公开(公告)号：DE102014209539B3

公开(公告)日：2015-07-30

申请号：DE102014209539

申请日：2014-05-20

Applicant: SIEMENS AG

Inventor： BERK JAN ,  WEIDINGER THOMAS

IPC: H01J35/14 ,  H01J3/10 ,  H01J29/70

Abstract: Die Erfindung nennt Positioniervorrichtung (1) für einen Elektronenstrahl (6) einer Elektronenröhre, insbesondere einer Röntgenröhre (2), umfassend einen ersten Gleichspannungskreis (12) großer Potentialdifferenz (U1) und einen zweiten Gleichspannungskreis (18) kleinerer Potentialdifferenz (U2) mit je einer ersten Potentialebene (14, 20) und einer zweiten Potentialebene (16, 22), und ein Ablenkmodul (24), welches zwei Eingänge (37, 49) und wenigstens eine Ablenkspule (28) aufweist, wobei die wenigstens eine Ablenkspule (28) zwischen den beiden Eingängen (37, 49) des Ablenkmoduls (24) verschaltet ist, wobei die erste Potentialebene (14) des ersten Gleichspannungskreises (12) schaltbar mit einem Eingang (37) des Ablenkmoduls (24) verbunden ist und hierdurch ein erster Schaltweg (34) gebildet wird, und dabei die zweite Potentialebene (16) des ersten Gleichspannungskreises (12) mit dem verbleibenden Eingang (49) des Ablenkmoduls (24) verschaltet ist, und wobei die erste Potentialebene (20) des zweiten Gleichspannungskreises (18) schaltbar mit einem Eingang (37) des Ablenkmoduls (24) verbunden ist und hierdurch ein zweiter Schaltweg (38) gebildet wird, welcher getrennt vom ersten Schaltweg (34) schaltbar ist, und dabei die zweite Potentialebene (22) des zweiten Gleichspannungskreises (18) mit dem verbleibenden Eingang (49) des Ablenkmoduls (24) verschaltet ist. Die Erfindung nennt weiter ein Verfahren (60) zur pulsweitenmodulierten Ansteuerung einer solchen Positioniervorrichtung (1).

公开(公告)号：DE10230164B4

公开(公告)日：2009-04-09

申请号：DE10230164

申请日：2002-07-04

Applicant: SAMSUNG ELECTRONICS CO LTD

Inventor： HWANG JUNG-HYUN ,  HUH NO-HYUN ,  CHOI BYEUNG-WOOK ,  JUNG JIN-SU ,  CHOI JAE-SUN ,  LEE DOO-WON

IPC: H01F1/24 ,  H05H1/46 ,  C23C16/50 ,  H01F1/00 ,  H01F1/11 ,  H01F3/08 ,  H01F27/255 ,  H01F41/02 ,  H01J3/10 ,  H01J37/32 ,  H01L21/205 ,  H01L21/3065

Abstract: An induction magnet comprises a body containing at least one unitary part of an electrically insulating and magnetic material. Independent claims are also included for: (a) a method of manufacturing an inducing magnet comprising transforming metallic magnetic material in bulk into a powder of particles of the metallic magnetic material, coating the particles of the powder with an electrically insulating material, compacting the particles of the powder into a mold to form a rigid body, sintering the body, and thermally treating the sintered body; and (b) semiconductor manufacturing equipment using high density plasma, comprising a reaction chamber having a plasma region, a support disposed in the chamber and dedicated to support a substrate, a reaction gas supplier positioned in the chamber, and the inventive induction magnet.

公开(公告)号：HU222168B1

公开(公告)日：2003-04-28

申请号：HU0003015

申请日：1998-05-11

Applicant: PHOTOCURE ASA

Inventor： STEEN HARALD B

IPC: A61N5/06 ,  H01J20060101 ,  H01J3/10

Abstract: A device for irradiating a limited, defined area where uniform and intense irradiation is obtained of a sharply defined light field (7) of variable size, the light from a halogen lamp (1) or similar incoherent light source being directed by means of an elliptical mirror (2) towards one end surface (3) of a transparent rod (4) whose opposite end surface (6) is thereby uniformly irradiated and is imaged by a lens (7) in the area (9) which has to be irradiated.

公开(公告)号：AU722620B2

公开(公告)日：2000-08-10

申请号：AU7678098

申请日：1998-05-11

Applicant: PHOTOCURE ASA

Inventor： STEEN HARALD B

IPC: A61N5/06 ,  H01J20060101 ,  H01J3/10

Abstract: A device for irradiating a limited, defined area where uniform and intense irradiation is obtained of a sharply defined light field (7) of variable size, the light from a halogen lamp (1) or similar incoherent light source being directed by means of an elliptical mirror (2) towards one end surface (3) of a transparent rod (4) whose opposite end surface (6) is thereby uniformly irradiated and is imaged by a lens (7) in the area (9) which has to be irradiated.

公开(公告)号：BR9809829A

公开(公告)日：2000-06-20

申请号：BR9809829

申请日：1998-05-11

Applicant: PHOTOCURE ASA

Inventor： STEEN HARALD B

IPC: A61N5/06 ,  H01J20060101 ,  H01J3/10

Abstract: A device for irradiating a limited, defined area where uniform and intense irradiation is obtained of a sharply defined light field (7) of variable size, the light from a halogen lamp (1) or similar incoherent light source being directed by means of an elliptical mirror (2) towards one end surface (3) of a transparent rod (4) whose opposite end surface (6) is thereby uniformly irradiated and is imaged by a lens (7) in the area (9) which has to be irradiated.

