Abstract:
본 발명은 반사광측정법에 근거한 분산 백색광 간섭법을 이용한 박막 두께 및 형상측정방법에 관한 것이다. 본 발명은 간섭광의 간섭무늬를 획득하여 상기 박막의 파장에 따른 광강도분포를 획득하는 단계; 획득된 파장에 따른 광강도분포를 통해 절대반사율을 구하는 단계; 절대반사율에 의해 박막의 두께(d)값을 구하는 단계; 합성간섭광의 간섭무늬로부터 두께 및 형상에 의한 제 1위상변화값을 추출하는 단계; 제 1위상변화값에 포함된 두께에 의한 제 2위상변화값을 추출하는 단계; 제 1위상변화값에서 상기 제 2위상변화값을 보상하여 형상에 의한 제 3위상변화값을 구하는 단계; 및 제 3위상변화값에서 형상(h)값을 구하는 단계를 포함하는 것을 특징으로 한다. 따라서, 본 발명은 초박막의 두께 및 형상에 대한 빠른 측정이 가능하고, 외부 환경이나 진동에 둔감한 것을 특징으로 한다. 반사광측정법, 분산 백색광 간섭법, 박막의 두께 및 형상 측정
Abstract:
본 발명은 백색광 간섭계를 이용한 투명박막의 두께 및 형상을 측정하는 장치 및 방법에 관한 것이다. 본 발명은 간섭광을 주파수별로 분광시킨 후 주파수별 제 1간섭무늬를 획득하고 합성간섭광을 주파수별로 분광시킨 후 주파수별 제 2간섭무늬를 획득한다. 제 1간섭무늬를 통해 박막의 두께로 인해 생성되는 위상을 얻고 위상으로부터 박막의 두께정보만을 획득한다. 제 2간섭무늬로부터 위상을 구하고, 박막두께정보가 포함된 박막표면정보를 획득한다. 박막두께정보를 이용해 박막두께정보가 포함된 박막표면정보로부터 박막의 표면정보를 획득한다. 따라서, 본 발명은 별도의 구동 장치 없이 실시간 측정과 한번의 측정으로 한 점 또는 한 선에 대한 처리가 가능하고 외부 진동에 강인한 효과가 있다. 분산형, 간섭계, 백색광,
Abstract:
PURPOSE: A phase transition diffraction grating interferometer and a measuring method thereof are provided to measure an object by adopting an interference pattern obtained from an optical system to a phase transition algorithm. CONSTITUTION: A light source(43) radiates light through a lens(53) and an aperture(63). A lens(73) makes parallel light and lens(83) allows parallel light to be focused on a reflective diffraction grating(103). Light incident into the reflective diffraction grating(103) is split into several parts. One of them is reference light(233) and other light(223) forwards to an object to be measured. Light passing through a lens(113) and an iris(123) forms an image on an image obtaining device(23). The image obtaining device(23) includes a CCD camera. A CPU(13) controls a phase transition driver so as to allow the phase transition to apply a signal to a phase transition generator(153).
Abstract:
Disclosed are a device and a method for making an experiment on temperature characteristic of material. The device includes a small volume thermostat for maintaining temperature uniformly and an interferometer for measuring a length change according to a temperature change of a measured fragment. Material, which maintains inside temperature of the thermostat uniformly, is disposed around the thermostat. The material maintains temperature uniformly for a long time when phase is changed. A hole is formed in a front surface of the thermostat to allow beam to be transmitted, thereby measuring the length change of the measured fragment inside the thermostat. By measuring the length change in a noncontact way when beam is transmitted through the hole, the temperature characteristic of the material is tested according to temperature.
Abstract:
PURPOSE: Provided are a method and an apparatus for stabilizing the length of engineering material by using the heat-physical property of gallium, which can be used in laboratories needing accurate measurement and length stabilization. CONSTITUTION: The apparatus for making an experiment on the temperature property of material comprises the gallium covering a thermostat, heating plates(40) applying heat to the gallium, temperature sensors(50) for measuring the temperature of the gallium, and a central control unit. And the method for making the experiment on the temperature property of material comprises the steps of: sensing the temperature of the gallium; comparing and judging if the sensed temperature is a fixed temperature; applying heat to the gallium by applying a voltage to the heating plates(40) if the sensed temperature is lower than the fixed temperature; cutting the heat supply by cutting the applied voltage if the sensed temperature is higher than the fixed temperature.
Abstract:
PURPOSE: Methods for measuring a 3-D thickness profile and a refractive index of a transparent thin film by white-light scanning interferometry and a recording medium thereof are provided to precisely measure a 3-D thickness profile and a thickness value of a transparent thin film at any position. CONSTITUTION: A method for measuring a 3-D thickness profile of a transparent thin film by white-light scanning interferometry includes the steps of computing a phase graph by performing a fourier transform after obtaining an interference signal(S1302), modeling objects to measure and computing a mathematical phase graph from the modeling results(S1303), and measuring profile and thickness values by setting an error function using the phase values obtained in the first and second steps and applying an optimization technique(S1304-S1308).
Abstract:
PURPOSE: A method for projection type moire using a phase transition grating and a system for the same are provided to improve measuring resolvability by applying a phase transition method to a projection type moire. CONSTITUTION: A projection grating(30) and a reference grating(31) are used as one couple. A relative distance between the projection grating(30) and the reference grating(31) is set up. Gratings of n couples are formed on one quartz glass by using a semiconductor lithography method. A phase transition grating(40) is manufactured by forming grating of n couples. The phase transition is obtained by using the phase transition grating(40).