公开(公告)号：WO2018069024A1

公开(公告)日：2018-04-19

申请号：PCT/EP2017/074094

申请日：2017-09-22

Applicant: MALVERN INSTRUMENTS LIMITED

Inventor： SCULLION, Richard ,  CORBETT, Jason

IPC: G01N15/02 ,  G01N15/14 ,  G01N21/51 ,  G01N21/49 ,  G01N21/47

CPC classification number: G01N15/0211 ,  G01N15/1434 ,  G01N15/1456 ,  G01N21/49 ,  G01N2015/0222 ,  G01N2015/1454 ,  G01N2021/4707 ,  G01N2021/4709 ,  G01N2201/063 ,  G01N2201/0635

Abstract: A particle characterisation instrument (200), comprising a light source (201), a sample cell (202), an optical element (204) between the light source (201) and sample cell (202) and a detector (203). The optical element (204) is configured to modify light from the light source (201) to create a modified beam (207), the modified beam (207): a) interfering with itself to create an effective beam (208) in the sample cell (202) along an illumination axis (206) and b) diverging in the far field to produce a dark region (209) along the illumination axis (206) that is substantially not illuminated at a distance from the sample cell (202). The detector (203) is at the distance from the sample cell (202), and is configured to detect light scattered from the effective beam (208) by a sample in the sample cell (202), the detector (203) positioned to detect forward or back scattered light along a scattering axis (306) that is at an angle of 0° to 10° from the illumination axis (206).

Abstract translation: （201），样品池（202），在光源（201）和样品池（202）之间的光学元件（204）的粒子表征仪器（200） 和检测器（203）。 所述光学元件（204）被配置为修改来自所述光源（201）的光以创建修改后的光束（207），所述修改后的光束（207）：a）自行干涉以在所述样本中创建有效光束 沿着照明轴线（206）照射单元（202），以及b）在远场内发散以产生沿着照明轴线（206）的暗区域（209），其在距样本单元（202）一定距离处基本上未被照射。 检测器（203）与样本单元（202）相距一定距离，并且被配置为检测由样本单元（202）中的样本从有效射束（208）散射的光，检测器（203）被定位成检测 沿着散射轴（306）的前向散射光或后向散射光，散射轴（306）处于0°的角度; 到10℃ 来自照明轴（206）。

公开(公告)号：WO2017140528A1

公开(公告)日：2017-08-24

申请号：PCT/EP2017/052594

申请日：2017-02-07

Applicant: ASML NETHERLANDS B.V.

Inventor： PANDEY, Nitesh ,  DEN BOEF, Arie, Jeffrey ,  VAN DAM, Marinus, Johannes, Maria

IPC: G03F7/20

CPC classification number: G03F7/70191 ,  G01N21/4788 ,  G01N2021/4711 ,  G01N2201/063 ,  G02B5/22 ,  G03F7/70133 ,  G03F7/70616 ,  G03F7/70625

Abstract: A scatterometer performs diffraction based measurements of one or more parameters of a target structure. To make two-color measurements in parallel, the structure is illuminated simultaneously with first radiation (302) having a first wavelength and a first angular distribution and with second radiation (304) having a second wavelength and a second angular distribution. The collection path (CP) includes a segmented wavelength-selective filter (21, 310) arranged to transmit wanted higher order portions of the diffracted first radiation (302X, 302Y) and of the diffracted second radiation (304X, 304Y), while simultaneously blocking zero order portions (302", 304") of both the first radiation and second radiation. The illumination path (IP) in one embodiment includes a matching segmented wavelength- selective filter (13, 300), oriented such that a zero order ray passing through the illumination optical system and the collection optical system will be blocked by one of said filters or the other, depending on its wavelength.

