Abstract:
Manufacture of a microchannel plate may be improved using photoelectrochemic al etching and thin film activation such as CVD and nitriding and oxidizing wal l surface portions (28) of pores (12) formed in the substrate (10). The pore pattern may be changed by oxidizing and etching the substrate prior to activation.
Abstract:
A method for manufacturing a discrete dynode electron multiplier includes employing micromachining and thin film techniques to produce tapered apertures in an etchable substrate, bonding the substrates together and activating the internal surfaces of the etched substrate using chemical vapor deposition or oxidizing and nitriding techniques.
Abstract:
A method for manufacturing a discrete dynode electron multiplier includes employing micromachining and thin film techniques to produce tapered apertures in an etchable substrate, bonding the substrates together and activating the internal surfaces of the etched substrate using chemical vapor deposition or oxidizing and nitriding techniques.