3.
    发明专利
    未知

    公开(公告)号:FR2378108B1

    公开(公告)日:1980-02-01

    申请号:FR7712638

    申请日:1977-04-19

    Applicant: IBM

    Abstract: A plating solution and method of forming such a solution for plating chromium and its alloys from Cr(III) is disclosed. The solution is an aqueous solution of a chromium(III) thiocyanate complex having at least a ligand other than water or thiocyanate in the inner coordination sphere.

    4.
    发明专利
    未知

    公开(公告)号:DE69300234D1

    公开(公告)日:1995-08-10

    申请号:DE69300234

    申请日:1993-03-03

    Applicant: IBM

    Abstract: Solder is applied to a circuit board 7 by dipping the board into a bath 1 of molten solder 3, the molten solder having a layer of oil 5 on top. The solder is dipped into the bath by rotating it along a path that is substantially coplanar with the circuit board. This is achieved by supporting the board on a carrier 9 which in turn is attached to a motor shaft 11.

    ELECTRODEPOSITION OF CHROMIUM AND ITS ALLOYS

    公开(公告)号:CA1209088A

    公开(公告)日:1986-08-05

    申请号:CA415396

    申请日:1982-11-12

    Applicant: IBM

    Abstract: ELECTRODEPOSITION OF CHROMIUM AND ITS ALLOYS A chromium electroplating electrolyte containing trivalent chromium ions a complexant, a buffer agent and organic compound having a -C=S group or a -C-S group within the molecule for promoting chromium deposition. The complexant is preferably selected so that the stability constant K1 of the chromium complex is in the range 108

    7.
    发明专利
    未知

    公开(公告)号:FR2378108A1

    公开(公告)日:1978-08-18

    申请号:FR7712638

    申请日:1977-04-19

    Applicant: IBM

    Abstract: A plating solution and method of forming such a solution for plating chromium and its alloys from Cr(III) is disclosed. The solution is an aqueous solution of a chromium(III) thiocyanate complex having at least a ligand other than water or thiocyanate in the inner coordination sphere.

    TRIVALENT CHROMIUM ELECTROPLATING SOLUTION AND BATH

    公开(公告)号:CA1214426A

    公开(公告)日:1986-11-25

    申请号:CA415906

    申请日:1982-11-18

    Applicant: IBM

    Abstract: TRIVALENT CHROMIUM ELECTROPLATING SOLUTION AND BATH A chromium electroplating solution in which the source of chromium is an aqueous solution of chromium (III) complexes. The complexes are selected from a solution of chromium (III) and at least one of aspartic acid or an organic compound having a -C=S group or a -C-S- group. A supporting electrolyte is chloride free and comprises a mixture of sodium and potassium sulphates in a concentration sufficient to provide electrical conductivity for the plating process. The concentration of sodium sulphate is in the range of about 0.1 to 1 Molar and the concentration of potassium sulphate is about 1 Molar.

    ELECTROPLATING CHROMIUM AND ITS ALLOYS USING CHROMIUM THIOCYANATE COMPLEX

    公开(公告)号:CA1123370A

    公开(公告)日:1982-05-11

    申请号:CA292140

    申请日:1977-12-01

    Applicant: IBM

    Abstract: Method and Composition for Electroplating Chromium and its Alloys and the Method of Manufacture of the Composition A plating solution, the making thereof and the use for chromium plating is disclosed. The solution is an equilibrated essentially aqueous solution of a hexavalent thiocyanatochromium III complex wherein the ratio of the total chromium III to the total thiocyanate is about 1:6. A preferred and improved method of making the solution from a hexathiocyanatochromium salt is also disclosed.

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