Abstract translation: 散射仪执行目标结构的一个或多个参数的基于衍射的测量。 为了平行地进行双色测量，该结构与具有第一波长和第一角度分布的第一辐射（302）以及具有第二波长和第二角度分布的第二辐射（304）同时被照射。 收集路径（CP）包括分段波长选择滤波器（21,310），其布置成传送衍射的第一辐射（302X，302Y）和衍射的第二辐射（304X，304Y）的所需高阶部分，同时阻挡 第一辐射和第二辐射二者的零阶部分（302“，304”）。 在一个实施例中，照明路径（IP）包括匹配的分段波长选择滤波器（13,300），其定向为使得通过照明光学系统和收集光学系统的零级光线将被所述滤波器之一阻挡，或者 另一个，取决于其波长。

公开(公告)号：WO2015148851A1

公开(公告)日：2015-10-01

申请号：PCT/US2015/022833

申请日：2015-03-26

Applicant: KLA-TENCOR CORPORATION

Inventor： PLIHAL, Martin ,  JAIN, Ankit ,  LENNEK, Michael

IPC: H01L21/66

CPC classification number: G01N21/93 ,  G01N21/9501 ,  G01N2201/063 ,  G01N2201/12 ,  H01L22/12 ,  H01L22/20

Abstract: Methods and systems for generating defect samples are provided. One method includes identifying a set of defects detected on a wafer having the most diversity in values of at least one defect attribute and generating different tiles for different defects in the set. The tiles define a portion of all values for the at least one attribute of all defects detected on the wafer that are closer to the values for the at least one attribute of their corresponding defects than the values for the at least one attribute of other defects. In addition, the method includes separating the defects on the wafer into sample bins corresponding to the different tiles based on their values of the at least one attribute, randomly selecting defect(s) from each of two or more of the sample bins, and creating a defect sample for the wafer that includes the randomly selected defects.

Abstract translation: 提供了生成缺陷样本的方法和系统。 一种方法包括识别在具有至少一个缺陷属性的值中具有最多分集的晶片上检测到的一组缺陷，并为该组中的不同缺陷生成不同的瓦片。 瓦片定义了在晶片上检测到的所有缺陷的至少一个属性的所有值的一部分，其比其他缺陷的至少一个属性的值更接近于其相应缺陷的至少一个属性的值。 另外，该方法包括基于其至少一个属性的值，将两个或多个样品仓中的每一个随机选择缺陷，将晶片上的缺陷分离成对应于不同瓦片的样品箱，并创建 包括随机选择的缺陷的晶片的缺陷样品。

公开(公告)号：WO2015128579A1

公开(公告)日：2015-09-03

申请号：PCT/FR2015/050447

申请日：2015-02-24

Applicant: HORIBA JOBIN YVON SAS

Inventor： DUTERTRE, Bertrand ,  CATTELAN, Denis ,  FRETEL, Emmanuel

IPC: G01J3/44 ,  G02B21/06 ,  G01N21/65 ,  G02B26/06 ,  G02B27/00 ,  G01B9/04

CPC classification number: G01N21/65 ,  G01J3/0205 ,  G01J3/44 ,  G01N2021/656 ,  G01N2201/06113 ,  G01N2201/063 ,  G01N2201/068 ,  G02B21/0048 ,  G02B21/0064 ,  G02B21/0076 ,  G02B21/02 ,  G02B21/16 ,  G02B27/0025

Abstract: La présente invention concerne un appareil optique de microscopie de diffusion Raman comprenant une source laser (10) adaptée pour émettre un faisceau laser (11) à une longueur d'onde d'excitation λ, un objectif de microscope (14) adapté pour recevoir le faisceau laser (11) et pour focaliser le faisceau laser dans un plan image de l'objectif de microscope (14), le faisceau laser focalisé (21) étant destiné à éclairer un échantillon (20), un système optique adapté pour collecter un faisceau optique de diffusion Raman (22) et des moyens de détection (16, 17) adaptés pour détecter le faisceau de diffusion Raman (22) collecté. Plus particulièrement, on propose selon l'invention, un appareil de microscopie de diffusion Raman comportant en outre un système d'optique adaptative (31, 32, 33) disposé sur un trajet optique du faisceau laser d'excitation (11), sur un trajet optique du faisceau de diffusion Raman (22) ou sur un trajet optique commun du faisceau laser d'excitation (11) et du faisceau de diffusion Raman (22).

