Dispositif pour insoler une face d'un panneau de circuit imprimé
    113.
    发明公开
    Dispositif pour insoler une face d'un panneau de circuit imprimé 审中-公开
    装置用于暴露的电路板

    公开(公告)号:EP1245998A3

    公开(公告)日:2007-06-13

    申请号:EP02290697.8

    申请日:2002-03-20

    Applicant: AUTOMA-TECH

    Abstract: L'invention concerne un dispositif pour insoler une face (118) d'un panneau (120), en particulier pour panneau de circuit imprimé. Selon un premier aspect de l'invention, le dispositif comporte :
    - des moyens pour maintenir un cliché et ledit panneau (120),
    - un système optique (112) émettant un faisceau lumineux (I), des moyens de traitement (116, 151) pour générer un faisceau lumineux homogène et collimaté (III) dont l'angle d'incidence moyen par rapport à la surface à insoler (118) est inférieur à 2° et dont l'homogénéité de l'éclairement présente un écart inférieur à ± 10% par rapport à la valeur moyenne, et des moyens de mise en forme (158, 160) pour transformer ledit faisceau lumineux (III) en une bande lumineuse (126, 162),
    - des moyens de déplacement (121) pour générer un mouvement entre ladite bande lumineuse (126) et ladite face (118), et
    - des moyens d'adaptation de la vitesse de déplacement entre ladite bande lumineuse (126) et ladite face (118).

    Patterning apparatus and method for fabricating continuous patterns using the same
    114.
    发明公开
    Patterning apparatus and method for fabricating continuous patterns using the same 有权
    用于通过在相同的操作使用形成图案和形成图案的方法的装置

    公开(公告)号:EP1548500A2

    公开(公告)日:2005-06-29

    申请号:EP04029455.5

    申请日:2004-12-13

    CPC classification number: G03F7/70791 G03F7/0005 G03F7/201 G03F7/2035 G03F7/24

    Abstract: A flexible substrate, which has a photosensitive agent applied thereon, is continuously supplied from a supply unit to a guide unit where light is irradiated from a light source on a section of the substrate. A mask is positioned between the substrate and the light source so that the light from the light source selectively subjects the section of the substrate to exposure. Hence, it is possible to form a pattern having a continuous slanted structure for a large-area display panel.

    Abstract translation: 一种柔性基板,其具有在其上的感光剂应用,被连续地从一个供应单元供应到引导单元,其中光从光源照射在基片上的一个部分。 掩模基板和光源之间定位所以没有来自所述光源选择性地科目基板曝光的部分的光。 因此,有可能形成具有大面积的显示面板的倾斜连续结构的图案。

    Exposure method and apparatus
    115.
    发明公开
    Exposure method and apparatus 失效
    曝光方法及装置™

    公开(公告)号:EP1128219A3

    公开(公告)日:2003-05-14

    申请号:EP99119473.9

    申请日:1991-08-19

    Abstract: The invention relates to an exposure apparatus including a projection optical system (13) for projecting an image of a pattern (12) on a mask (11) onto a substrate (17). The apparatus comprises illumination means (1-10) for illuminating said mask, so that two first diffracted light beams (L10, L11) which are generated from said pattern irradiated with a first illumination light (L1) and whose diffracted orders are different from each other may be substantially symmetrical with respect to the optical axis (AX) of said projection optical system, with said first illumination light being inclined relative to said optical system, and said illumination means (1-10) illuminating also said mask with second illumination light (Lr) substantially symmetrically with said first illumination light with respect to said optical axis. Furthermore the invention relates to an exposure method of exposing a substrate with an illumination beam irradiated on a mask through an illumination optical system.

    Exposure method and apparatus
    116.
    发明公开
    Exposure method and apparatus 失效
    曝光方法及装置™

    公开(公告)号:EP1128219A2

    公开(公告)日:2001-08-29

    申请号:EP99119473.9

    申请日:1991-08-19

    Abstract: The invention relates to an exposure apparatus including a projection optical system (13) for projecting an image of a pattern (12) on a mask (11) onto a substrate (17). The apparatus comprises illumination means (1-10) for illuminating said mask, so that two first diffracted light beams (L10, L11) which are generated from said pattern irradiated with a first illumination light (L1) and whose diffracted orders are different from each other may be substantially symmetrical with respect to the optical axis (AX) of said projection optical system, with said first illumination light being inclined relative to said optical system, and said illumination means (1-10) illuminating also said mask with second illumination light (Lr) substantially symmetrically with said first illumination light with respect to said optical axis. Furthermore the invention relates to an exposure method of exposing a substrate with an illumination beam irradiated on a mask through an illumination optical system.

    Method for the manufacture of high-quality total internal reflection holograms
    120.
    发明公开
    Method for the manufacture of high-quality total internal reflection holograms 失效
    Verfahren zum Herstellen von inneren Totalreflexionshologrammen hoherQualität。

    公开(公告)号:EP0560310A2

    公开(公告)日:1993-09-15

    申请号:EP93103807.9

    申请日:1993-03-10

    CPC classification number: G03F7/70425 G03F7/201 G03F7/70475 G03H1/00 G03H1/26

    Abstract: In the manufacture of an array total internal reflection hologram for printing a pattern of high-quality microfeatures over a large area, a mask (13) defining just a part of the pattern is used to record an array of sub-holograms, the holographic recording medium (10) or the mask being moved with respect to each other subsequent to the recordal of each sub-hologram, thereby building up a hologram of the complete pattern to be printed.

    Abstract translation: 在制造用于在大面积上印刷高质量微特征图案的阵列全内反射全息图时,仅使用该图案的一部分的掩模用于记录子全息图阵列,全息记录介质或 掩模在每个子全息图的记录之后相对于彼此移动,从而构成要印刷的完整图案的全息图。

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