1.
    发明专利
    未知

    公开(公告)号:DE60019306D1

    公开(公告)日:2005-05-12

    申请号:DE60019306

    申请日:2000-08-11

    Abstract: A cleaning apparatus for use in a fluid treatment system comprising a radiation source assembly, the cleaning apparatus comprising: at least one cleaning sleeve (300) in sliding engagement with the exterior of the radiation source assembly (150); a cleaning chamber (310) disposed in the at least one cleaning sleeve in contact with a portion of the exterior of the radiation source assembly (150) and for being supplied with a cleaning solution, the cleaning chamber comprising an opening (370) to an exterior of the cleaning sleeve; a pressure equalization member (355) disposed in the opening to provide a seal between the opening and the exterior of the cleaning sleeve, the pressure equalization member being movable in response to a pressure gradient thereacross; and drive means to translate the at least one cleaning sleeve along the exterior of the radiation source assembly. A fluid treatment device comprise the cleaning apparatus is also described.

    AN ON-LINE DEVICE FOR PREDICTING AT LEAST ONE FLUID FLOW PARAMETER IN A PROCESS

    公开(公告)号:CA2393254A1

    公开(公告)日:2001-06-14

    申请号:CA2393254

    申请日:2000-12-06

    Abstract: There is described an on-line device for predicting at least one fluid flow parameter in a process. In embodiment, the process in question comprises a flow domain having disposed therein a pre-determined portion in which a flui d flows and the device comprises a computer having: (i) a memory for receiving a database, the database comprising relative information in respect of a plurality of nodes or a plurality of particle pathways in the pre-determined portion; (ii) means to receive input data from the process; and (iii) means to calculate the at least one fluid flow parameter from the database and the input data. In another embodiment the process in question comprises a bounde d flow domain having disposed therein a pre-determined matrix and the device comprises a computer having: (i) a memory for receiving a database, the database comprising location information for a plurality of nodes or particl e pathways in the matrix; (ii) means to receive input data from the process; a nd (iii) means to calculate the at least one fluid flow parameter from the database and the input data. The device is particularly advantageously employed as a UV dosimeter.

    AN ON-LINE DEVICE FOR PREDICTING AT LEAST ONE FLUID FLOW PARAMETER IN A PROCESS

    公开(公告)号:CA2393254C

    公开(公告)日:2007-05-29

    申请号:CA2393254

    申请日:2000-12-06

    Abstract: There is described an on-line device for predicting at least one fluid flow parameter in a process. In embodiment, the process in question comprises a flow domain having disposed therein a pre- determined portion in which a fluid flows and the device comprises a computer having: (i) a memory for receiving a database, the database comprising relative information in respect of a plurality of nodes or a plurality of particle pathways in the pre-determined portion; (ii) means to receive input data from the process; and (iii) means to calculate the at least one fluid flow parameter from the database and the input data. In another embodiment the process in question comprises a bounded flow domain having disposed therein a pre-determined matrix and the device comprises a computer having: (i) a memory for receiving a database, the database comprising location information for a plurality of nodes or particle pathways in the matrix; (ii) means to receive input data from the process; and (iii) means to calculate the at least one fluid flow parameter from the database and the input data. The device is particularly advantageously employed as a UV dosimeter.

    SISTEMA DE TRATAMIENTO DE FLUIDOS Y APARATO D LIMPIEZA PARA EL MISMO.

    公开(公告)号:ES2240140T3

    公开(公告)日:2005-10-16

    申请号:ES00952819

    申请日:2000-08-11

    Abstract: Un aparato de limpieza para uso en un sistema para tratamiento de fluidos que comprende un conjunto de fuente de radiación, comprendiendo el aparato de limpieza: al menos, un manguito limpiador en engrane deslizante con el exterior del conjunto de fuente de radiación, una cámara de limpieza dispuesta en el, al menos, un manguito limpiador en contacto con una porción del exterior del conjunto de fuente de radiación, y para que se surta con una solución limpiadora, la cámara de limpieza comprendiendo una abertura a un exterior del manguito limpiador, un miembro igualador de la presión dispuesto en la abertura para que aporte un cierre estanco entra la abertura y el exterior del manguito limpiador, siendo el miembro igualador de la presión movible, con independencia del manguito limpiador, en respuesta a un gradiente de presión a través del mismo, y un medio de accionamiento para trasladar el, al menos, un manguito limpiador a lo largo del exterior del conjunto de fuente de radiación.

