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    1.
    发明专利
    未知

    公开(公告)号：ES2201621T3

    公开(公告)日：2004-03-16

    申请号：ES99122884

    申请日：1999-11-18

    Applicant: BASF AG

    Inventor： HABECK THORSTEN DR ,  PRECHTL FRANK DR ,  WUNSCH THOMAS DR ,  WESTENFELDER HORST

    IPC: A61K8/00 ,  A61K8/30 ,  A61K8/40 ,  A61K8/49 ,  A61K31/275 ,  A61K31/277 ,  A61Q1/00 ,  A61Q1/04 ,  A61Q17/04 ,  A61Q19/00 ,  C07C255/37 ,  A61K7/42

    Abstract: alpha -Alkyl-styryl derivatives (I) are used as photostable UV-filter in cosmetic or pharmaceutical compositions for protecting the human skin or hair against the sun light, optionally combined with other components absorbing in the UV range. alpha -Alkyl-styryl derivatives of formula (I) are used as photostable UV-filter in cosmetic or pharmaceutical compositions for protecting the human skin or hair against the sun light, optionally combined with other components absorbing in the UV range. R , R = H, OH, NH2, 1-12C alkyl, 1-12C alkoxy, 1-12C alkylamino, 1-12C dialkylamino, water soluble substituents such as carboxylate, sulfonate or ammonium residues; R , R = COOR , COR , CONR R or CN; R = 1-12C alkyl; R , R = H, 1-12C alkyl, 2-10C alkenyl, 3-10C cycloalkyl, 3-10C cycloalkenyl, aryl or heteroaryl (all optionally substituted); A = O, S or NR B' = 1-12C alkylene, 4-12C cycloalkylene, 8-22C aralkylene, 9-21C monooxoaralkylene or -(X)n-Y'-; R = H or 1-12C alkyl; X = -(CH2)2-Z-, -(CH2)3-Z-, -CH(CH3)2-CH2-Z-, -(CH2)4-Z- or -CH2-CH(CH2-CH3)-Z-; Y' = -(CH2)2-, -(CH2)3-, -CH(CH3)-CH2-, -(CH2)4- or -CH2-CH(CH2-CH3)-; Z = O or S; n = 1-150; two of R , R and R = form 5- to 6-membered ring fused to the benzene ring. An Independent claim is also included for a sunscreen comprising the cosmetic and pharmaceutical composition for protecting the human epidermis and hair against UV light (280-400 nm) containing (I).

    EMPLEO DE ENAMINAS CICLICAS COMO AGENTES PROTECTORES CONTRA LA LUZ.
    4.
    发明专利
    EMPLEO DE ENAMINAS CICLICAS COMO AGENTES PROTECTORES CONTRA LA LUZ. 未知

    公开(公告)号：ES2272214T3

    公开(公告)日：2007-05-01

    申请号：ES00110272

    申请日：2000-05-22

    Applicant: BASF AG

    Inventor： HABECK THORSTEN DR ,  PRECHTL FRANK DR ,  WUNSCH THOMAS DR ,  WESTENFELDER HORST

    IPC: A61K8/49 ,  C07D233/64 ,  A61K8/00 ,  A61K8/02 ,  A61K8/06 ,  A61K47/22 ,  A61Q1/00 ,  A61Q1/04 ,  A61Q17/04 ,  C07D235/16 ,  C07D239/70 ,  C07D263/56 ,  C07D277/64 ,  C08K5/3447 ,  C08K5/35 ,  C08K5/47

    Abstract: Empleo de compuestos de la fórmula I (Ver fórmula) en la que R1 y R2 son restos iguales o diferentes, electrófilos, elegidos entre el grupo constituido por ciano, alquilcarbonilo o arilcarbonilo, alquiloxicarbonilo o ariloxicarbonilo y aminocarbonilo, substituido en caso dado, R3 significa un átomo de hidrógeno, un resto alquilo con 1 hasta 20 átomos de carbono o un resto cicloalquilo con 3 hasta 20 átomos de carbono o un resto de la fórmula -CH2-CH2-SO3-M+, donde M+ significa un catión, X significa el resto divalente del oxígeno, del azufre o significa el resto (Ver fórmula) donde R3 tiene el significado anteriormente indicado, Z significa el resto divalente de las fórmulas II o III, que forman un sistema anillado con el resto de la fórmula I (Ver fórmula) pudiendo estar enlazado R4 una o varias veces sobre el anillo de bencilideno I o bien del anillo de naftilideno II, y significa hidrógeno, alquilo, cicloalquilo, alquiloxi, cicloalquiloxi, alcoxicarbonilo, monoalquilaminocarbonilo o dialquilaminocarbonilo, alquilamino, dialquilamino, todos ellos respectivamente con hasta 20 átomos de carbono, así como ciano, amino y SO3-M+, donde M+ significa un catión metálico, como filtros fotoestables para los UV en preparaciones cosméticas y farmacéuticas para la protección de la piel humana y del cabello humano contra las irradiaciones solares, solos o junto con compuestos absorbedores en el intervalo de los UV, en sí conocidos para las preparaciones cosméticas y farmacéuticas.

