公开(公告)号：EP1570363A4

公开(公告)日：2006-04-12

申请号：EP03808456

申请日：2003-12-11

Applicant: LAM RES CORP

Inventor： GOTKIS YEHIEL ,  KATZ VLADIMIR ,  HEMKER DAVID ,  KISTLER RODNEY ,  BRIGHT NICOLAS J

IPC: G05B23/02 ,  H01L21/66 ,  G06F15/00

CPC classification number: G05B23/0254 ,  H01L22/26

Abstract: A method for converting a slope based detection task to a threshold based detection task is provided. The method initiates with defining an approximation equation for a set of points corresponding to values of a process being monitored (140). Then, an expected value at a current point of the process being monitored is predicted (142). Next, a difference between a measured value at the current point of the process being monitored and the corresponding expected value is calculated (144). Then, the difference is monitored for successive points to detect a deviation value between the measured value and the expected value (146). Next, a transition point for the process being monitored is identified based on the detection of the deviation value (148). A processing system configured to provide real time data for a slope based transition and a computer readable media are also provided.

公开(公告)号：EP1490898A4

公开(公告)日：2005-06-15

申请号：EP03716897

申请日：2003-03-26

Applicant: LAM RES CORP

Inventor： KATZ VLADIMIR ,  MITCHELL BELLA

IPC: B24B37/013 ,  B24B49/12 ,  G01B11/06 ,  G01J3/00 ,  G01N21/27 ,  H01L21/304 ,  H01L21/66 ,  H01L21/306 ,  G01B11/28

CPC classification number: B24B49/12 ,  B24B37/013 ,  G01B11/0625 ,  G01B11/0683 ,  G01J3/00

Abstract: A system and method for detecting an endpoint during a chemical mechanical polishing process is disclosed that includes illuminating a first portion of a surface of a wafer (300) with a first broad beam of light (132). A first reflected spectrum data is received. The first reflected spectrum of data (308) corresponds to a first spectra of light reflected from the first illuminated portion of the surface of the wafer. The second reflected spectrum of data corresponds to a second spectra of light reflected from the second illuminated portion of the surface of the wafer. Endpoint is determined based on a difference between the normalized first spectrum data and the normalized second spectrum data.

公开(公告)号：AU2003220583A8

公开(公告)日：2003-10-13

申请号：AU2003220583

申请日：2003-03-26

Applicant: LAM RES CORP

Inventor： KATZ VLADIMIR ,  MITCHELL BELLA

IPC: B24B37/013 ,  B24B49/12 ,  G01B11/06 ,  G01J3/00 ,  G01N21/27 ,  H01L21/304 ,  H01L21/66 ,  H01L21/306 ,  G01B11/28

Abstract: A system and method for detecting an endpoint is disclosed that includes illuminating a first portion of a surface of a wafer with a first broad beam of light. A first reflected spectrum data is received. The first reflected spectrum of data corresponds to a first spectra of light reflected from the first illuminated portion of the surface of the wafer. A second portion of the surface of the wafer with a second broad beam of light. A second reflected spectrum data is received. The second reflected spectrum of data corresponds to a second spectra of light reflected from the second illuminated portion of the surface of the wafer. The first reflected spectrum data is normalized and the second reflected spectrum data is normalized. An endpoint is determined based on a difference between the normalized first spectrum data and the normalized second spectrum data.

公开(公告)号：AU2003303494A1

公开(公告)日：2004-07-29

申请号：AU2003303494

申请日：2003-12-11

Applicant: LAM RES CORP

Inventor： GOTKIS YEHIEL ,  KATZ VLADIMIR ,  HEMKER DAVID ,  KISTLER RODNEY ,  BRIGHT NICOLAS J

IPC: G05B23/02 ,  H01L21/66 ,  G06F15/00

Abstract: A method for converting a slope based detection task to a threshold based detection task is provided. The method initiates with defining an approximation equation for a set of points corresponding to values of a process being monitored. Then, an expected value at a current point of the process being monitored is predicted. Next, a difference between a measured value at the current point of the process being monitored and the corresponding expected value is calculated. Then, the difference is monitored for successive points to detect a deviation value between the measured value and the expected value. Next, a transition point for the process being monitored is identified based on the detection of the deviation value. A processing system configured to provide real time data for a slope based transition and a computer readable media are also provided.

公开(公告)号：AU2003220583A1

公开(公告)日：2003-10-13

申请号：AU2003220583

申请日：2003-03-26

Applicant: LAM RES CORP

Inventor： KATZ VLADIMIR ,  MITCHELL BELLA

IPC: B24B37/013 ,  B24B49/12 ,  G01B11/06 ,  G01J3/00 ,  G01N21/27 ,  H01L21/304 ,  H01L21/66

Abstract: A system and method for detecting an endpoint is disclosed that includes illuminating a first portion of a surface of a wafer with a first broad beam of light. A first reflected spectrum data is received. The first reflected spectrum of data corresponds to a first spectra of light reflected from the first illuminated portion of the surface of the wafer. A second portion of the surface of the wafer with a second broad beam of light. A second reflected spectrum data is received. The second reflected spectrum of data corresponds to a second spectra of light reflected from the second illuminated portion of the surface of the wafer. The first reflected spectrum data is normalized and the second reflected spectrum data is normalized. An endpoint is determined based on a difference between the normalized first spectrum data and the normalized second spectrum data.