    FLUID TREATMENT DEVICE AND METHOD FOR TREATMENT OF FLUID

    公开(公告)号:CA2386223A1

    公开(公告)日:2001-04-12

    申请号:CA2386223

    申请日:2000-10-02

    Abstract: A fluid treatment device, particularly useful for ultraviolet radiation treatment of fluids such as water. The device comprises a housing for receiving a flow of fluid. The housing has a fluid inlet, a fluid outlet, a fluid treatment zone disposed between the fluid inlet and the fluid outlet a nd at least one radiation source having a longitudinal axis disposed in the flu id treatment zone substantially transverse to a direction of the flow of fluid through the housing. The fluid inlet, the fluid outlet and the fluid treatme nt zone are arranged substantially collinearly with respect to one another. The fluid inlet has a first opening having: (i) a cross-sectional area less than a cross-sectional area of the fluid treatment zone, and (ii) a largest diamete r substantially parallel to the longitudinal axis of the at least one radiatio n source assembly.

    FLUID TREATMENT SYSTEM AND CLEANING APPARATUS THEREFOR

    公开(公告)号:CA2381307C

    公开(公告)日:2007-10-30

    申请号:CA2381307

    申请日:2000-08-11

    Abstract: A cleaning apparatus for use in a fluid treatment system comprising a radiation source assembly, the cleaning apparatus comprising: at least one cleaning sleeve (300) in sliding engagement with the exterior of the radiati on source assembly (150); a cleaning chamber (310) disposed in the at least one cleaning sleeve in contact with a portion of the exterior of the radiation source assembly (150) and for being supplied with a cleaning solution, the cleaning chamber comprising an opening (370) to an exterior of the cleaning sleeve; a pressure equalization member (355) disposed in the opening to provide a seal between the opening and the exterior of the cleaning sleeve, the pressure equalization member being movable in response to a pressure gradient thereacross; and drive means to translate the at least one cleaning sleeve along the exterior of the radiation source assembly. A fluid treatmen t device comprise the cleaning apparatus is also described.

    8.
    发明专利
    未知

    公开(公告)号:DE60019306T2

    公开(公告)日:2006-03-09

    申请号:DE60019306

    申请日:2000-08-11

    Abstract: A cleaning apparatus for use in a fluid treatment system comprising a radiation source assembly, the cleaning apparatus comprising: at least one cleaning sleeve (300) in sliding engagement with the exterior of the radiation source assembly (150); a cleaning chamber (310) disposed in the at least one cleaning sleeve in contact with a portion of the exterior of the radiation source assembly (150) and for being supplied with a cleaning solution, the cleaning chamber comprising an opening (370) to an exterior of the cleaning sleeve; a pressure equalization member (355) disposed in the opening to provide a seal between the opening and the exterior of the cleaning sleeve, the pressure equalization member being movable in response to a pressure gradient thereacross; and drive means to translate the at least one cleaning sleeve along the exterior of the radiation source assembly. A fluid treatment device comprise the cleaning apparatus is also described.

    9.
    发明专利
    未知

    公开(公告)号:AT292603T

    公开(公告)日:2005-04-15

    申请号:AT00952819

    申请日:2000-08-11

    Abstract: A cleaning apparatus for use in a fluid treatment system comprising a radiation source assembly, the cleaning apparatus comprising: at least one cleaning sleeve (300) in sliding engagement with the exterior of the radiation source assembly (150); a cleaning chamber (310) disposed in the at least one cleaning sleeve in contact with a portion of the exterior of the radiation source assembly (150) and for being supplied with a cleaning solution, the cleaning chamber comprising an opening (370) to an exterior of the cleaning sleeve; a pressure equalization member (355) disposed in the opening to provide a seal between the opening and the exterior of the cleaning sleeve, the pressure equalization member being movable in response to a pressure gradient thereacross; and drive means to translate the at least one cleaning sleeve along the exterior of the radiation source assembly. A fluid treatment device comprise the cleaning apparatus is also described.

    10.
    发明专利
    未知

    公开(公告)号:NO20020632L

    公开(公告)日:2002-02-08

    申请号:NO20020632

    申请日:2002-02-08

    Abstract: A cleaning apparatus for use in a fluid treatment system comprising a radiation source assembly, the cleaning apparatus comprising: at least one cleaning sleeve (300) in sliding engagement with the exterior of the radiation source assembly (150); a cleaning chamber (310) disposed in the at least one cleaning sleeve in contact with a portion of the exterior of the radiation source assembly (150) and for being supplied with a cleaning solution, the cleaning chamber comprising an opening (370) to an exterior of the cleaning sleeve; a pressure equalization member (355) disposed in the opening to provide a seal between the opening and the exterior of the cleaning sleeve, the pressure equalization member being movable in response to a pressure gradient thereacross; and drive means to translate the at least one cleaning sleeve along the exterior of the radiation source assembly. A fluid treatment device comprise the cleaning apparatus is also described.

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