公开(公告)号：JPS54112173A

公开(公告)日：1979-09-01

申请号：JP78479

申请日：1979-01-10

Applicant: IBM

Inventor： ALBRECHT DREW EDWARD ,  DORAN SAMUEL KAY ,  MICHAIL MICHEL SALIB ,  YOURKE HANNON STANLEY

IPC: H01L21/027 ,  H01J37/21 ,  H01J37/304

公开(公告)号：DE2962859D1

公开(公告)日：1982-07-08

申请号：DE2962859

申请日：1979-01-24

Applicant: IBM

Inventor： ALBRECHT DREW EDWARD ,  DORAN SAMUEL KAY ,  MICHAIL MICHEL SALIB ,  YOURKE HANNON STANLEY

IPC: H01L21/027 ,  H01J37/21 ,  H01J37/304

Abstract: A method and apparatus for applying focus correction to an E-beam or charged particle system to compensate for wafer warp and mask tilt. In an electron beam system including a registration system which measures the position of four registration marks with the beam and calculates the apparent magnification error of a given chip, means are also provided for using magnification and rotation error information to calculate a height error factor and to apply a compensating current to a dynamic focusing coil of the electron beam to move the effective beam focal plane to a position which matches the wafer or mask plane at each chip site.