    8.
    发明专利
    未知

    公开(公告)号：ES2217475T3

    公开(公告)日：2004-11-01

    申请号：ES98119094

    申请日：1998-10-09

    Applicant: BASF AG

    Inventor： HABECK THORSTEN DR ,  HAREMZA SYLKE DR ,  SCHEHLMANN VOLKER DR ,  WESTENFELDER HORST ,  WUNSCH THOMAS DR

    IPC: A61K8/00 ,  A61K8/40 ,  A61K31/00 ,  A61P17/00 ,  A61P17/16 ,  A61Q1/04 ,  A61Q17/04 ,  A61K7/42 ,  A61K31/275

    Abstract: Photo-stable ultraviolet (UV) filters for cosmetic or pharmaceutical use consist of substituted alpha -methyl-styrene derivatives (I). The use of substituted alpha -methyl-styrene derivatives of formula (I), optionally in combination with conventional UV absorbers, as photo-stable UV filters in cosmetic or pharmaceutical preparations for protecting human skin or hair against sunlight is new. R1 = 4-10C alkoxy, 1-12C alkylamino, 1-12C dialkylamino (sic) or a water-solublizing group selected from carboxylate, sulfonate and ammonium residues; R2 = H, 2-10C alkyl or 1-12C alkoxy; R3,R4 = COOR5, COR5, CONR5R6 or CN, R4 and R5 being the same; R5,R6 = H, 1-12C alkyl, 2-10C alkenyl, 3-10C cycloalkyl, 3-10C cycloalkenyl, aryl or heteroaryl (optionally substituted). Independent claims are given for: (1) the use of (I) as photostable UV-A filters; (2) the use of (I) as UV stabilizers; (3) cosmetic and pharmaceutical compositions for protecting human epidermis or skin against UV light in the 280-400 nm region, comprising a carrier containing (I) (as photostable UV filter) and optionally conventional UV absorbers; (4) (I) for use as medicaments; and (5) pharmaceutical preparations containing (I).

    9.
    发明专利
    未知

    公开(公告)号：ES2205680T3

    公开(公告)日：2004-05-01

    申请号：ES99122878

    申请日：1999-11-18

    Applicant: BASF AG

    Inventor： HABECK THORSTEN DR ,  WUNSCH THOMAS DR ,  WESTENFELDER HORST

    IPC: A61K8/00 ,  A61K8/40 ,  A61Q17/00 ,  A61Q17/04 ,  C07C67/343 ,  C07C69/618 ,  C07C253/30 ,  C07C255/41 ,  C09K3/00 ,  A61K7/42

    Abstract: New oligomeric 4,4-diarylbutadiene carboxylic acid ester or amide sunscreen compounds. Oligomeric 4,4-diarylbutadiene carboxylic acid esters or amides of formula (I) are new. R1, R2 = H; aliphatic-, cycloaliphatic-, aromatic- or araliphatic- group; or carboxylate, sulfonate or ammonium; R3 = aliphatic, cycloaliphatic, aromatic, araliphatic or heterocyclic group; carbonyl, sulfonyl, phosphonyl, carboxylic acid ester or CN; Y = O or N(R4); R4 = H or aliphatic-, cycloaliphatic-, aromatic-,araliphatic or heterocyclic group; m = 2-10; n = 1-3 X = the residue of a polyol with 2-10 OH groups (corresponding to m). Am Independent claim is included for preparation of (I).

    Use of cyclic enamines as light protection agents
    10.
    发明专利
    Use of cyclic enamines as light protection agents 未知

    公开(公告)号：AU4089900A

    公开(公告)日：2000-12-21

    申请号：AU4089900

    申请日：2000-06-16

    Applicant: BASF AG

    Inventor： HABECK THORSTEN DR ,  PRECHTL FRANK DR ,  WUNSCH THOMAS DR ,  WESTENFELDER HORST

    IPC: C07D233/64 ,  A61K8/00 ,  A61K8/02 ,  A61K8/06 ,  A61K8/49 ,  A61K47/22 ,  A61Q1/00 ,  A61Q1/04 ,  A61Q17/04 ,  C07D239/70 ,  C07D263/56 ,  C07D277/64 ,  A61K31/498 ,  A61K31/538 ,  A61K31/5415 ,  A61K7/42

    Abstract: Use of new and known bicyclic and tricyclic enamines as UV filters in cosmetic and pharmaceutical preparations is new. Also new is their use for the protection of plastics. Use of bicyclic and tricyclic enamines as UV filters in cosmetic and pharmaceutical preparations is new. R and R = CN; alkylcarbonyl; alkoxycarbonyl; aryloxycarbonyl; or optionally substituted aminocarbonyl; R = H; 1-20C alkyl; 3-20C cycloalkyl; or -CH2-CH2-SO3 M ; M = cation; X = -O-; -S-; or -N(R )-; Z' = group of formula (ii) or (iii): R = H; alkyl, cycloalkyl, alkoxy, cycloalkoxy, alkoxycarbonyl, alkyl-NH-CO-, (alkyl)2-NH-CO-, alkyl-NH- or (alkyl)2N- (each with up to 20C); CN; NH2; or SO3 M and more than 1 R can be present. Independent claims are also included for: (1) the use of compounds (I) as light screening agents for the protection of plastics; (2) (I; Z' = (iii); and (3) (I; Z' = (ii); R4 = R40; R1, R2 = R10, R20 respectively) R and R = CN or 2-10C alkoxycarbonyl optionally substituted with -(CH2)n-SO3 M ; R = H; CH3; or -(CH2)n-SO3 M ; R = H; 1-8C alkyl; 1-8C alkoxy; or -SO3 M ; n = 2 or 3; M = H or HN(R )(R )(R ) ; R -R = H lower alkyl optionally substituted with OH; or a metal cation; but at least one -(CH2)n-SO3 M or -SO3 M must be present.

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