公开(公告)号：NO753120A

公开(公告)日：1976-03-16

申请号：NO753120

申请日：1975-09-12

Applicant: HOECHST AG

Inventor： ENGELHARDT F ,  HILLE M ,  ULMSCHNEIDER D

IPC: C09K8/04 ,  C08F20/42 ,  C08F20/52 ,  C08F26/00 ,  C08F28/00 ,  C08F220/10 ,  C08F220/14 ,  C08F220/44 ,  C08F220/56 ,  C08F226/02 ,  C08F228/02 ,  C09K8/24 ,  E21B21/00 ,  C09K

CPC classification number: C09K8/24

公开(公告)号：BR7505898A

公开(公告)日：1976-08-03

申请号：BR7505898

申请日：1975-09-12

Applicant: HOECHST AG

Inventor： ENGELHARDT F ,  HILLE M ,  ULMSCHNEIDER D

IPC: C09K8/04 ,  C08F20/42 ,  C08F20/52 ,  C08F26/00 ,  C08F28/00 ,  C08F220/10 ,  C08F220/14 ,  C08F220/44 ,  C08F220/56 ,  C08F226/02 ,  C08F228/02 ,  C09K8/24 ,  E21B21/00 ,  C09K7/02

Abstract: An aqueous clay base mud for deep drilling containing as a protective colloid a copolymer which is constituted by the formula I, II and III I, II, III IN WHICH R1 and R2 each is hydrogen of -CH3; R3 is -CO-NH2, -CN or COOCH3; R4 is hydrogen, -CH3 or -C2H5; R5 is -CH3 or -C2H5 or R4 and R5 together represent a propylene group forming a pyrrolidone radical with the inclusion of the radical Me is ammonium, potassium, sodium or lithium and x is 5 to 50, y 25 to 92 and z 3 to 70, OR BY THE SAPONIFICATION PRODUCTS THEREOF AND WHICH CONTAINS THE COMPONENTS IN THE PARTS BY WEIGHT OF THE STARTING MONOMERS INDICATED BY THE INDICES X, Y AND Z.

公开(公告)号：SE336086B

公开(公告)日：1971-06-21

申请号：SE1605868

申请日：1968-11-26

Applicant: HOECHST AG

Inventor： LAUBE K ,  ULMSCHNEIDER D ,  NISCHWITZ E

IPC: D21H17/45 ,  D21F1/66 ,  D21H3/38

公开(公告)号：DE2444108C2

公开(公告)日：1978-01-19

申请号：DE2444108

申请日：1974-09-14

Applicant: HOECHST AG

Inventor： ENGELHARDT F ,  HILLE M ,  ULMSCHNEIDER D

IPC: C09K8/04 ,  C08F20/42 ,  C08F20/52 ,  C08F26/00 ,  C08F28/00 ,  C08F220/10 ,  C08F220/14 ,  C08F220/44 ,  C08F220/56 ,  C08F226/02 ,  C08F228/02 ,  C09K8/24 ,  E21B21/00

Abstract: An aqueous clay base mud for deep drilling containing as a protective colloid a copolymer which is constituted by the formula I, II and III I, II, III IN WHICH R1 and R2 each is hydrogen of -CH3; R3 is -CO-NH2, -CN or COOCH3; R4 is hydrogen, -CH3 or -C2H5; R5 is -CH3 or -C2H5 or R4 and R5 together represent a propylene group forming a pyrrolidone radical with the inclusion of the radical Me is ammonium, potassium, sodium or lithium and x is 5 to 50, y 25 to 92 and z 3 to 70, OR BY THE SAPONIFICATION PRODUCTS THEREOF AND WHICH CONTAINS THE COMPONENTS IN THE PARTS BY WEIGHT OF THE STARTING MONOMERS INDICATED BY THE INDICES X, Y AND Z.

