3.
    发明专利
    未知

    公开(公告)号:DE59302278D1

    公开(公告)日:1996-05-23

    申请号:DE59302278

    申请日:1993-05-05

    Applicant: BASF AG

    Abstract: PCT No. PCT/EP93/01090 Sec. 371 Date Oct. 19, 1994 Sec. 102(e) Date Oct. 19, 1994 PCT Filed May 5, 1993 PCT Pub. No. WO93/23377 PCT Pub. Date Nov. 25, 1993A process for the preparation of N-allyl compounds of the general formula I I in which denotes a nitrogen-containing heterocyclic compound, R1, R3, and R4 independently denote hydrogen or C1-C4 alkyl, R2 denotes hydrogen or methyl, n is equal to 1, 2, 3, or 4, and X denotes a water-solubilizing anion, wherein a compound of formula II II is caused to react, in aqueous medium, with a compound of formula III III in which A denotes a radical which can be eliminated as an anion. The compounds produced by the process of the invention are very well suited for use as brighteners in nickel electroplating.

    USE OF THIOUREA SALTS AS BRIGHTENERS FOR AQUEOUS-ACID GALVANIC NICKEL BATHS

    公开(公告)号:CA2150906A1

    公开(公告)日:1994-06-23

    申请号:CA2150906

    申请日:1993-12-02

    Applicant: BASF AG

    Abstract: Nickel-plated shaped parts are produced by galvanic precipitation of nickel from aqueous-acid baths which contain as essential constituents one or several nickel salts, one or several inorganic acids and one or several brighteners. As brighteners are used thiourea salts having general formula (I), in which R1 to R4 stand for hydrogen, C1 to C18-alkyl, which may be substituted by carboxyl groups, C1 to C4-alkoxycarbonyl groups or cyano groups, C2 to C12alkenyl, C2 to C12-alkinyl, C5 to C8-cycloalkyl, C7 to C12-phenylalkyl or phenyl, which may be substituted by one or two C1 to C4-alkyl residues, C1 to C4-alkoxy residues, halogen atoms, hydroxyl groups, phenyl groups, phenyl residues or C1 to C4 alkoxycarbonyl groups; Y stands for a chemical bond or for linear or branched alkylene, alkenylene or alkinylene having each up to 20 C atoms; A stands for hydrogen or a group having the formulae: -CO-H, -CO-R5, -CO-OH, -CO-OR5, -CO-NR6R7, -CO-CH2-CO-OR5, -O-CO-H, -O-CO-R5, -NR6-CO-R5, -NR6-CO-R5, -OR5, -SO2-R5, -SO2-OH, -SO2-OR5, -PO(PH)2,-PO(OH)(OR5),-PO(OR5)2, OPO(OH)2 -OPO(PH)(PR5) or -OPO(OR5)2 in which R5 stands for C1 to C12-alkyl, C2 to C12-alkenyl, C2 toC12-alkinyl, C5 to C8-cycloalkyl, C7 to C12-phenylalkyl or phenyl, which may be substituted bo one or two C1 to C4-alkyl residues, halogen atoms, hydroxyl groups, phenyl residues or C1 to C4-alkoxycarbonyl groups; and R6 and R7 stand for hydrogen or C1 to C4-alkyl; n is a number from 1 to 4 and X(?) stands for a water solubility-promoting, n-valent inorganic or organic anion.

    PROCESS FOR PREPARING N-ALLYL COMPOUNDS

    公开(公告)号:CA2118308A1

    公开(公告)日:1993-11-25

    申请号:CA2118308

    申请日:1993-05-05

    Applicant: BASF AG

    Abstract: 2118308 9323377 PCTABS00028 A process is disclosed for preparing N-allyl compounds having general formula (I), in which (II) stands for a N-containing aromatic heterocycle; R1, R3 and R4 represent independently from each other hydrogen or C1-C4-alkyl; R2 stands for hydrogen or methyl; n equals 1, 2, 3 or 4 and X- is an anion for rendering water-soluble. The process is characterized in that compounds having formula (II) are reacted in an aqueous medium with compounds having formula (III), in which A stands for a residue which can be split as an anion. These compounds are very suitable as brighteners for nickel-plating.

