Abstract:
A lithographic apparatus is disclosed that comprises a template holder configured to hold a plurality of imprint templates, and a substrate holder configured to hold a substrate, the template holder being located beneath the substrate holder.
Abstract:
L'invention concerne un dispositif pour insoler une face (118) d'un panneau (120), en particulier pour panneau de circuit imprimé. Selon un premier aspect de l'invention, le dispositif comporte : - des moyens pour maintenir un cliché et ledit panneau (120), - un système optique (112) émettant un faisceau lumineux (I), des moyens de traitement (116, 151) pour générer un faisceau lumineux homogène et collimaté (III) dont l'angle d'incidence moyen par rapport à la surface à insoler (118) est inférieur à 2° et dont l'homogénéité de l'éclairement présente un écart inférieur à ± 10% par rapport à la valeur moyenne, et des moyens de mise en forme (158, 160) pour transformer ledit faisceau lumineux (III) en une bande lumineuse (126, 162), - des moyens de déplacement (121) pour générer un mouvement entre ladite bande lumineuse (126) et ladite face (118), et - des moyens d'adaptation de la vitesse de déplacement entre ladite bande lumineuse (126) et ladite face (118).
Abstract:
A flexible substrate, which has a photosensitive agent applied thereon, is continuously supplied from a supply unit to a guide unit where light is irradiated from a light source on a section of the substrate. A mask is positioned between the substrate and the light source so that the light from the light source selectively subjects the section of the substrate to exposure. Hence, it is possible to form a pattern having a continuous slanted structure for a large-area display panel.
Abstract:
The invention relates to an exposure apparatus including a projection optical system (13) for projecting an image of a pattern (12) on a mask (11) onto a substrate (17). The apparatus comprises illumination means (1-10) for illuminating said mask, so that two first diffracted light beams (L10, L11) which are generated from said pattern irradiated with a first illumination light (L1) and whose diffracted orders are different from each other may be substantially symmetrical with respect to the optical axis (AX) of said projection optical system, with said first illumination light being inclined relative to said optical system, and said illumination means (1-10) illuminating also said mask with second illumination light (Lr) substantially symmetrically with said first illumination light with respect to said optical axis. Furthermore the invention relates to an exposure method of exposing a substrate with an illumination beam irradiated on a mask through an illumination optical system.
Abstract:
The invention relates to an exposure apparatus including a projection optical system (13) for projecting an image of a pattern (12) on a mask (11) onto a substrate (17). The apparatus comprises illumination means (1-10) for illuminating said mask, so that two first diffracted light beams (L10, L11) which are generated from said pattern irradiated with a first illumination light (L1) and whose diffracted orders are different from each other may be substantially symmetrical with respect to the optical axis (AX) of said projection optical system, with said first illumination light being inclined relative to said optical system, and said illumination means (1-10) illuminating also said mask with second illumination light (Lr) substantially symmetrically with said first illumination light with respect to said optical axis. Furthermore the invention relates to an exposure method of exposing a substrate with an illumination beam irradiated on a mask through an illumination optical system.
Abstract:
The present invention provides a processing method which comprises the steps of subjecting a surface to be processed, to selective irradiation with light in the desired gas atmosphere to form a surface-modified layer in the desired region; and applying selective processing to said surface-modified layer or the surface-unmodified layer; wherein said surface to be processed is heated in the step of forming said surface-modified layer. Furthermore, the present invention provides a processing apparatus which comprises a reaction vessel, a gas feeding means (434) for feeding a reactive gas into said reaction vessel, and a light guiding means (437) for guiding processing light into said reaction vessel, a substrate (431) placed in said reaction vessel being irradiated with said processing light so that the surface to be processed is processed; wherein said apparatus is provided with a means (433) for selectively heating said surface to be processed.
Abstract:
In the manufacture of an array total internal reflection hologram for printing a pattern of high-quality microfeatures over a large area, a mask (13) defining just a part of the pattern is used to record an array of sub-holograms, the holographic recording medium (10) or the mask being moved with respect to each other subsequent to the recordal of each sub-hologram, thereby building up a hologram of the complete pattern to be printed.
Abstract:
In the manufacture of an array total internal reflection hologram for printing a pattern of high-quality microfeatures over a large area, a mask (13) defining just a part of the pattern is used to record an array of sub-holograms, the holographic recording medium (10) or the mask being moved with respect to each other subsequent to the recordal of each sub-hologram, thereby building up a hologram of the complete pattern to be printed.