公开(公告)号：EP2060950A4

公开(公告)日：2014-06-25

申请号：EP07792659

申请日：2007-08-17

Applicant: TOPPAN PRINTING CO LTD

Inventor： TOMONO TAKAO

IPC: G03F7/20 ,  A61M5/31 ,  A61M37/00 ,  B81C1/00

CPC classification number: B81C1/00111 ,  A61M37/00 ,  A61M37/0015 ,  A61M2037/0023 ,  A61M2037/0053 ,  B81B2201/055 ,  G03F7/201 ,  G03F7/2022 ,  Y10T428/24479

公开(公告)号：EP1801649A3

公开(公告)日：2009-07-08

申请号：EP06256367.1

申请日：2006-12-14

Applicant: ASML Netherlands B.V.

Inventor： Wuister, Sander Frederik ,  Dijksman, Johan Frederik ,  Kruijt-Stegeman, Yvonne Wendela

IPC: G03F7/00 ,  G03F7/20

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/11 ,  G03F7/201

Abstract: A lithographic apparatus is disclosed that comprises a template holder configured to hold a plurality of imprint templates, and a substrate holder configured to hold a substrate, the template holder being located beneath the substrate holder.

公开(公告)号：EP1245998A3

公开(公告)日：2007-06-13

申请号：EP02290697.8

申请日：2002-03-20

Applicant: AUTOMA-TECH

Inventor： Vibet, Gilles M. ,  Sorel, Alain M.

IPC: G03F7/20 ,  G03B27/10 ,  H05K3/00 ,  F21V7/06 ,  F21V7/08

CPC classification number: G03F7/2032 ,  G03F7/2008 ,  G03F7/201 ,  G03F7/2014 ,  H05K3/0082

Abstract: L'invention concerne un dispositif pour insoler une face (118) d'un panneau (120), en particulier pour panneau de circuit imprimé. Selon un premier aspect de l'invention, le dispositif comporte :
- des moyens pour maintenir un cliché et ledit panneau (120),
- un système optique (112) émettant un faisceau lumineux (I), des moyens de traitement (116, 151) pour générer un faisceau lumineux homogène et collimaté (III) dont l'angle d'incidence moyen par rapport à la surface à insoler (118) est inférieur à 2° et dont l'homogénéité de l'éclairement présente un écart inférieur à ± 10% par rapport à la valeur moyenne, et des moyens de mise en forme (158, 160) pour transformer ledit faisceau lumineux (III) en une bande lumineuse (126, 162),
- des moyens de déplacement (121) pour générer un mouvement entre ladite bande lumineuse (126) et ladite face (118), et
- des moyens d'adaptation de la vitesse de déplacement entre ladite bande lumineuse (126) et ladite face (118).

公开(公告)号：EP1548500A2

公开(公告)日：2005-06-29

申请号：EP04029455.5

申请日：2004-12-13

Applicant: LG Electronics Inc. ,  Korea Electronics Technology Institute

Inventor： Park, Suk-Ho ,  Choi, Young-Jun ,  Oh, Hyeon-Seok ,  Lim, Jae-Ha ,  Jung, Suk-Won

IPC: G03F7/12 ,  G03F7/24

CPC classification number: G03F7/70791 ,  G03F7/0005 ,  G03F7/201 ,  G03F7/2035 ,  G03F7/24

Abstract: A flexible substrate, which has a photosensitive agent applied thereon, is continuously supplied from a supply unit to a guide unit where light is irradiated from a light source on a section of the substrate. A mask is positioned between the substrate and the light source so that the light from the light source selectively subjects the section of the substrate to exposure. Hence, it is possible to form a pattern having a continuous slanted structure for a large-area display panel.

