-
1.发明公开A PROCESS FOR THE MANUFACTURE OF SEMICONDUCTOR DEVICES COMPRISING THE CHEMICAL MECHANICAL POLISHING OF ELEMENTAL GERMANIUM AND/OR Si1-XGeX MATERIAL IN THE PRESENCE OF A CMP COMPOSITION HAVING A pH VALUE OF 3.0 TO 5.5 审中-公开用于生产半导体部件WITH化学 - 机械抛光，基础锗和/或SI1-xGex材料在CMP组合物与3.0至5.5的pH THE PRESENCE
公开(公告)号：EP2741892A4
公开(公告)日：2015-03-18
申请号：EP12819369
申请日：2012-07-30
Applicant: BASF SE
Inventor： NOLLER BASTIAN MARTEN , DRESCHER BETTINA , GILLOT CHRISTOPHE , LI YUZHOU
IPC: H01L21/306 , B24B37/04 , C09G1/02 , C09K3/14
CPC classification number: H01L21/30625 , B24B37/044 , C09G1/02 , C09K3/1463 , H01L21/02024
Search Results
1
records
(took 0.021 seconds)
筛选
AND
AND
过滤
NOT
NOT
Scan to Join
