Method for computing manufacturability of lithographic mask using continuous differentiability of manufacturability defined on continuous scale
    2.
    发明专利
    Method for computing manufacturability of lithographic mask using continuous differentiability of manufacturability defined on continuous scale 有权
    使用连续定标定义的可制造性的连续差异化计算拼接掩模的制造方法

    公开(公告)号:JP2010140021A

    公开(公告)日:2010-06-24

    申请号:JP2009256225

    申请日:2009-11-09

    CPC classification number: G03F1/76 G03F1/36

    Abstract: PROBLEM TO BE SOLVED: To provide a method for computing manufacturability of a lithographic mask to be used for manufacturing a semiconductor device. SOLUTION: Target edge pairs are selected from the mask layout data of a lithographic mask for computinging a manufacturing penalty as an index indicating the difficulty of manufacturing in making a lithographic mask. The mask layout data includes polygons, and each polygon has a large number of edges. Each target edge pair is defined by two edges of edges of one or more of the polygons. The manufacturability of the lithographic mask, including the manufacturing penalty in making the lithographic mask, is determined. Determining the manufacturing penalty is based on the target edge pairs selected. Determining the manufacturability of the lithographic mask uses continuous differentiability of the maufacturability defined on a continuous scale. The manufacturability of the lithographic mask is output. The manufacturability of the lithographic mask is dependent on the manufacturing penalty in making the lithographic mask. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题:提供一种用于计算用于制造半导体器件的光刻掩模的可制造性的方法。

    解决方案:从用于计算制造罚款的光刻掩模的掩模布局数据中选择目标边缘对作为指示制造光刻掩模的制造难度的指标。 掩模布局数据包括多边形,并且每个多边形具有大量边缘。 每个目标边对由一个或多个多边形的边缘的两个边缘限定。 确定了光刻掩模的可制造性,包括制造光刻掩模的制造损失。 确定制造损失是基于所选择的目标边对。 确定平版印刷掩模的可制造性使用在连续刻度上定义的可制造性的连续可微性。 输出光刻掩模的可制造性。 光刻掩模的可制造性取决于制造光刻掩模的制造损失。 版权所有(C)2010,JPO&INPIT

    HOT SPOT SELECTION METHOD IN GRAPHICAL USER INTERFACE

    公开(公告)号:JP2000322169A

    公开(公告)日:2000-11-24

    申请号:JP12423599

    申请日:1999-04-30

    Applicant: IBM

    Abstract: PROBLEM TO BE SOLVED: To surely select a target hot spot to be selected. SOLUTION: On the assumption that a specification error is generated at the time of selecting a target hot spot to be selected, a pointer 4 having an area is used for rounding the specification error. A pointing area including the target hot spot is determined by using the pointer 4. Then hot spots overlapped with the pointing area are listed up. Then the listed-up hot spots are displayed by an enlarged display state. Finally the target hot spot 2 is selected from the enlarged hot spots.

    Mask design method, program, and mask design system
    5.
    发明专利
    Mask design method, program, and mask design system 有权
    MASK设计方法,程序和MASK设计系统

    公开(公告)号:JP2013213973A

    公开(公告)日:2013-10-17

    申请号:JP2012084657

    申请日:2012-04-03

    CPC classification number: G03F1/70

    Abstract: PROBLEM TO BE SOLVED: To provide a mask design method, a program thereof, and a mask design system.SOLUTION: The mask design system according to the present invention includes: an optimization unit 120 having a global mask optimization section 122 and a global light source optimization section 123; and an optical domain simultaneous optimization unit (FDJO) 124. The optimization unit 120 performs a non-linear optimization for an optical domain representation of a mask pattern under a constraint condition that a value of a negative deviation of the object domain representation at a prescribed evaluation point of a restored object domain representation is smaller than a value of a predetermined negative threshold of the evaluation point.

