公开(公告)号：DE3810294C2

公开(公告)日：1997-06-12

申请号：DE3810294

申请日：1988-03-25

Applicant: RPC IND

Inventor： WAKALOPULOS GEORGE ,  FARRELL SHERMAN R

IPC: H01J27/16 ,  H01J3/02 ,  H01J27/20 ,  H01J37/06 ,  H01J37/077 ,  H01J37/08 ,  H01S3/038 ,  H01S3/0959 ,  H01J33/00

Abstract: An ion plasma electron gun for the generation of large area electron beams with uniform electron distribution. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emit secondary electrons which form an electron beam. After passage through an extraction grid and plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and uniform electron distribution which is substantially the same as the ion distribution of the ion beam impinging upon the cathode. A target and comparison circuit are functionally connected to a current control power supply for the positive ion source which in combination are capable of maintaining the output of secondary electrons emitting from the foil window substantially constant.

公开(公告)号：FR2613533B1

公开(公告)日：1991-01-04

申请号：FR8804081

申请日：1988-03-29

Applicant: RPC IND

Inventor： WAKALOPULOS GEORGE ,  FARRELL SHERMAN R

IPC: H01J27/16 ,  H01J3/02 ,  H01J27/20 ,  H01J37/06 ,  H01J37/077 ,  H01J37/08 ,  H01S3/038 ,  H01S3/0959 ,  H01J1/32 ,  H01J33/00

Abstract: An ion plasma electron gun for the generation of large area electron beams with uniform electron distribution. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emit secondary electrons which form an electron beam. After passage through an extraction grid and plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and uniform electron distribution which is substantially the same as the ion distribution of the ion beam impinging upon the cathode. A target and comparison circuit are functionally connected to a current control power supply for the positive ion source which in combination are capable of maintaining the output of secondary electrons emitting from the foil window substantially constant.

公开(公告)号：DE3810294A1

公开(公告)日：1988-10-13

申请号：DE3810294

申请日：1988-03-25

Applicant: RPC IND

Inventor： WAKALOPULOS GEORGE ,  FARRELL SHERMAN R

IPC: H01J27/16 ,  H01J3/02 ,  H01J27/20 ,  H01J37/06 ,  H01J37/077 ,  H01J37/08 ,  H01S3/038 ,  H01S3/0959 ,  H01J33/00

Abstract: An ion plasma electron gun for the generation of large area electron beams with uniform electron distribution. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emit secondary electrons which form an electron beam. After passage through an extraction grid and plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and uniform electron distribution which is substantially the same as the ion distribution of the ion beam impinging upon the cathode. A target and comparison circuit are functionally connected to a current control power supply for the positive ion source which in combination are capable of maintaining the output of secondary electrons emitting from the foil window substantially constant.

公开(公告)号：GB2203890B

公开(公告)日：1991-09-04

申请号：GB8806913

申请日：1988-03-23

Applicant: RPC IND

Inventor： WAKALOPULOS GEORGE ,  FARRELL SHERMAN R

IPC: H01J27/16 ,  H01J3/02 ,  H01J27/20 ,  H01J37/06 ,  H01J37/077 ,  H01J37/08 ,  H01S3/038 ,  H01S3/0959

Abstract: An ion plasma electron gun for the generation of large area electron beams with uniform electron distribution. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emit secondary electrons which form an electron beam. After passage through an extraction grid and plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and uniform electron distribution which is substantially the same as the ion distribution of the ion beam impinging upon the cathode. A target and comparison circuit are functionally connected to a current control power supply for the positive ion source which in combination are capable of maintaining the output of secondary electrons emitting from the foil window substantially constant.

公开(公告)号：GB2203889A

公开(公告)日：1988-10-26

申请号：GB8806912

申请日：1988-03-23

Applicant: RPC IND

Inventor： FARRELL SHERMAN R ,  SMITH RICHARD R

IPC: H01J27/08 ,  H01J3/02 ,  H01J27/20 ,  H01J33/00 ,  H01J37/06 ,  H01J37/08 ,  H01J3/08

Abstract: An ion plasma electron gun for the generation of electron beams which exhibits electron beam dose uniformity and which is capable of varying the dose received by a material to be irradiated. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid onto a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode, causing the cathode to emit secondary electrons which form an electron beam. After passing through the extraction grid in the plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and uniform electron distribution which is subsantially the same as the ion distribution of the ion beam impinging upon the cathode. Means are provided for creating a pulse of secondary electrons by varying the period of time in which the secondary electrons are transmitted through the foil.

