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    Color x-ray histology for multi-stained biologic sample
    105.
    发明授权
    Color x-ray histology for multi-stained biologic sample 有权
    彩色x射线组织学多染色生物样品

    公开(公告)号：US09513233B2

    公开(公告)日：2016-12-06

    申请号：US14354855

    申请日：2012-10-29

    Applicant: THE UNIVERSITY OF CHICAGO

    Inventor： Patrick La Riviere ,  Yuxin Steve Wang ,  Darin Clark ,  Keith Cheng

    IPC: A61B6/00 ,  G01N23/04 ,  G01N23/223 ,  G06T19/00 ,  G01N23/225 ,  B82Y10/00 ,  A61B6/03

    CPC classification number: G01N23/04 ,  A61B6/032 ,  A61B6/482 ,  A61B6/508 ,  B82Y10/00 ,  G01N23/046 ,  G01N23/223 ,  G01N23/2251 ,  G01N2223/0766 ,  G01N2223/6126 ,  G06T19/00 ,  G06T2210/41 ,  G21K2201/061 ,  G21K2201/064

    Abstract: Systems and methods are provided for staining tissue with multiple biologically specific heavy metal stains and then performing X-ray imaging, either in projection or tomography modes, using either a plurality of illumination energies or an energy sensitive detection scheme. The resulting energy-weighted measurements can then be used to decompose the resulting images into quantitative images of the distribution of stains. The decomposed images may be false-colored and recombined to make virtual X-ray histology images. The techniques thereby allow for effective differentiation between two or more X-ray dyes, which had previously been unattainable in 3D imaging, particularly 3D imaging of features at the micron resolution scale. While techniques are described in certain example implementations, such as with microtomography, the techniques are scalable to larger fields of view, allowing for use in 3D color, X-ray virtual histology of pathology specimens.

    Abstract translation: 提供了用多个生物特异性重金属染色染色组织的系统和方法，然后使用多个照明能量或能量敏感检测方案，以投影或断层摄影模式进行X射线成像。 然后，所得到的能量加权测量可用于将所得图像分解成污渍分布的定量图像。 分解图像可能是假色的并重新组合以制作虚拟X射线组织学图像。 因此，这些技术允许两种或多种X射线染料之间的有效区分，其先前在3D成像中是不可实现的，特别是在微米分辨率刻度上的特征的3D成像。 虽然技术在某些示例实现中被描述，例如利用微影像技术，但是这些技术可以扩展到更大的视野，允许在3D颜色，病理标本的X射线虚拟组织学中使用。

    REFLECTOR, PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
    107.
    发明申请
    REFLECTOR, PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 有权
    反射器，投影光学系统，曝光装置和装置制造方法

    公开(公告)号：US20150219997A1

    公开(公告)日：2015-08-06

    申请号：US14402666

    申请日：2013-03-15

    Applicant: NIKON CORPORATION

    Inventor： Yoshio Kawabe ,  Hiroshi Chiba

    IPC: G03F7/20 ,  G21K1/06 ,  G02B5/08

    CPC classification number: G03F7/70316 ,  G02B5/0816 ,  G02B5/0833 ,  G02B5/0875 ,  G02B5/0891 ,  G03F7/20 ,  G03F7/702 ,  G21K1/062 ,  G21K2201/061

    Abstract: A reflective mirror is provided with a base and a multilayer film including first layers and second layers laminated alternately on the base and capable of reflecting at least a portion of the incident light. The multilayer film is provided with a first portion having a first thickness, and with a second portion which has a second thickness different from the first thickness and which is provided at a position rotationally symmetric to that of the first portion about the optical axis of the reflective mirror relative.