公开(公告)号：DE19634304A1

公开(公告)日：1998-02-26

申请号：DE19634304

申请日：1996-08-24

Applicant: MAK SYSTEM GMBH

Inventor： SERMUND GERALD DR

IPC: H01J37/04 ,  H01J37/06 ,  H01J37/24 ,  H01J37/248 ,  H01J3/02 ,  H01J3/10 ,  H01J37/147

公开(公告)号：FR2702593A1

公开(公告)日：1994-09-16

申请号：FR9302699

申请日：1993-03-09

Applicant: COMMISSARIAT ENERGIE ATOMIQUE ,  DUVAL JEAN ,  CENTRE NAT RECH SCIENT

Inventor： OLIVIER DELFERRIERE ,  JEAN FAURE ,  RAPHAEL GOBIN ,  JEAN DUVAL

IPC: H01J3/02 ,  H01J3/38 ,  H01J37/073 ,  H01J37/12 ,  H01J3/10 ,  H01J49/00 ,  H05H5/06 ,  H05H7/00

公开(公告)号：DE2847369A1

公开(公告)日：1979-05-03

申请号：DE2847369

申请日：1978-10-31

Applicant: FUJITSU LTD

Inventor： BUELOW FRED K ,  ZASIO JOHN J ,  COOKE LAURENCE H

IPC: H01L21/027 ,  H01J37/304 ,  H01J37/30 ,  H01J3/10

Abstract: An electron beam exposure system and method for use in the process of fabricating microminiature devices at high speeds. The high-speed operation is achieved with a computer providing programmed commands specifying a particular pattern to be scanned. A processor, responsive to programmed data, generates scan data a line at a time and loads a line generator. The line generator steps to each exposure location in a line to provide control signals for controlling the position of the electron beam. The starting and end positions of scan lines in both the X and Y directions may be arbitrarily selected thereby eliminating the need for scanning areas not intended to be processed.

公开(公告)号：DE2706631B2

公开(公告)日：1979-04-12

申请号：DE2706631

申请日：1977-02-16

Applicant: ATOMIC ENERGY OF CANADA LTD., OTTAWA

Inventor： MCKEOWN, JOSEPH, DEEP RIVER, ONTARIO (KANADA)

IPC: H01J23/10 ,  G01T1/29 ,  G21K1/04 ,  G21K1/093 ,  H05H7/18 ,  H05H7/00 ,  H01J23/09 ,  H01J3/10

Abstract: A charged particle beam position monitor having a resonant cavity which is excited in a first mode if the monitored beam passing through it is displaced along the x-axis, and is excited in a second mode orthogonal to the first if the monitored beam passing through it is displaced along the y-axis. These modes are tuned to the same frequency and may be independently detected. The X and Y coordinates of the beam are determined by the amplitude and phase of the detected first and second orthogonal modes respectively.

公开(公告)号：DE2056620B2

公开(公告)日：1977-11-10

申请号：DE2056620

申请日：1970-11-18

IPC: H01J37/30 ,  G05B19/39 ,  H01J37/304 ,  H01L21/00 ,  H01L21/027 ,  H01J3/10

Abstract: 1329559 Programmed control INTERNATIONAL BUSINESS MACHINES CORP 3 Dec 1970 [15 Dec 1969] 57380/70 Heading G3N [Also in Division H1] A beam of charged particles, scanning in a raster over a workpiece, is precisely positioned by determining beam error with respect to a reference position, storing the error and correcting the raster position accordingly. As shown, an electron beam from a gun 10 is directed through a square aperture 12, which shapes it to a beam 11 of a size equal to the minimum line width of a raster pattern to be formed on a workpiece mounted on a table 29. The beam is electro-magnetically focussed by a coil 15 and passes between blanking plates 16. The beam 11 is then passed through a circular aperture 19, which passes only axial charged particles, so that a square shaped spot without distortion is produced. The beam is subjected to co-ordinate deflections by electromagnetic coils 21-24 and electro-static plates 25-28. The table 29 is moved in co-ordinate directions by motors 30, 31, 31'. To ascertain the correct focus and astigmatism of the beam 11 a grid 47 of copper foil is mounted on the table and the focus detected by a PIN diode, not shown, the output of which through an interface circuit 17 is interrogated by a computer 18 which provides signals to the circuit 17 for control of the electron beam. The calibration of the beam 11 is ascertained by use of a grid 60 of copper foil having a pattern with accurately dimensioned square openings. The beam is detected by a PIN diode, not shown, and the error is determined by and stored within the computer for subsequent use during the execution of a programmed electron beam machining operation on chips on a semi-conductor substrate positioned by co-ordinate movement of the table. The beam is moved across the substrate in a raster pattern by signals from the interface circuit to coils 21-24 under control of the computer and correction signals applied to plates 25-28. The beam is held stationary in a position determined by the programme by the application of a bucking sawtooth waveform to the X electrostatic plates 25, 26. It is stated that the electrostatic plates 25-26 could be replaced by high frequency electromagnetic coils and the focus grid 47 omitted and the calibration grid 60 utilized for focusing. Facilities are provided whereby, on substitution of a substrate, the table can be rotated by a motor, not shown, to the align the substrate with the scanning directions.