Abstract translation: 一种柔性基板，其具有在其上的感光剂应用，被连续地从一个供应单元供应到引导单元，其中光从光源照射在基片上的一个部分。 掩模基板和光源之间定位所以没有来自所述光源选择性地科目基板曝光的部分的光。 因此，有可能形成具有大面积的显示面板的倾斜连续结构的图案。

公开(公告)号：EP1128219A3

公开(公告)日：2003-05-14

申请号：EP99119473.9

申请日：1991-08-19

Applicant: NIKON CORPORATION

Inventor： Shiraishi, Naomasa

IPC: G03F7/20

CPC classification number: G03F9/7088 ,  G03F7/201 ,  G03F7/701 ,  G03F7/70241 ,  G03F7/7025 ,  G03F7/70308

Abstract: The invention relates to an exposure apparatus including a projection optical system (13) for projecting an image of a pattern (12) on a mask (11) onto a substrate (17). The apparatus comprises illumination means (1-10) for illuminating said mask, so that two first diffracted light beams (L10, L11) which are generated from said pattern irradiated with a first illumination light (L1) and whose diffracted orders are different from each other may be substantially symmetrical with respect to the optical axis (AX) of said projection optical system, with said first illumination light being inclined relative to said optical system, and said illumination means (1-10) illuminating also said mask with second illumination light (Lr) substantially symmetrically with said first illumination light with respect to said optical axis. Furthermore the invention relates to an exposure method of exposing a substrate with an illumination beam irradiated on a mask through an illumination optical system.

公开(公告)号：EP1128219A2

公开(公告)日：2001-08-29

申请号：EP99119473.9

申请日：1991-08-19

Applicant: NIKON CORPORATION

Inventor： Shiraishi, Naomasa

IPC: G03F7/20

CPC classification number: G03F9/7088 ,  G03F7/201 ,  G03F7/701 ,  G03F7/70241 ,  G03F7/7025 ,  G03F7/70308

Abstract: The invention relates to an exposure apparatus including a projection optical system (13) for projecting an image of a pattern (12) on a mask (11) onto a substrate (17). The apparatus comprises illumination means (1-10) for illuminating said mask, so that two first diffracted light beams (L10, L11) which are generated from said pattern irradiated with a first illumination light (L1) and whose diffracted orders are different from each other may be substantially symmetrical with respect to the optical axis (AX) of said projection optical system, with said first illumination light being inclined relative to said optical system, and said illumination means (1-10) illuminating also said mask with second illumination light (Lr) substantially symmetrically with said first illumination light with respect to said optical axis. Furthermore the invention relates to an exposure method of exposing a substrate with an illumination beam irradiated on a mask through an illumination optical system.

公开(公告)号：EP0477890B1

公开(公告)日：2001-04-25

申请号：EP91116309.5

申请日：1991-09-25

Applicant: CANON KABUSHIKI KAISHA

Inventor： Komatsu, Toshiyuki, Canon Kabushiki Kaisha ,  Sato, Yasue, Canon Kabushiki Kaisha ,  Kawate, Shin-Ichi, Canon Kabushiki Kaisha

IPC: G03F7/20 ,  H01L21/00 ,  H01L21/311 ,  H01L21/321 ,  H01L21/308

CPC classification number: H01L21/02071 ,  C23C16/047 ,  G03F1/68 ,  G03F7/00 ,  G03F7/0035 ,  G03F7/0042 ,  G03F7/2002 ,  G03F7/201 ,  G03F7/2022 ,  G03F7/2043 ,  G03F7/2053 ,  G03F7/265 ,  G03F7/36 ,  G03F7/38 ,  G03F7/7005 ,  G03F7/70841 ,  G03F7/70866 ,  G03F7/70875 ,  G03F7/70991 ,  H01L21/033 ,  H01L21/0332 ,  H01L21/0337 ,  H01L21/28556 ,  H01L21/28562 ,  H01L21/3086 ,  H01L21/31116 ,  H01L21/31144 ,  H01L21/31662 ,  H01L21/31683 ,  H01L21/32 ,  H01L21/321 ,  H01L21/32139

公开(公告)号：EP0909989A1

公开(公告)日：1999-04-21

申请号：EP98124755.4

申请日：1991-09-25

Applicant: CANON KABUSHIKI KAISHA

Inventor： Toshiyuki, Komatsu, c/o Canon K.K. ,  Yasue, Sato, c/o Canon K.K. ,  Shin-Ichi, Kawate, c/o Canon K.K.

