Abstract:
광 감지 소자의 면적을 최대로 설계할 수 있게 되어, 이미지 센서의 포화 전자 확보를 용이하게 할 수 있으며, 개구율을 향상시켜 감도가 증가된 이미지 센서가 제공된다. CIS, 리세스드 게이트, BIS(Back-size Illumination Sensor)
Abstract:
Disclosed are an image sensor and a method for manufacturing the same. An image sensor according to an embodiment of the present invention can include a photo detection device and a charge storage device. The charge storage device can further include a blocking layer and a trench for blocking light to be absorbed into the charge storage device. According to an embodiment of the present invention, the charge storage device minimizes the effect of light to stored charges and temporally stores them.
Abstract:
The present invention relates to an image sensor and a method of forming the same. According to the embodiment of the present invention, the image sensor includes a substrate including pixel regions; a photoelectric conversion part formed in the substrate; a channel stop region surrounding the photoelectric conversion part; a pixel voltage applying region; and a first device isolation region.
Abstract:
An image sensor includes a first device isolation layer which isolates a plurality of pixels, a second device isolation layer which is in contact with the inside of the first device isolation layer and defines an active area of a semiconductor substrate, a floating diffusion area and a ground area which are separated from the active area, a transmission transistor which is formed on the active area and includes a gate which is extended to an area which is recessed to inside of the semiconductor substrate, and a photoelectric conversion unit which is separated from the gate and is formed in the semiconductor substrate. The ground area is electrically connected to a ground voltage terminal.
Abstract:
An image sensor is disclosed. The image sensor includes an optical sensor formed in an epitaxial layer and trench isolations formed from the back side of the epitaxial layer toward the front side of the epitaxial layer. Each trench isolation is filled with at least one insulting material. The insulating material is a negative charge material.
Abstract:
PURPOSE: A unit pixel of an image sensor and an image sensor including the same are provided to prevent the generation of a dark current by forming a prevention gate. CONSTITUTION: A photoelectric conversion part (115) is formed in a semiconductor substrate. A transmission gate (145) transmits photocharges to a floating diffusion region. The transmission gate is formed on the first surface of the semiconductor substrate. A prevention gate (150) applies a negative voltage. The prevention gate prevents the generation of a dark current around the first surface.