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    Fluid treatment system and cleaning apparatus therefor
    8.
    发明专利
    Fluid treatment system and cleaning apparatus therefor 未知

    公开(公告)号：AU775441B2

    公开(公告)日：2004-07-29

    申请号：AU6551500

    申请日：2000-08-11

    Applicant: TROJAN TECHN INC

    Inventor： FANG GANG ,  LAWRYSHYN YURI ,  MAARSCHALKERWEERD JAN M ,  PENHALE DOUGLAS

    IPC: B08B9/023 ,  B08B1/00 ,  B08B3/02 ,  B08B9/02 ,  C02F1/32 ,  A61L2/10

    Abstract: A cleaning apparatus for use in a fluid treatment system comprising a radiation source assembly, the cleaning apparatus comprising: at least one cleaning sleeve (300) in sliding engagement with the exterior of the radiation source assembly (150); a cleaning chamber (310) disposed in the at least one cleaning sleeve in contact with a portion of the exterior of the radiation source assembly (150) and for being supplied with a cleaning solution, the cleaning chamber comprising an opening (370) to an exterior of the cleaning sleeve; a pressure equalization member (355) disposed in the opening to provide a seal between the opening and the exterior of the cleaning sleeve, the pressure equalization member being movable in response to a pressure gradient thereacross; and drive means to translate the at least one cleaning sleeve along the exterior of the radiation source assembly. A fluid treatment device comprise the cleaning apparatus is also described.

    FLUID TREATMENT SYSTEM AND CLEANING APPARATUS THEREFOR
    9.
    发明专利
    FLUID TREATMENT SYSTEM AND CLEANING APPARATUS THEREFOR 未知

    公开(公告)号：CA2338879A1

    公开(公告)日：2000-12-07

    申请号：CA2338879

    申请日：2000-05-26

    Applicant: TROJAN TECHN INC

    Inventor： PENHALE DOUGLAS ,  LEM JOSEPH ,  DALL ARMI VIVIAN ,  FANG GANG ,  LAWRYSHYN YURI

    IPC: B01J19/12 ,  B08B1/00 ,  B08B9/02 ,  C02F1/32

    Abstract: A cleaning apparatus (10) for a radiation source assembly (35) in a fluid treatment system is described. The cleaning apparatus comprises cleaning chamber (20) and a second chamber (25, 30) independent of the cleaning chamb er which defines a fluid (typically water) buffer layer to obviate or mitigate cleaning fluid from the cleaning chamber leaking into the fluid being treate d. The fluid treatment system is particularly useful for us in clean water applications in which ultraviolet radiation is used to treat the water while having the advantages of in situ cleaning of the radiation source whe n it becomes fouled.

    FLUID TREATMENT SYSTEM
    10.
    发明专利
    FLUID TREATMENT SYSTEM 未知

    公开(公告)号：CA2660719C

    公开(公告)日：2014-07-22

    申请号：CA2660719

    申请日：2007-08-17

    Applicant: TROJAN TECHN INC

    Inventor： TRAUBENBERG GEORGE ,  PENHALE DOUGLAS ,  MA LI-ZHENG

    IPC: C02F1/32 ,  A61L2/10 ,  B01J19/12

    Abstract: There is described a fluid treatment system. The fluid treatment system comprises: an open channel for receiving a flow of fluid and a fluid treatment zone. The fluid treatment zone comprising a plurality of elongate radiation source assemblies orientated such that: (i) a longitudinal axis of each radiation source assembly is transverse to a direction of fluid flow through the fluid treatment zone, and (ii) an end of each radiation source assembly is disposed above a predetermined maximum height of fluid flow in the open channel. A first baffle plate is disposed upstream of the fluid treatment zone. The first baffle plate is positioned such that a distal end thereof is below the predetermined maximum height of fluid flow in the open channel. In a preferred embodiment, the present fluid treatment system provides for an area in which a cleaning system for the radiation source assemblies can be "parked" when not in use. In the so- called "parked" position, the cleaning system may be readily accessed for servicing and the like without affecting the flow of fluid through the fluid treatment zone and a fluid treatment system. This is as significant advantage of the fluid treatment system.

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