IPC: G03F7/004 ,  C23C16/04 ,  H01L21/321

CPC classification number: H01L21/02071 ,  C23C16/047 ,  G03F1/68 ,  G03F7/00 ,  G03F7/0035 ,  G03F7/0042 ,  G03F7/2002 ,  G03F7/201 ,  G03F7/2022 ,  G03F7/2043 ,  G03F7/2053 ,  G03F7/265 ,  G03F7/36 ,  G03F7/38 ,  G03F7/7005 ,  G03F7/70841 ,  G03F7/70866 ,  G03F7/70875 ,  G03F7/70991 ,  H01L21/033 ,  H01L21/0332 ,  H01L21/0337 ,  H01L21/28556 ,  H01L21/28562 ,  H01L21/3086 ,  H01L21/31116 ,  H01L21/31144 ,  H01L21/31662 ,  H01L21/31683 ,  H01L21/32 ,  H01L21/321 ,  H01L21/32139

Abstract: The present invention provides a processing method which comprises the steps of subjecting a surface to be processed, to selective irradiation with light in the desired gas atmosphere to form a surface-modified layer in the desired region; and applying selective processing to said surface-modified layer or the surface-unmodified layer; wherein said surface to be processed is heated in the step of forming said surface-modified layer. Furthermore, the present invention provides a processing apparatus which comprises a reaction vessel, a gas feeding means (434) for feeding a reactive gas into said reaction vessel, and a light guiding means (437) for guiding processing light into said reaction vessel, a substrate (431) placed in said reaction vessel being irradiated with said processing light so that the surface to be processed is processed; wherein said apparatus is provided with a means (433) for selectively heating said surface to be processed.

Abstract translation: 本发明提供一种处理方法，其包括以下步骤：对要处理的表面进行选择性照射期望气体气氛中的光以在所需区域中形成表面改性层; 并对所述表面改性层或表面未改性层进行选择性加工; 其中所述待处理表面在形成所述表面改性层的步骤中被加热。 此外，本发明提供一种处理装置，其包括反应容器，用于将反应气体供给到所述反应容器中的气体供给装置（434）以及用于将处理光引导到所述反应容器中的光引导装置（437）， 用所述处理光照射放置在所述反应容器中的衬底（431），从而处理待处理表面; 其中所述设备设置有用于选择性地加热所述待处理表面的装置（433）。

公开(公告)号：EP0560310A3

公开(公告)日：1994-07-27

申请号：EP93103807.9

申请日：1993-03-10

Applicant: HOLTRONIC TECHNOLOGIES LTD.

Inventor： Clube, Francis Stace Murray

IPC: G03H1/26 ,  G03F7/20 ,  G03H1/00

CPC classification number: G03F7/70425 ,  G03F7/201 ,  G03F7/70475 ,  G03H1/00 ,  G03H1/26

Abstract: In the manufacture of an array total internal reflection hologram for printing a pattern of high-quality microfeatures over a large area, a mask (13) defining just a part of the pattern is used to record an array of sub-holograms, the holographic recording medium (10) or the mask being moved with respect to each other subsequent to the recordal of each sub-hologram, thereby building up a hologram of the complete pattern to be printed.

公开(公告)号：EP0560310A2

公开(公告)日：1993-09-15

申请号：EP93103807.9

申请日：1993-03-10

Applicant: HOLTRONIC TECHNOLOGIES LTD.

Inventor： Clube, Francis Stace Murray

IPC: G03H1/26 ,  G03F7/20 ,  G03H1/00

CPC classification number: G03F7/70425 ,  G03F7/201 ,  G03F7/70475 ,  G03H1/00 ,  G03H1/26

Abstract: In the manufacture of an array total internal reflection hologram for printing a pattern of high-quality microfeatures over a large area, a mask (13) defining just a part of the pattern is used to record an array of sub-holograms, the holographic recording medium (10) or the mask being moved with respect to each other subsequent to the recordal of each sub-hologram, thereby building up a hologram of the complete pattern to be printed.

Abstract translation: 在制造用于在大面积上印刷高质量微特征图案的阵列全内反射全息图时，仅使用该图案的一部分的掩模用于记录子全息图阵列，全息记录介质或 掩模在每个子全息图的记录之后相对于彼此移动，从而构成要印刷的完整图案的全息图。