    Abstract translation: 要解决的问题:提供掩模设计方法,程序和掩模设计系统。根据本发明的掩模设计系统包括:具有全局掩模优化部分122和全局光的优化单元120 源优化部分123; 和光域同步优化单元(FDJO)124.优化单元120在限制条件下对掩模图案的光域表示执行非线性优化,所述约束条件是目标域表示在规定的负值偏差的值 恢复的对象域表示的评估点小于评估点的预定负阈值的值。

    METHOD AND DEVICE FOR ANALYZING ELECTRIC POWER CONSUMPTION

    公开(公告)号:JPH11202984A

    公开(公告)日:1999-07-30

    申请号:JP35433997

    申请日:1997-12-24

    Applicant: IBM

    Abstract: PROBLEM TO BE SOLVED: To make clear the relation of a power control signal and power consumption by detecting the change of the power control signal, storing it in a storage device, periodically measuring a signal concerning the power consumption of the components of a prescribed computer and signal concerning the power consumption of the entire computer and storing them in the storage device. SOLUTION: A power control signal 123 and a power signal 125 of a computer 100 as an object to be checked are inputted to an analyzer 113, the power control signal is monitored at every timing of a timer of the analyzer 113, and the change of the power control signal is recorded. Similarly, the power signal is monitored at every timing of the timer, and the power consumption is recorded. A memory 117 records data from a signal monitor 115, and the contents in the memory 117 are processed by a visualizing processor 119 and displayed on a display device 121. On the display device 121, the change of the power control signal and the change of power consumption are displayed on the same time base or the change of the contents of the power control instruction and the change of power consumption are displayed on the same time base.

    Method for computing manufacturability of lithographic mask by selecting target edge pair
    9.
    发明专利
    Method for computing manufacturability of lithographic mask by selecting target edge pair 有权
    通过选择目标边缘对计算掩模的可制造性的方法

    公开(公告)号:JP2010140020A

    公开(公告)日:2010-06-24

    申请号:JP2009256152

    申请日:2009-11-09

    CPC classification number: G03F1/68 G03F1/78

    Abstract: PROBLEM TO BE SOLVED: To provide a method for computing manufacturability of a lithographic mask to be used for fabricating a semiconductor device. SOLUTION: A set of a plurality of target edges is selected from mask layout data of a lithographic mask (402). Then, target edge pairs are selected from the selected set of target edges (404). The manufacturability of the lithographic mask, including the manufacturing penalty in making the lithographic mask, is computed based on the target edge pairs selected (406). The manufacturability of the lithographic mask is output (408). The manufacturability of the lithographic mask is dependent on the manufacturing penalty in making the lithographic mask. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题:提供一种用于计算用于制造半导体器件的光刻掩模的可制造性的方法。 解决方案:从光刻掩模(402)的掩模布局数据中选择一组多个目标边缘。 然后,从所选择的一组目标边缘中选择目标边缘对(404)。 基于所选择的目标边缘对(406)计算光刻掩模的可制造性,包括制造光刻掩模的制造损失。 输出光刻掩模的可制造性(408)。 光刻掩模的可制造性取决于制造光刻掩模的制造损失。 版权所有(C)2010,JPO&INPIT

    PORTABLE INFORMATION DEVICE OF FUNCTION SUPPLEMENTING TYPE

    公开(公告)号:JP2001142563A

    公开(公告)日:2001-05-25

    申请号:JP31790399

    申请日:1999-11-09

    Applicant: IBM

    Abstract: PROBLEM TO BE SOLVED: To provide a new input/output device which adds/helps the function of a PC main body when it is connected to the PC main body and which operates like a conventional PDA in the state of being cut off from the PC main body. SOLUTION: An input/output device 120 to which this invention is applied operates in an independent state and operates in cooperation with a PC main body 110 also in the state of being housed in the PC main body 110. The device 120 consists of a display screen 310 comprising a touch panel, etc., a display screen 330 which is seen from outside even in a state where the cover of the PC main body is closed, a port 452 for exchanging data in the case of being housed in the PC main body 110, and a transmitter/receiver 462 for radio communication.

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