公开(公告)号：CA1191477A

公开(公告)日：1985-08-06

申请号：CA426785

申请日：1983-04-27

Applicant: IBM

Inventor： BRADY MICHAEL J ,  MEYERSON BERNARD S ,  WARLAUMONT JOHN M

IPC: C01B33/02 ,  G03F1/22 ,  H01L21/027 ,  G21F3/00 ,  C23C14/04 ,  C23C16/28

Abstract: X-RAY MASK SUBSTRATE AND METHOD OF FABRICATION THEREOF An improved X-ray lithography mask has been fabricated by forming an X ray absorbing lithography pattern on a supporting foil of hydrogenated amorphous carbon. The substrate foil is formed by depositing a carbon film in the presence of hydrogen onto a surface having a temperature below 375.degree.C. The hydrogen concentration is maintained sufficiently high that the resulting film has at least one atom percent of hydrogen. A film having about 20 atom percent of hydrogen is preferred. While impurities are permitted, impurities must be maintained at a level such that the optical bandgap of the resulting film is at least one electron volt. A film with an optical bandgap of about 2 electron volts is preferred.