公开(公告)号：GB2203889B

公开(公告)日：1991-12-04

申请号：GB8806912

申请日：1988-03-23

Applicant: RPC IND

Inventor： FARRELL SHERMAN R ,  SMITH RICHARD R

IPC: H01J27/08 ,  H01J3/02 ,  H01J27/20 ,  H01J33/00 ,  H01J37/06 ,  H01J37/08

Abstract: An ion plasma electron gun for the generation of electron beams which exhibits electron beam dose uniformity and which is capable of varying the dose received by a material to be irradiated. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid onto a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode, causing the cathode to emit secondary electrons which form an electron beam. After passing through the extraction grid in the plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and uniform electron distribution which is subsantially the same as the ion distribution of the ion beam impinging upon the cathode. Means are provided for creating a pulse of secondary electrons by varying the period of time in which the secondary electrons are transmitted through the foil.

公开(公告)号：FR2615324A1

公开(公告)日：1988-11-18

申请号：FR8804080

申请日：1988-03-29

Applicant: RPC IND

Inventor： FARRELL SHERMAN R ,  SMITH RICHARD R

IPC: H01J27/08 ,  H01J3/02 ,  H01J27/20 ,  H01J33/00 ,  H01J37/06 ,  H01J37/08 ,  H01J1/32 ,  H01J7/44

Abstract: An ion plasma electron gun for the generation of electron beams which exhibits electron beam dose uniformity and which is capable of varying the dose received by a material to be irradiated. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid onto a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode, causing the cathode to emit secondary electrons which form an electron beam. After passing through the extraction grid in the plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and uniform electron distribution which is subsantially the same as the ion distribution of the ion beam impinging upon the cathode. Means are provided for creating a pulse of secondary electrons by varying the period of time in which the secondary electrons are transmitted through the foil.

公开(公告)号：FR2613533A1

公开(公告)日：1988-10-07

申请号：FR8804081

申请日：1988-03-29

Applicant: RPC IND

Inventor： WAKALOPULOS GEORGE ,  FARRELL SHERMAN R

IPC: H01J27/16 ,  H01J3/02 ,  H01J27/20 ,  H01J37/06 ,  H01J37/077 ,  H01J37/08 ,  H01S3/038 ,  H01S3/0959 ,  H01J1/32 ,  H01J33/00

Abstract: An ion plasma electron gun for the generation of large area electron beams with uniform electron distribution. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emit secondary electrons which form an electron beam. After passage through an extraction grid and plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and uniform electron distribution which is substantially the same as the ion distribution of the ion beam impinging upon the cathode. A target and comparison circuit are functionally connected to a current control power supply for the positive ion source which in combination are capable of maintaining the output of secondary electrons emitting from the foil window substantially constant.

公开(公告)号：FR2615324B1

公开(公告)日：1991-01-04

申请号：FR8804080

申请日：1988-03-29

Applicant: RPC IND

Inventor： FARRELL SHERMAN R ,  SMITH RICHARD R

IPC: H01J27/08 ,  H01J3/02 ,  H01J27/20 ,  H01J33/00 ,  H01J37/06 ,  H01J37/08 ,  H01J1/32 ,  H01J7/44

Abstract: An ion plasma electron gun for the generation of electron beams which exhibits electron beam dose uniformity and which is capable of varying the dose received by a material to be irradiated. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid onto a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode, causing the cathode to emit secondary electrons which form an electron beam. After passing through the extraction grid in the plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and uniform electron distribution which is subsantially the same as the ion distribution of the ion beam impinging upon the cathode. Means are provided for creating a pulse of secondary electrons by varying the period of time in which the secondary electrons are transmitted through the foil.

公开(公告)号：GB2203890A

公开(公告)日：1988-10-26

申请号：GB8806913

申请日：1988-03-23

Applicant: RPC IND

Inventor： WAKALOPULOS GEORGE ,  FARRELL SHERMAN R

IPC: H01J27/16 ,  H01J3/02 ,  H01J27/20 ,  H01J37/06 ,  H01J37/077 ,  H01J37/08 ,  H01S3/038 ,  H01S3/0959 ,  H01J3/08

Abstract: An ion plasma electron gun for the generation of large area electron beams with uniform electron distribution. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emit secondary electrons which form an electron beam. After passage through an extraction grid and plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and uniform electron distribution which is substantially the same as the ion distribution of the ion beam impinging upon the cathode. A target and comparison circuit are functionally connected to a current control power supply for the positive ion source which in combination are capable of maintaining the output of secondary electrons emitting from the foil window substantially constant.