公开(公告)号：DE3578261D1

公开(公告)日：1990-07-19

申请号：DE3578261

申请日：1985-03-21

Applicant: IBM

Inventor： GUILLAUME WALLACE JOSEPH ,  LOUGHRAN JOHN FARLEY ,  ROGOYSKI JAN ,  WEBER EDWARD VICTOR ,  SIMPSON ROBERT ARTHUR

IPC: H01L21/66 ,  G01B21/20 ,  G03F1/44 ,  G03F1/84 ,  H01J37/30 ,  H01L21/027 ,  G03B41/00

Abstract: A method of forming inspection patterns for inspecting a workpiece, e.g., for electron beam inspection of optical photomasks. The inspection patterns (Figure 5E) are formed from the workpiece patterns (Figure 5B) themselves by applying a first positive windage (Figure 5C) to the workpiece patterns, inverting (Figure 5D) the first positive windaged workpiece patterns and applying a second positive windage to the inverted first positive windaged workpiece patterns. The inspection patterns so produced will contain the requisite guard band and the requisite overlap of abutting patterns.