Abstract translation: 本发明涉及一种拉曼散射光学显微镜装置，其包括适于发射激发波长λ的激光束（11）的激光源（10），适用于接收激光束（11）的显微镜物镜（14） 将激光束聚焦在显微镜物镜（14）的像平面中，聚焦激光束（21）旨在照射样品（20），适于收集光学拉曼散射光束（22）的光学系统和检测装置 （16,17），适于检测所收集的拉曼散射光束（22）。 更具体地，提出根据本发明的拉曼散射显微镜装置，还包括设置在激发激光束（11）的光路上的自适应光学系统（31,32,33），在拉曼的光路上 散射光束（22）或激光激光束（11）和拉曼散射光束（22）的公共光路上。

公开(公告)号：WO2015080480A1

公开(公告)日：2015-06-04

申请号：PCT/KR2014/011459

申请日：2014-11-27

Applicant: (주)넥스틴 ,  삼성전자주식회사

Inventor： 박태훈 ,  램시갈

IPC: H01L21/66

CPC classification number: G01N21/8851 ,  G01N21/8806 ,  G01N21/9501 ,  G01N2021/8887 ,  G01N2201/063 ,  H01L22/12

Abstract: 반도체 웨이퍼의 결함을 검사하기 위해 웨이퍼 영상을 획득, 검사하되 검사 대상 부분에 대한 영상 빔을 분할하여 동시에 초점 위치를 달리하는 복수 영상을 얻도록 이루어지는 웨이퍼 영상 검사 장치가 개시된다. 이 장치는 조명광을 발생시키는 조명부, 조명광이 검사 대상 웨이퍼에 조사된 후 반사되는 웨이퍼 영상을 획득하여 일방으로 비추어 전달하는 렌즈부, 렌즈부로부터 전달된 웨이퍼 영상을 분할하는 분할광학요소, 이들 렌즈부 및 분할광학요소를 거친 영상이 각각 다른 초점 위치로 결상되도록 설치되는 복수의 촬상소자로 이루어진 영상검출부, 복수의 촬상소자에서 촬상된 서로다른 초점 위치의 영상을 결합하여 TSOM 영상을 구성하고, 이 TSOM 영상을 정상적인 반도체 장치 부분에 대한 TSOM 영상과 비교하여 대상물의 불량 여부를 판단하는 영상 처리부를 구비하여 이루어질 수 있다.

Abstract translation: 公开了一种晶片图像检查装置，其获得并检查晶片图像以检查半导体晶片的缺陷，其中可以通过分割用于待检查部分的图像束来同时获得具有不同焦点的多个图像。 该装置可以包括：用于产生光的照明部分; 用于获得晶片图像的透镜部分，其在光已经被反射到待检查的晶片上之后被反射，然后通过沿一个方向照亮晶片图像来传送晶片图像; 用于分割从透镜部分传送的晶片图像的分割光学元件; 图像检测部分包括多个图像捕获元件，其被安装成使得已经通过透镜部分和分割光学元件的图像分别形成在不同的聚焦位置上; 以及图像处理部分，用于组合由多个图像捕获元件捕获的不同聚焦位置上的图像以形成TSOM图像，并将TSOM图像与正常半导体器件部件的TSOM图像进行比较，以确定对象是否有缺陷。

公开(公告)号：WO2014083798A1

公开(公告)日：2014-06-05

申请号：PCT/JP2013/006781

申请日：2013-11-19

Applicant: コニカミノルタ株式会社

Inventor： 長嶋　義幸 ,  ▲鶴▼谷　克敏

IPC: G01N21/27 ,  G01J3/50

CPC classification number: G01N21/21 ,  G01N21/251 ,  G01N33/32 ,  G01N2201/063

Abstract: 　本発明の反射特性測定装置は、厚さ方向に重ねてホルダーに保持される照明光用および反射光用の各偏光板を有し、前記ホルダーは、被保持姿勢を決める被嵌合部を有し、前記各偏光板それぞれは、前記被嵌合部と嵌合する嵌合部を有し、各嵌合部は、互いの偏光方向を直交させる姿勢で前記各偏光板を前記ホルダーに保持する位置に設けられる。そして、本発明の、前記装置に用いられる偏光板の製造方法では、前記照明光用および前記反射光用の各偏光板は、同一の偏光板部材から打ち抜かれて製造される。

Abstract translation: 该反射特性测量装置具有用于发射的偏振板和用于保持在保持器中并沿厚度方向堆叠的反射光。 支架具有确定保持位置的配件卡舌。 每个偏振片都具有配合凹槽，该凹口适合配合凸片。 每个配件凹口设置在与保持器保持偏振板在使得偏振方向成直角相交的位置的位置。 此外，通过该装置中使用的偏振片的制造方法，通过从相同的偏振构件冲出来制造用于发射光和反射光的偏振片。

公开(公告)号：US20240310295A1

公开(公告)日：2024-09-19

申请号：US18678928

申请日：2024-05-30

Applicant: WUHAN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.