    8.
    发明专利
    未知

    公开(公告)号:ES2092885T3

    公开(公告)日:1996-12-01

    申请号:ES94901946

    申请日:1993-12-02

    Applicant: BASF AG

    Abstract: PCT No. PCT/EP93/03383 Sec. 371 Date Jun. 15, 1995 Sec. 102(e) Date Jun. 15, 1995 PCT Filed Dec. 2, 1993 PCT Pub. No. WO94/13862 PCT Pub. Date Jun. 23, 1994Nickel-plated shaped parts are produced by galvanic precipitation of nickel from aqueous-acid baths which contain as essential constituents one or several nickel salts, one or several inorganic acids and one or several brighteners. As brighteners are used thiourea salts having general formula (I), in which R1 to R4 stand for hydrogen, C1 to C18-alkyl, which may be substituted by carboxyl groups, C1 to C4-alkoxycarbonyl groups or cyano groups, C2 to C12-alkenyl, C2 to C12-alkinyl, C5 to C8-cycloalkyl, C7 to C12-phenylalkyl or phenyl, which may be substituted by one or two C1 to C4-alkyl residues, C1 to C4-alkoxy residues, halogen atoms, hydroxyl groups, phenyl groups, phenyl residues or C1 to C4 alkoxycarbonyl groups; Y sands for a chemical bond or for linear or branched alkylene, alkenylene or alkinylene having each up to 20 C. atoms; A stands for hydrogen or a group having the formulae: -CO-H, -CO-R5, -CO-OH, -CO-OR5, -CO-NR6R7, -CO-CH2-CO-OR5, -O-CO-H, -O-CO-R5, -NR6-CO-R5, -NR6-CO-R5, -OR5, -SO2-R5, -SO2-OH, -SO2-OR5, -PO(PH)2, -PO(OH)(OR5), -PO(OR5)2, OPO(OH)2, -OPO(PH)(PR5) or -OPO(OR5)2 in which R5 stands for C1 to C12-alkyl, C2 to C12-alkenyl, C2 to C12-alkinyl, C5 to C8-cycloalkyl, C7 to C12-phenylalkyl or phenyl, which may be substituted by one or two C1 to C4-alkyl residues, halogen atoms, hydroxyl groups, phenyl residues or C1 to C4-alkoxycarbonyl groups; and R6 and R7 stand for hydrogen or C1 to C4-alkyl; n is a number from 1 to 4 and X(-) stands for s water solubility-promoting, n-valent inorganic or organic anion.

    9.
    发明专利
    未知

    公开(公告)号:DE59703612D1

    公开(公告)日:2001-06-28

    申请号:DE59703612

    申请日:1997-09-04

    Applicant: BASF AG

    Abstract: PCT No. PCT/EP97/04813 Sec. 371 Date Mar. 5, 1999 Sec. 102(e) Date Mar. 5, 1999 PCT Filed Sep. 4, 1997 PCT Pub. No. WO98/10023 PCT Pub. Date Mar. 12, 1998Aqueous polymer dispersions based on copolymers of C2-C14 olefins and monomers which contain acidic functional groups or are able to form them by hydrolysis, which dispersions may also contain colorants and/or corrosion inhibitors dispersed or dissolved in the polymer phase, are used for protecting metallic surfaces against corrosion.

    10.
    发明专利
    未知

    公开(公告)号:DE19809540A1

    公开(公告)日:1999-09-09

    申请号:DE19809540

    申请日:1998-03-05

    Applicant: BASF AG

    Abstract: The invention relates to water-absorbing, cross-linked polymerizates which are in the form of a foam and which can be obtained by (I) foaming a polymerizable aqueous mixture which contains: (a) acid groups containing monoethylenically unsaturated monomers which are optionally neutralized; (b) optional other monoethylenically unsaturated monomers; (c) cross-linking agents; (d) initiators; (e) 0.1 to 20 wt. % of at least one surface active agent; (f) optionally at least one dissolving mediator; and (g) optional thickeners, foam stabilizers, polymerization chain transfer agents, fillers and/or cell nucleating agents. Fine bubbles of a gas which is inert against radicals causes foaming by dispersion in the polymerizable aqueous mixture. The inventive polymerizates can also be obtained by (II) polymerizing the foamed mixture by forming a hydrogel which is in the form of a foam, whereby at least 20 mol % of the monomers (a) containing acid groups are neutralized with tertiary alkanolamines and/or the free acid groups of the hydrogel in the form of a foam are neutralized with at least one alkanolamine to at least 20 mol % after the polymerization, and the water content of the polymerizate which is in the form of a foam is set at 1 to 60 wt. %. The invention additionally relates to a method for producing the inventive polymerizates and to the utilization thereof in sanitary articles which are used for absorbing body fluids and in bandaging material used for covering wounds.

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