK ,  KRUIJT-STEGEMAN YVONNE WENDELA ,  KOOLE ROELOF

    IPC: H01L21/027 ,  B29C59/02

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    Abstract: PROBLEM TO BE SOLVED: To provide imprint lithography for achieving lower levels of the defects caused by a void. SOLUTION: The imprint lithography method includes a step of bringing a patterned surface into contact with an imprintable liquid medium for a filling period. Light, such as scattered or reflected, emitted from an interface between the medium and the patterned surface is collected and measured during the filling period to obtain data concerning one or more voids at the interface, and an end time for the filling period is derived from a relationship between the data and time. The method may allow subsequent process steps to be performed further rapidly to reduce risk of defects arising from remnants of unfilled voids. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：提供压印光刻以实现由空隙引起的较低水平的缺陷。 压印光刻方法包括使图案化表面与可压印液体介质接触以进行填充时间的步骤。 在填充期间收集和测量从介质和图案化表面之间的界面发射的诸如散射或反射的光，以获得关于界面处的一个或多个空隙的数据，并且填充周期的结束时间从 数据和时间之间的关系。 该方法可以允许进一步快速进行随后的工艺步骤，以减少由未填充空隙的残余物引起的缺陷的风险。 版权所有（C）2011，JPO＆INPIT

    Imprint lithography method and apparatus
    7.
    发明专利
    Imprint lithography method and apparatus 有权
    印刷方法和装置

    公开(公告)号：JP2010183076A

    公开(公告)日：2010-08-19

    申请号：JP2010016186

    申请日：2010-01-28

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： WUISTER SANDER FREDERIK ,  DIJKSMAN JOHAN FREDERIK ,  KRUIJT-STEGEMAN YVONNE WENDELA ,  LAMMERS JEROEN HERMAN ,  VAN DER TEMPEL LEENDERT

    IPC: H01L21/027 ,  B29C59/02

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    Abstract: PROBLEM TO BE SOLVED: To improve the throughput of an imprint lithography process. SOLUTION: A imprint lithography method includes: a step of imprinting a pattern to an imprintable medium by using an imprint template so as to imprint the pattern to a ceratin area of a substrate provided with a plurality of drops of the imprintable medium with a first configuration; and a step of imprinting a pattern to an imprintable medium by using the same imprint template so as to imprint the pattern to a certain area of a substrate provided with a plurality of drops of the imprintable medium with a second configuration, wherein the first configuration of drops of the imprintable medium is different from the second configuration of drops of the imprintable medium. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提高压印光刻工艺的生产量。 压印光刻方法包括：通过使用压印模板将图案压印到可压印介质上的步骤，以将图案印刷到设置有多个可压印介质的液滴的基板区域， 第一种配置; 以及通过使用相同的印模模板将图案压印到可压印介质的步骤，以便将图案印刷到具有第二配置的设置有多个可压印介质的液滴的基板的特定区域，其中第一配置 可压印介质的液滴与可压印介质的液滴的第二配置不同。 版权所有（C）2010，JPO＆INPIT

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