    Abstract translation: 反射镜设置有基部和多层膜，该多层膜包括在基底上交替地层叠的第一层和第二层，并能够反射入射光的至少一部分。 该多层膜设置有具有第一厚度的第一部分，并且具有第二部分，该第二部分具有不同于第一厚度的第二厚度，并且该第二部分设置在与第一部分的旋转对称的位置处， 反光镜相对。

    Optical member for EUV lithography, and process for production of reflective layer-equipped substrate
    108.
    发明授权
    Optical member for EUV lithography, and process for production of reflective layer-equipped substrate 有权
    用于EUV光刻的光学构件，以及用于生产装有反射层的衬底的工艺

    公开(公告)号：US08927179B2

    公开(公告)日：2015-01-06

    申请号：US13469161

    申请日：2012-05-11

    Applicant: Masaki Mikami

    Inventor： Masaki Mikami

    IPC: G03F1/24 ,  G02B5/08 ,  C23C16/40 ,  G03F7/20 ,  B82Y40/00 ,  B82Y10/00

    CPC classification number: G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  G02B5/0891 ,  G03F7/70958 ,  G21K2201/061

    Abstract: There are provided an EUV optical member, in which deterioration in the reflectivity due to oxidation of the Ru protective layer is prevented, a functional film-equipped substrate to be employed for production of the EUV optical member, and a process for producing the functional film-equipped substrate. A reflective layer-equipped substrate for EUV lithography comprising a substrate, and a reflective layer for reflecting EUV light and a protective layer for protecting the reflective layer, formed in this order on the substrate, wherein the reflective layer is a Mo/Si multilayer reflective film, the protective layer is a Ru layer or a Ru compound layer, and an intermediate layer containing from 0.5 to 20 at % of oxygen and from 80 to 99.5 at % of Si is formed between the reflective layer and the protective layer.

    Abstract translation: 提供了防止由Ru保护层氧化引起的反射率劣化的EUV光学部件，用于生产EUV光学部件的配备功能膜的基板以及用于制造功能膜的方法 配基底物。 一种用于EUV光刻的反射层衬底，包括衬底，以及用于反射EUV光的反射层和用于保护反射层的保护层，其依次形成在衬底上，其中反射层是Mo / Si多层反射 保护层是Ru层或Ru化合物层，并且在反射层和保护层之间形成含有0.5〜20原子％的氧和80〜99.5原子％的Si的中间层。

    X RAY WAVEGUIDE SYSTEM
    109.
    发明申请
    X RAY WAVEGUIDE SYSTEM 审中-公开
    X射线波导系统

    公开(公告)号：US20140376699A1

    公开(公告)日：2014-12-25

    申请号：US14344950

    申请日：2012-09-05

    Applicant: Atsushi Komoto ,  Hirokatsu Miyata ,  Kohei Okamoto ,  Wataru Kubo ,  Takashi Noma

    Inventor： Atsushi Komoto ,  Hirokatsu Miyata ,  Kohei Okamoto ,  Wataru Kubo ,  Takashi Noma

    IPC: G21K1/06

    CPC classification number: G21K1/06 ,  B82Y10/00 ,  G21K1/062 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/067

    Abstract: An X-ray waveguide system capable of forming X-rays having spatial coherence of a large space region has an X-ray collecting optical element which collects incident X-rays; and an X-ray waveguide containing a core and claddings and wave-guiding a collected X-ray collected by the X-ray collecting optical element, in which the core of the X-ray waveguide is a periodic structure body in which a plurality of basic structures containing substances different in the refractive-index real part are periodically disposed, the total reflection critical angle of the collected X-ray at the interface of the core and the cladding is equal to or larger than the Bragg angle corresponding to the period of the core, and the collection angle of the collected X-ray entering the X-ray waveguide is as large as or larger than the double of the Bragg angle.

    Abstract translation: 能够形成具有大空间区域的空间相干性的X射线的X射线波导系统具有收集入射X射线的X射线收集光学元件， 以及包含芯和包层的X射线波导，并且对由X射线收集光学元件收集的X射线收集的X射线进行波导，其中X射线波导的芯是周期性结构体，其中多个 周期性地设置包含折射率实部不同的物质的基本结构，在芯和包层的界面处收集的X射线的全反射临界角等于或大于对应于 核心和收集的入射到X射线波导的X射线的收集角度大于或大于布拉格角的两倍。

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