公开(公告)号：EP1301341A1

公开(公告)日：2003-04-16

申请号：EP01950670.8

申请日：2001-06-27

Applicant: MicroCoating Technologies, Inc.

Inventor： DESHPANDE, Girish ,  HUNT, Andrew, Tye ,  SHANMUGHAM, Subramaniam ,  YURTKURAN, Eric, J. ,  POLLEY, Todd ,  OLJACA, Miodrag ,  HWANG, Tzyy-Jiuan, Jan ,  PODA, Aimee ,  NEUMAN, George, Andrew

IPC: B32B27/06 ,  B32B27/08 ,  B32B27/28 ,  B32B27/30 ,  B32B27/32 ,  B32B27/34 ,  B32B27/36 ,  B32B27/38 ,  B32B27/40 ,  C23C4/04 ,  C23C16/00

CPC classification number: C03C17/001 ,  B05D1/08 ,  B05D1/34 ,  B05D3/0254 ,  B05D3/08 ,  B05D2518/10 ,  C03C17/007 ,  C03C17/009 ,  C03C17/32 ,  C03C17/42 ,  C03C2217/425 ,  C03C2217/445 ,  C03C2217/475 ,  C08K3/22 ,  C08K3/346 ,  C09D7/61 ,  C09D183/04 ,  C23C4/12 ,  C23C4/123 ,  C23C26/00 ,  Y10T428/12583 ,  Y10T428/31522

Abstract: A coherent material is formed on a substrate ( 10 ) by providing a precursor suspension ( 14 ) in which particulates are suspended in a carrier fluid, and directing the precursor suspension ( 14 ) at the substrate ( 10 ) from a first source ( 12 ). Generally contemporaneously with application of the deposited precursor suspension ( 14 ) to the surface, hot gases, e.g. hot gases produced by a flame ( 16 ), are directed at the substrate ( 10 ) from a remote second source ( 18 ) to fuse the particulates into the coherent material.

公开(公告)号：EP1145252A3

公开(公告)日：2002-08-28

申请号：EP00921311.7

申请日：2000-01-12

Applicant: MicroCoating Technologies, Inc.

Inventor： HUNT, Andrew, T. ,  DESHPANDE, Girish ,  COUSINS, Donald ,  HWANG, Tzyy-Jiuan, Jan ,  LIN, Wen-Yi ,  SHOUP, Shara, S.

IPC: H01B1/00

公开(公告)号：EP0976847A2

公开(公告)日：2000-02-02

申请号：EP99303373.7

申请日：1999-04-29

Applicant: MicroCoating Technologies, Inc.

Inventor： Hunt, Andrew T. ,  Shanmugham, Subramaniam ,  Danielson, William D. ,  Luten, Henry A. ,  Hwang, Tzyy Jiuan ,  Deshpande, Girish

IPC: C23C16/44 ,  C23C16/06 ,  C23C16/18 ,  C23C16/36 ,  C23C16/34 ,  C23C16/40

CPC classification number: C23C16/45519 ,  B05D1/08 ,  C23C16/14 ,  C23C16/18 ,  C23C16/30 ,  C23C16/342 ,  C23C16/36 ,  C23C16/406 ,  C23C16/409 ,  C23C16/453 ,  C23C16/45561 ,  C23C16/45576 ,  C23C16/45595 ,  C23C16/50

Abstract: An improved chemical vapor deposition apparatus and procedure is disclosed. The technique provides improved shielding of the reaction and deposition zones (26, 28) involved in providing CVD coatings by establishing a barrier zone (30) wherein gases flowing from a reaction zone (26) and deposition zone (28) to the ambient atmosphere are made to flow at a velocity of at least 15.24 m/min. Coatings can thus be produced, at atmospheric pressure, of materials which are sensitive to components in the atmosphere on substrates which are sensitive to high temperatures and which are too large, or inconvenient, to process in vacuum or similar chambers. The improved technique can be used with various energy sources and is particularly compatible with Combustion Chemical Vapor Deposition (CCVD) techniques.

Abstract translation: 公开了一种改进的化学气相沉积装置和方法。 该技术通过建立阻挡区（30）提供涉及提供CVD涂层的反应和沉积区（26,28）的改进屏蔽，其中从反应区（26）和沉积区（28）流到环境大气的气体为 使其以至少15.24m / min的速度流动。 因此，在大气压下，可以在大气压下对在高温敏感且在真空或类似室中处理过大或不方便的基板上的大气中的组分敏感的材料制成涂层。 改进的技术可以与各种能源一起使用，并且与燃烧化学气相沉积（CCVD）技术特别相容。