公开(公告)号：AT451433T

公开(公告)日：2009-12-15

申请号：AT06794016

申请日：2006-10-13

Applicant: IBM

Inventor： BROCK PHILIP ,  CHA JENNIFER ,  GIL DARIO ,  LARSON CARL ,  SUNDBERG LINDA ,  WALLRAFF GREGORY

IPC: C09D129/00 ,  C09D131/04 ,  G03F7/00

Abstract: A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises a polymer which is sparingly soluble or insoluble in water at a temperature of about 25° C. or below but soluble in water at a temperature of about 60° C. or above. The polymer contains poly vinyl alcohol monomer unit and a poly vinyl acetate or poly vinyl ether monomer unit having the following polymer structure: wherein R is an aliphatic or alicyclic radical; m and n are independently integers, and are the same or different; and p is zero or 1. The topcoat material may be used in lithography processes, wherein the topcoat material is applied on a photoresist layer. The topcoat material is particularly useful in immersion lithography techniques using water as the imaging medium. The topcoat material of the present invention are also useful for immersion lithography employing organic liquid as immersion medium.