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    Fluid treatment system and cleaning apparatus therefor
    8.
    发明专利
    Fluid treatment system and cleaning apparatus therefor 未知

    公开(公告)号：AU775441B2

    公开(公告)日：2004-07-29

    申请号：AU6551500

    申请日：2000-08-11

    Applicant: TROJAN TECHN INC

    Inventor： FANG GANG ,  LAWRYSHYN YURI ,  MAARSCHALKERWEERD JAN M ,  PENHALE DOUGLAS

    IPC: B08B9/023 ,  B08B1/00 ,  B08B3/02 ,  B08B9/02 ,  C02F1/32 ,  A61L2/10

    Abstract: A cleaning apparatus for use in a fluid treatment system comprising a radiation source assembly, the cleaning apparatus comprising: at least one cleaning sleeve (300) in sliding engagement with the exterior of the radiation source assembly (150); a cleaning chamber (310) disposed in the at least one cleaning sleeve in contact with a portion of the exterior of the radiation source assembly (150) and for being supplied with a cleaning solution, the cleaning chamber comprising an opening (370) to an exterior of the cleaning sleeve; a pressure equalization member (355) disposed in the opening to provide a seal between the opening and the exterior of the cleaning sleeve, the pressure equalization member being movable in response to a pressure gradient thereacross; and drive means to translate the at least one cleaning sleeve along the exterior of the radiation source assembly. A fluid treatment device comprise the cleaning apparatus is also described.

    FLUID TREATMENT SYSTEM AND CLEANING APPARATUS THEREFOR
    9.
    发明专利
    FLUID TREATMENT SYSTEM AND CLEANING APPARATUS THEREFOR 未知

    公开(公告)号：CA2338879A1

    公开(公告)日：2000-12-07

    申请号：CA2338879

    申请日：2000-05-26

    Applicant: TROJAN TECHN INC

    Inventor： PENHALE DOUGLAS ,  LEM JOSEPH ,  DALL ARMI VIVIAN ,  FANG GANG ,  LAWRYSHYN YURI

    IPC: B01J19/12 ,  B08B1/00 ,  B08B9/02 ,  C02F1/32

    Abstract: A cleaning apparatus (10) for a radiation source assembly (35) in a fluid treatment system is described. The cleaning apparatus comprises cleaning chamber (20) and a second chamber (25, 30) independent of the cleaning chamb er which defines a fluid (typically water) buffer layer to obviate or mitigate cleaning fluid from the cleaning chamber leaking into the fluid being treate d. The fluid treatment system is particularly useful for us in clean water applications in which ultraviolet radiation is used to treat the water while having the advantages of in situ cleaning of the radiation source whe n it becomes fouled.

    CLEANING APPARATUS, RADIATION SOURCE MODULE AND FLUID TREATMENT SYSTEM
    10.
    发明专利
    CLEANING APPARATUS, RADIATION SOURCE MODULE AND FLUID TREATMENT SYSTEM 未知

    公开(公告)号：SG177431A1

    公开(公告)日：2012-02-28

    申请号：SG2011097326

    申请日：2010-07-23

    Applicant: TROJAN TECHN INC

    Inventor： ELKU JOSEPH ,  PENHALE DOUGLAS

    Abstract: There is disclosed a cleaning apparatus for a radiation source assembly in a fluid treatment system. The clean apparatus comprises a cleaning sleeve moveable to remove fouling materials from an exterior portion of the radiation source assembly, the cleaning sleeve comprising at least one chamber for receiving a cleaning fluid and a cleaning sleeve inlet in fluid communication with the at least one chamber and a first conduit element for conveying the cleaning fluid to the cleaning sleeve inlet, the first conduit element being configured such that a distal portion of the first conduit element is in fluid communication with the cleaning sleeve inlet and a proximal portion of the first conduit element is disposed outside of fluid being treated in the fluid treatment system.

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