公开(公告)号：JPS60206444A

公开(公告)日：1985-10-18

申请号：JP4809085

申请日：1985-03-11

Applicant: RPC IND

Inventor： UOOREN JIEI RAMURAA ,  RICHIYAADO JII DEIGURU

IPC: B01J19/08 ,  C08F2/54 ,  G21K5/10

公开(公告)号：JPH0459737B2

公开(公告)日：1992-09-24

申请号：JP7215088

申请日：1988-03-28

Applicant: RPC IND

Inventor： JOOJI WAKAROPAROSU ,  SHAAMAN AARU FUARERU

IPC: H01J27/16 ,  H01J3/02 ,  H01J27/20 ,  H01J37/06 ,  H01J37/077 ,  H01J37/08 ,  H01S3/038 ,  H01S3/0959

公开(公告)号：JPS59177730A

公开(公告)日：1984-10-08

申请号：JP3739584

申请日：1984-03-01

Applicant: Rpc Ind

Inventor： SHIYAAMAN RICHIYAADO FUARARU

IPC: B29C35/00 ,  B05D3/06 ,  B29C35/08 ,  B29C35/10 ,  B29C71/00 ,  B29C71/04 ,  B29D1/00 ,  C08J7/00 ,  G11B5/842

CPC classification number: B05D3/068 ,  B29C35/10 ,  B29C2035/0877 ,  B29L2017/008 ,  G11B5/842

公开(公告)号：JPH0459736B2

公开(公告)日：1992-09-24

申请号：JP7214988

申请日：1988-03-28

Applicant: RPC IND

Inventor： SHAAMAN AARU FUARERU ,  RICHAADO AARU SUMISU

IPC: H01J27/08 ,  H01J3/02 ,  H01J27/20 ,  H01J33/00 ,  H01J37/06 ,  H01J37/08

公开(公告)号：SE467990B

公开(公告)日：1992-10-12

申请号：SE8801145

申请日：1988-03-28

Applicant: RPC IND

Inventor： WAKALOPULOS G

IPC: H01J27/16 ,  H01J3/02 ,  H01J27/20 ,  H01J37/06 ,  H01J37/077 ,  H01J37/08 ,  H01S3/038 ,  H01S3/0959

Abstract: An ion plasma electron gun for the generation of large area electron beams with uniform electron distribution. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emit secondary electrons which form an electron beam. After passage through an extraction grid and plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and uniform electron distribution which is substantially the same as the ion distribution of the ion beam impinging upon the cathode. A target and comparison circuit are functionally connected to a current control power supply for the positive ion source which in combination are capable of maintaining the output of secondary electrons emitting from the foil window substantially constant.

公开(公告)号：FR2613533B1

公开(公告)日：1991-01-04

申请号：FR8804081

申请日：1988-03-29

Applicant: RPC IND

Inventor： WAKALOPULOS GEORGE ,  FARRELL SHERMAN R

IPC: H01J27/16 ,  H01J3/02 ,  H01J27/20 ,  H01J37/06 ,  H01J37/077 ,  H01J37/08 ,  H01S3/038 ,  H01S3/0959 ,  H01J1/32 ,  H01J33/00

Abstract: An ion plasma electron gun for the generation of large area electron beams with uniform electron distribution. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emit secondary electrons which form an electron beam. After passage through an extraction grid and plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and uniform electron distribution which is substantially the same as the ion distribution of the ion beam impinging upon the cathode. A target and comparison circuit are functionally connected to a current control power supply for the positive ion source which in combination are capable of maintaining the output of secondary electrons emitting from the foil window substantially constant.

公开(公告)号：GB2199691B

公开(公告)日：1990-08-08

申请号：GB8700605

申请日：1987-01-12

Applicant: RPC IND

Inventor： WAKALOPULOS GEORGE

IPC: H05H1/46 ,  H01J3/02 ,  H01J33/00 ,  H01J37/073 ,  H01J37/077 ,  H01S3/038 ,  H01S3/0959 ,  H05H1/48

Abstract: An ion plasma electron gun for the generation of large area electron beams with uniform electron distribution. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emit secondary electrons which form an electron beam. After passing through the extraction grid and the plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and a uniform electron distribution which is substantially the same as the ion distribution of the ion beam impinging upon the cathode. Control of the generated electron beam is achieved by applying a control voltage between the wire and the grounded housing of the plasma chamber to control the density of positive ions bombarding the cathode.

公开(公告)号：DE3810294A1

公开(公告)日：1988-10-13

申请号：DE3810294

申请日：1988-03-25

Applicant: RPC IND

Inventor： WAKALOPULOS GEORGE ,  FARRELL SHERMAN R

IPC: H01J27/16 ,  H01J3/02 ,  H01J27/20 ,  H01J37/06 ,  H01J37/077 ,  H01J37/08 ,  H01S3/038 ,  H01S3/0959 ,  H01J33/00

Abstract: An ion plasma electron gun for the generation of large area electron beams with uniform electron distribution. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emit secondary electrons which form an electron beam. After passage through an extraction grid and plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and uniform electron distribution which is substantially the same as the ion distribution of the ion beam impinging upon the cathode. A target and comparison circuit are functionally connected to a current control power supply for the positive ion source which in combination are capable of maintaining the output of secondary electrons emitting from the foil window substantially constant.

公开(公告)号：GB2157140B

公开(公告)日：1987-04-29

申请号：GB8506508

申请日：1985-03-13

Applicant: RPC IND

Inventor： RAMLER WARREN J ,  DAIGLE RICHARD G

IPC: B01J19/08 ,  C08F2/54 ,  G21K5/10

公开(公告)号：GB8700605D0

公开(公告)日：1987-02-18

申请号：GB8700605

申请日：1987-01-12

Applicant: RPC IND

IPC: H05H1/46 ,  H01J3/02 ,  H01J33/00 ,  H01J37/073 ,  H01J37/077 ,  H01S3/038 ,  H01S3/0959 ,  H05H1/48

Abstract: An ion plasma electron gun for the generation of large area electron beams with uniform electron distribution. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emit secondary electrons which form an electron beam. After passing through the extraction grid and the plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and a uniform electron distribution which is substantially the same as the ion distribution of the ion beam impinging upon the cathode. Control of the generated electron beam is achieved by applying a control voltage between the wire and the grounded housing of the plasma chamber to control the density of positive ions bombarding the cathode.