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公开(公告)号：WO2022112037A1
公开(公告)日：2022-06-02
申请号：PCT/EP2021/081689
申请日：2021-11-15
Applicant: ASML NETHERLANDS B.V.
Inventor： HASPESLAGH, Luc, Roger, Simonne , HUMBLET, Alexis , PANDEY, Nitesh , VAN DER WOORD, Ties, Wouter , YEGEN, Halil, Gökay , GOORDEN, Sebastianus, Adrianus , KLEIN, Alexander, Ludwig , OVERKAMP, Jim, Vincent , OSORIO OLIVEROS, Edgar, Alberto
Abstract: A microelectromechanical system, MEMS, comprises a MEMS wafer comprising an array of MEMS elements partitioned into a plurality of sub-arrays. A respective local control unit is provided for each sub-array a respective local control unit arranged to perform read/write communication with each MEMS element of the corresponding sub-array. The MEMS further includes a control wafer comprising a control circuit for controlling the array of MEMS elements. The control circuit is configured to transmit and receive data signals to and from each of the local control units using, for each control unit, a respective plurality of through silicon vias, TSV, in the control wafer. The control circuit is operative to control the array of MEMS elements using the data signals passed between the control circuit and the local control units, which comprise data signals relating to specific ones of the MEMS elements of the corresponding sub-array of MEMS elements.
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公开(公告)号：WO2021032484A1
公开(公告)日：2021-02-25
申请号：PCT/EP2020/072006
申请日：2020-08-05
Applicant: ASML NETHERLANDS B.V. , IMEC v.z.w.
Inventor： HASPESLAGH, Luc, Roger, Simonne , ROCHUS, Veronique , BRONDANI TORRI, Guilherme , HALBACH, Alexandre , PANDEY, Nitesh , GOORDEN, Sebastianus, Adrianus
Abstract: A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light, and for each mirror of the plurality of mirrors, a respective post connecting the substrate to the mirror. The micromirror array further comprises, for each mirror of the plurality of mirrors, one or more electrostatic actuators connected to the substrate for applying force to the post to displace the post relative to the substrate, thereby displacing the mirror. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection apparatus.
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3.发明申请
公开(公告)号：WO2019158328A1
公开(公告)日：2019-08-22
申请号：PCT/EP2019/051618
申请日：2019-01-23
Applicant: ASML NETHERLANDS B.V.
Inventor： PANDEY, Nitesh , ZHOU, Zili , VAN DER ZOUW, Gerbrand , DEN BOEF, Arie , VAN KRAAIJ, Markus, Gerardus, Martinus, Maria , KOOLEN, Armand, Eugene, Albert , CRAMER, Hugo, Augustinus, Joseph , HINNEN, Paul, Christiaan , VAN WEERT, Martinus, Hubertus, Maria , TSIATMAS, Anagnostis , WANG, Shu-jin , FAGGINGER AUER, Bastiaan, Onne , VERMA, Alok
IPC: G03F7/20
Abstract: A inspection apparatus, method, and system associated therewith are described herein. In a non-limiting embodiment, a inspection apparatus includes an optical system and an imaging system. The optical system may be configured to output an illumination beam incident on a target including one or more features, and the illumination beam being polarized with a first polarization when incident on the target. The imaging system may be configured to obtain intensity data representing at least a portion of the illumination beam scattered by the one or more features, where the portion of the illumination beam has a second polarization orthogonal to the first polarization; generate image data representing an image of each of the feature(s) based on the intensity data; and determine a measurement of a parameter of interest associated with the feature(s) based on an amount of the portion of the illumination beam having the second polarization.
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公开(公告)号：WO2018219639A1
公开(公告)日：2018-12-06
申请号：PCT/EP2018/062547
申请日：2018-05-15
Applicant: ASML NETHERLANDS B.V.
Inventor： RAVENSBERGEN, Janneke , PANDEY, Nitesh , ZHOU, Zili , KOOLEN, Armand, Eugene, Albert , GOORDEN, Sebastianus, Adrianus , FAGGINGER AUER, Bastiaan, Onne , MATHIJSSEN, Simon, Gijsbert, Josephus
Abstract: A metrology apparatus is disclosed that measures a structure formed on a substrate to determine a parameter of interest. The apparatus comprises an optical system configured to focus radiation onto the structure and direct radiation after reflection from the structure onto a detector, wherein: the optical system is configured such that the detector detects a radiation intensity resulting from interference between radiation from at least two different points in a pupil plane field distribution, wherein the interference is such that a component of the detected radiation intensity containing information about the parameter of interest is enhanced relative to one or more other components of the detected radiation intensity.
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公开(公告)号：WO2018114152A1
公开(公告)日：2018-06-28
申请号：PCT/EP2017/079345
申请日：2017-11-15
Applicant: ASML NETHERLANDS B.V.