公开(公告)号：NO753120L

公开(公告)日：1976-03-16

申请号：NO753120

申请日：1975-09-12

Applicant: HOECHST AG

Inventor： ENGELHARDT F ,  HILLE M ,  ULMSCHNEIDER D

IPC: C09K8/04 ,  C08F20/42 ,  C08F20/52 ,  C08F26/00 ,  C08F28/00 ,  C08F220/10 ,  C08F220/14 ,  C08F220/44 ,  C08F220/56 ,  C08F226/02 ,  C08F228/02 ,  C09K8/24 ,  E21B21/00 ,  C09K

Abstract: An aqueous clay base mud for deep drilling containing as a protective colloid a copolymer which is constituted by the formula I, II and III I, II, III IN WHICH R1 and R2 each is hydrogen of -CH3; R3 is -CO-NH2, -CN or COOCH3; R4 is hydrogen, -CH3 or -C2H5; R5 is -CH3 or -C2H5 or R4 and R5 together represent a propylene group forming a pyrrolidone radical with the inclusion of the radical Me is ammonium, potassium, sodium or lithium and x is 5 to 50, y 25 to 92 and z 3 to 70, OR BY THE SAPONIFICATION PRODUCTS THEREOF AND WHICH CONTAINS THE COMPONENTS IN THE PARTS BY WEIGHT OF THE STARTING MONOMERS INDICATED BY THE INDICES X, Y AND Z.

公开(公告)号：DE2444108B1

公开(公告)日：1976-01-15

申请号：DE2444108

申请日：1974-09-14

Applicant: HOECHST AG

Inventor： ENGELHARDT F ,  HILLE M ,  ULMSCHNEIDER D

IPC: C09K8/04 ,  C08F20/42 ,  C08F20/52 ,  C08F26/00 ,  C08F28/00 ,  C08F220/10 ,  C08F220/14 ,  C08F220/44 ,  C08F220/56 ,  C08F226/02 ,  C08F228/02 ,  C09K8/24 ,  E21B21/00 ,  C09K7/02

Abstract: An aqueous clay base mud for deep drilling containing as a protective colloid a copolymer which is constituted by the formula I, II and III I, II, III IN WHICH R1 and R2 each is hydrogen of -CH3; R3 is -CO-NH2, -CN or COOCH3; R4 is hydrogen, -CH3 or -C2H5; R5 is -CH3 or -C2H5 or R4 and R5 together represent a propylene group forming a pyrrolidone radical with the inclusion of the radical Me is ammonium, potassium, sodium or lithium and x is 5 to 50, y 25 to 92 and z 3 to 70, OR BY THE SAPONIFICATION PRODUCTS THEREOF AND WHICH CONTAINS THE COMPONENTS IN THE PARTS BY WEIGHT OF THE STARTING MONOMERS INDICATED BY THE INDICES X, Y AND Z.

公开(公告)号：SE322627B

公开(公告)日：1970-04-13

申请号：SE1405463

申请日：1963-12-17

Applicant: HOECHST AG

Inventor： BARTMANN W ,  ULMSCHNEIDER D ,  BEERMANN C ,  EHMANN W

IPC: C08F2/18 ,  C08F2/20 ,  C08F2/22 ,  C08F4/00 ,  C08F271/00 ,  C08F1/11 ,  C08F15/00 ,  C08F25/00 ,  C08F27/08 ,  C08F47/18

Abstract: Compounds having the formula in which R1 is hydrogen or CH3 and R2 is chlorine, C6H5, OOC.R3 or COOR4, R3 being hydrogen or a monovalent saturated aliphatic hydrocarbon radical containing 1-18 carbon atoms and R4 being a monovalent saturated aliphatic hydrocarbon radical containing 1-8 carbon atoms are polymerized by a free radical method in aqueous phase in the presence of a polymer or copolymer of an open chain N-vinyl-amide of formula in which R5 and R6 each represent hydrogen or a hydrocarbon radical containing 1-20 carbon atoms. The amount of polyvinyl amide dispersing agent may vary from 0.1 to 50% by weight of the water used and the polymeric products obtained are thus either polymer dispersions or graft copolymers. Exemplified monomers polymerized are vinyl acetate, vinyl acetate with dibutyl maleate, styrene, methyl methacrylate, ethyl acrylate, ethyl hexyl acrylate and ethyl hexyl acrylate with vinyl chloride in the presence of di-n-hexyl-azelate plasticizer. Other conventional surface-active agents and catalysts are exemplified.