公开(公告)号：EP1490898A4

公开(公告)日：2005-06-15

申请号：EP03716897

申请日：2003-03-26

Applicant: LAM RES CORP

Inventor： KATZ VLADIMIR ,  MITCHELL BELLA

IPC: B24B37/013 ,  B24B49/12 ,  G01B11/06 ,  G01J3/00 ,  G01N21/27 ,  H01L21/304 ,  H01L21/66 ,  H01L21/306 ,  G01B11/28

CPC classification number: B24B49/12 ,  B24B37/013 ,  G01B11/0625 ,  G01B11/0683 ,  G01J3/00

Abstract: A system and method for detecting an endpoint during a chemical mechanical polishing process is disclosed that includes illuminating a first portion of a surface of a wafer (300) with a first broad beam of light (132). A first reflected spectrum data is received. The first reflected spectrum of data (308) corresponds to a first spectra of light reflected from the first illuminated portion of the surface of the wafer. The second reflected spectrum of data corresponds to a second spectra of light reflected from the second illuminated portion of the surface of the wafer. Endpoint is determined based on a difference between the normalized first spectrum data and the normalized second spectrum data.

公开(公告)号：AU2003220583A8

公开(公告)日：2003-10-13

申请号：AU2003220583

申请日：2003-03-26

Applicant: LAM RES CORP

Inventor： KATZ VLADIMIR ,  MITCHELL BELLA

IPC: B24B37/013 ,  B24B49/12 ,  G01B11/06 ,  G01J3/00 ,  G01N21/27 ,  H01L21/304 ,  H01L21/66 ,  H01L21/306 ,  G01B11/28

Abstract: A system and method for detecting an endpoint is disclosed that includes illuminating a first portion of a surface of a wafer with a first broad beam of light. A first reflected spectrum data is received. The first reflected spectrum of data corresponds to a first spectra of light reflected from the first illuminated portion of the surface of the wafer. A second portion of the surface of the wafer with a second broad beam of light. A second reflected spectrum data is received. The second reflected spectrum of data corresponds to a second spectra of light reflected from the second illuminated portion of the surface of the wafer. The first reflected spectrum data is normalized and the second reflected spectrum data is normalized. An endpoint is determined based on a difference between the normalized first spectrum data and the normalized second spectrum data.

公开(公告)号：AU2003220583A1

公开(公告)日：2003-10-13

申请号：AU2003220583

申请日：2003-03-26

Applicant: LAM RES CORP

Inventor： KATZ VLADIMIR ,  MITCHELL BELLA

IPC: B24B37/013 ,  B24B49/12 ,  G01B11/06 ,  G01J3/00 ,  G01N21/27 ,  H01L21/304 ,  H01L21/66

Abstract: A system and method for detecting an endpoint is disclosed that includes illuminating a first portion of a surface of a wafer with a first broad beam of light. A first reflected spectrum data is received. The first reflected spectrum of data corresponds to a first spectra of light reflected from the first illuminated portion of the surface of the wafer. A second portion of the surface of the wafer with a second broad beam of light. A second reflected spectrum data is received. The second reflected spectrum of data corresponds to a second spectra of light reflected from the second illuminated portion of the surface of the wafer. The first reflected spectrum data is normalized and the second reflected spectrum data is normalized. An endpoint is determined based on a difference between the normalized first spectrum data and the normalized second spectrum data.