Inventor： Yali LIU ,  Yongzhen JIA

IPC: G01N21/95 ,  G01N21/88

CPC classification number: G01N21/9515 ,  G01N21/8851 ,  G01N2021/8887 ,  G01N2021/9513 ,  G01N2201/063

Abstract: The present application provides a detection method of a crease degree of a screen and a visual detection device, the detection method includes: providing detection rays, and obliquely irradiating the detection rays onto a surface to be measured of the screen; acquiring detection rays reflected by the surface to be measured of the screen to obtain a corresponding light source reflection image; analyzing the light source reflection image to obtain deformation curvatures of the light source reflection image and taking one of a maximum deformation curvature and an average deformation curvature that are obtained through the deformation curvatures as an evaluation index of a crease degree of the screen; and evaluating the crease degree of the screen.

公开(公告)号：US11965830B2

公开(公告)日：2024-04-23

申请号：US17084717

申请日：2020-10-30

Applicant: Evident Corporation

Inventor： Mayumi Odaira ,  Yoshimasa Suzuki

IPC: G01N21/41 ,  G01N21/45 ,  G02B26/10 ,  G02B27/10

CPC classification number: G01N21/4133 ,  G01N21/45 ,  G02B26/105 ,  G02B27/1013 ,  G01N2201/063

Abstract: A data acquisition apparatus includes a light source, a first beam splitter, a predetermined beam splitter, a first light deflector, a second light deflector, a first measuring unit, a second measuring unit, a second beam splitter, and a photodetector. A second measurement optical path is positioned in a first direction and a reference optical path is positioned in a second direction. The predetermined beam splitter is disposed in the second measurement optical path or the reference optical path. A first measurement optical path is positioned between the predetermined beam splitter and the photodetector. The first light deflector and the first measuring unit are disposed in the first measurement optical path, and the second light deflector and the second measuring unit are disposed in the second measurement optical path. The first measurement optical path and the second measurement optical path intersect.

公开(公告)号：US11949991B2

公开(公告)日：2024-04-02

申请号：US17443194

申请日：2021-07-22

Applicant: VIAVI Solutions Inc.

Inventor： Steven Saxe ,  William D. Houck

IPC: H04N23/698 ,  G01N21/31 ,  G02B5/20 ,  G03B11/00 ,  G06T7/00 ,  G06T7/30 ,  H04N5/265 ,  H04N23/55

CPC classification number: H04N23/698 ,  G01N21/314 ,  G02B5/201 ,  G02B5/208 ,  G03B11/00 ,  G06T7/30 ,  G06T7/97 ,  H04N5/265 ,  H04N23/55 ,  G01N2021/3155 ,  G01N2201/063 ,  G06T2207/10036 ,  G06T2207/10048 ,  G06T2207/20212

Abstract: An image capture device may include a first spectral filter and a second spectral filter arranged so that a panoramic image capture operation captures light filtered by the first spectral filter and light filtered by the second spectral filter in a same region of a combined image and one or more processors to: capture a plurality of images based on the panoramic image capture operation; extract first information and second information from the plurality of images, wherein the first information is associated with the first spectral filter and the second information is associated with the second spectral filter; identify an association between the first information and the second information based on a feature captured in the plurality of images via the first spectral filter and the second spectral filter; and store or provide information based on the association between the first information and the second information.

公开(公告)号：US11781958B2

公开(公告)日：2023-10-10

申请号：US17399954

申请日：2021-08-11

Applicant: National Technology & Engineering Solutions of Sandia, LLC

Inventor： Brendan L. Nation ,  Michael T. Dugger ,  John Curry

IPC: G01N3/00 ,  G01N3/56 ,  G01N21/27 ,  G01L3/08 ,  G01N3/02

CPC classification number: G01N3/56 ,  G01L3/08 ,  G01N3/02 ,  G01N21/27 ,  G01N2201/063 ,  G01N2201/08

Abstract: The present invention relates, in part, to systems for characterizing force (e.g., friction, wear, and/or torque). In one embodiment, the system allows for wear testing of samples in a high throughput manner. In another embodiment, the system allows for torque sensing in a non-contact manner.