Inventor： GOORDEN, Sebastianus, Adrianus , PANDEY, Nitesh , AKBULUT, Duygu , POLO, Alessandro , HUISMAN, Simon, Reinald
Abstract: Disclosed is a metrology sensor system, such as a position sensor. The system comprises an optical collection system configured to collect diffracted or scattered radiation from a metrology mark on a substrate, said collected radiation comprising at least one parameter-sensitive signal and noise signal which is not parameter-sensitive, a processing system operable to process the collected radiation; and a module housing. An optical guide is provided for guiding the at least one parameter-sensitive signal, separated from the noise signal, from the processing system to a detection system outside of the housing. A detector detects the separated at least one parameter-sensitive signal. An obscuration for blocking zeroth order radiation and/or a demagnifying optical system may be provided between the optical guide and the detector.
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Patent Agency Ranking
公开(公告)号：WO2016124399A1
公开(公告)日：2016-08-11
申请号：PCT/EP2016/051080
申请日：2016-01-20
Applicant: ASML NETHERLANDS B.V.
Inventor： PANDEY, Nitesh
IPC: G03F7/20
CPC classification number: G01N21/4788 , G03F7/70625 , G03F7/70633 , G03F7/70641 , G03F7/70941
Abstract: An optical system (10) includes an arrangement for splitting a source beam into a measurement beam and a reference beam. The reference beam is reflected off a reflective element (42) which mounted on a delay line (44). A target (35) scatters the radiation from the measurement beam. The scattered radiation and the reference beam are brought to interfere on a detector (40) by calibrating the delay line (44). The detected interference pattern is Fourier-transformed and filtered to select a region of interest around a side-band of the Fourier-transformed interference pattern in order to remove noise caused by stray radiation that hits the detector.
Abstract translation: 光学系统（10）包括用于将源光束分成测量光束和参考光束的装置。 参考光束从安装在延迟线（44）上的反射元件（42）反射。 目标（35）散射来自测量光束的辐射。 通过校准延迟线（44）使分散的辐射和参考光束在检测器（40）上产生干涉。 检测到的干涉图案被傅立叶变换和滤波，以选择傅立叶变换干涉图案的边带周围的感兴趣区域，以便消除由检测器引起的杂散辐射引起的噪声。
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公开(公告)号：WO2022112027A1
公开(公告)日：2022-06-02
申请号：PCT/EP2021/081584
申请日：2021-11-12
Applicant: ASML NETHERLANDS B.V.
Inventor： HASPESLAGH, Luc, Roger, Simonne , PANDEY, Nitesh , VAN DER WOORD, Ties, Wouter , YEGEN, Halil, Gökay YEGEN , OVERKAMP, Jim, Vincent , BRONDANI TORRI, Guilherme , GOORDEN, Sebastianus, Adrianus , KLEIN, Alexander, Ludwig , OSORIO OLIVEROS, Edgar, Alberto
IPC: G03F7/20 , G02B26/08 , H01L41/047 , H01L41/083
Abstract: A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light and, for each mirror of the plurality of mirrors, at least one multilayer piezoelectric actuator for displacing the mirror, wherein the at least one multilayer piezoelectric actuator is connected to the substrate, and wherein the at least one multilayer piezoelectric actuator comprises a plurality of piezoelectric layers of piezoelectric material interleaved with a plurality of electrode layers to form a stack of layers. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection and/or metrology apparatus.
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公开(公告)号：WO2022111975A1
公开(公告)日：2022-06-02
申请号：PCT/EP2021/080873
申请日：2021-11-08
Applicant: ASML NETHERLANDS B.V.
Inventor： HASPESLAGH, Luc, Roger, Simonne , PANDEY, Nitesh , VAN DER WOORD, Ties, Wouter , YEGEN, Halil, Gökay , OVERKAMP, Jim, Vincent , GOORDEN, Sebastianus, Adrianus , HUMBLET, Alexis , KLEIN, Alexander, Ludwig , BRONDANI TORRI, Guilherme , OSORIO OLIVEROS, Edgar, Alberto
Abstract: A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light and, for each mirror of the plurality of mirrors, at least one piezoelectric actuator for displacing the mirror, wherein the at least one piezoelectric actuator is connected to the substrate. The micromirror array further comprises one or more pillars connecting the mirror to the at least one piezoelectric actuator. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection and/or metrology apparatus.
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公开(公告)号：WO2020254041A1
公开(公告)日：2020-12-24
申请号：PCT/EP2020/063426
申请日：2020-05-14
Applicant: ASML NETHERLANDS B.V.
Abstract: Disclosed is a method of determining a complex-valued field relating to a sample measured using an imaging system. The method comprises obtaining image data relating to a series of images of the sample, imaged at an image plane of the imaging system, and for which at least two different modulation functions are imposed in a Fourier plane of the imaging system; and determining the complex-valued field from the imaging data based on the imposed modulation functions.
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公开(公告)号：WO2020035201A1
公开(公告)日：2020-02-20
申请号：PCT/EP2019/066584
申请日：2019-06-24
Applicant: ASML NETHERLANDS B.V.
Inventor： PANDEY, Nitesh
IPC: G03F7/20 , G01N21/47 , G01N21/956 , F21V8/00
Abstract: A metrology apparatus for determining a parameter of interest of a structure formed by a lithographic process on a substrate, the metrology apparatus comprising: an illuminator for illuminating the structure; a lens for collecting at least a portion of radiation diffracted from the structure; and an image sensor for receiving and obtaining a recording of the collected diffracted radiation; wherein the illuminator comprises at least one optical fiber for illuminating the structure directly.
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