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公开(公告)号:CA2386220A1
公开(公告)日:2001-04-12
申请号:CA2386220
申请日:2000-10-02
Applicant: TROJAN TECHN INC
Inventor: SASGES MICHAEL , VERDUN ALEX , FANG GANG , HOUGHTON JOHN , LEM JOSEPH , LAWRYSHYN YURI
Abstract: There is disclosed an optical radiation sensor system. The system includes a sensor device (140) and a cleaning device (115). The sensor device detects a nd responds to radiation from a radiation field (170) and includes a surface (155) that is movable with respect to the radiation field between a first position in which the surface is in the radiation field and a second positio n in which at least a portion of the surface is out of the radiation field. Th e cleaning device operates to remove fouling materials from at least a portion of the surface in the second position. The cleaning device may be a chemical cleaning device, a mechanical cleaning device or a combined chemical/mechanical device.
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公开(公告)号:DE60016789D1
公开(公告)日:2005-01-20
申请号:DE60016789
申请日:2000-10-02
Applicant: TROJAN TECHN INC
Inventor: FANG GANG , HOUGHTON JOHN , LAWRYSHYN YURI , LEM JOSEPH , VERDUN ALEX , SASGES MICHAEL
Abstract: There is disclosed an optical radiation sensor system. The system includes a sensor device and a cleaning device. The sensor device detects and responds to radiation from a radiation field and includes a surface that is movable with respect to the radiation field between a first position in which the surface is in the radiation field and a second position in which at least a portion of the surface is out of the radiation field. The cleaning device operates to remove fouling materials from at least a portion of the surface in the second position. The cleaning device may be a chemical cleaning device, a mechanical cleaning device or a combined chemical/mechanical device.
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公开(公告)号:CA2338879A1
公开(公告)日:2000-12-07
申请号:CA2338879
申请日:2000-05-26
Applicant: TROJAN TECHN INC
Inventor: PENHALE DOUGLAS , LEM JOSEPH , DALL ARMI VIVIAN , FANG GANG , LAWRYSHYN YURI
Abstract: A cleaning apparatus (10) for a radiation source assembly (35) in a fluid treatment system is described. The cleaning apparatus comprises cleaning chamber (20) and a second chamber (25, 30) independent of the cleaning chamb er which defines a fluid (typically water) buffer layer to obviate or mitigate cleaning fluid from the cleaning chamber leaking into the fluid being treate d. The fluid treatment system is particularly useful for us in clean water applications in which ultraviolet radiation is used to treat the water while having the advantages of in situ cleaning of the radiation source whe n it becomes fouled.
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公开(公告)号:CA2386220C
公开(公告)日:2007-05-08
申请号:CA2386220
申请日:2000-10-02
Applicant: TROJAN TECHN INC
Inventor: FANG GANG , HOUGHTON JOHN , VERDUN ALEX , LAWRYSHYN YURI , LEM JOSEPH , SASGES MICHAEL
Abstract: There is disclosed an optical radiation sensor system. The system includes a sensor device (140) and a cleaning device (115). The sensor device detects a nd responds to radiation from a radiation field (170) and includes a surface (155) that is movable with respect to the radiation field between a first position in which the surface is in the radiation field and a second positio n in which at least a portion of the surface is out of the radiation field. Th e cleaning device operates to remove fouling materials from at least a portion of the surface in the second position. The cleaning device may be a chemical cleaning device, a mechanical cleaning device or a combined chemical/mechanical device.
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公开(公告)号:DE60016789T2
公开(公告)日:2006-02-23
申请号:DE60016789
申请日:2000-10-02
Applicant: TROJAN TECHN INC
Inventor: FANG GANG , HOUGHTON JOHN , LAWRYSHYN YURI , LEM JOSEPH , VERDUN ALEX , SASGES MICHAEL
Abstract: There is disclosed an optical radiation sensor system. The system includes a sensor device and a cleaning device. The sensor device detects and responds to radiation from a radiation field and includes a surface that is movable with respect to the radiation field between a first position in which the surface is in the radiation field and a second position in which at least a portion of the surface is out of the radiation field. The cleaning device operates to remove fouling materials from at least a portion of the surface in the second position. The cleaning device may be a chemical cleaning device, a mechanical cleaning device or a combined chemical/mechanical device.
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公开(公告)号:CA2338879C
公开(公告)日:2005-08-09
申请号:CA2338879
申请日:2000-05-26
Applicant: TROJAN TECHN INC
Inventor: DALL ARMI VIVIAN , FANG GANG , LAWRYSHYN YURI , LEM JOSEPH , PENHALE DOUGLAS
Abstract: A cleaning apparatus (10) for a radiation source assembly (35) in a fluid treatment system is described. The cleaning apparatus comprises cleaning chamber (20) and a second chamber (25,30) independent of the cleaning chamber which defines a fluid (typically water) buffer layer to obviate or mitigate cleaning fluid from the cleaning chamber leaking into the fluid being treated. The fluid treatment system is particularly useful for us in clean water applications in which ultraviolet radiation is used to treat the water while having the advantages of in situ cleaning of the radiation sourc e when it becomes fouled.
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公开(公告)号:AU4906000A
公开(公告)日:2000-12-18
申请号:AU4906000
申请日:2000-05-26
Applicant: TROJAN TECHN INC
Inventor: ARMI VIVIAN DALL , FANG GANG , LAWRYSHYN YURI , LEM JOSEPH , PENHALE DOUGLAS
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