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    METHOD FOR THE PRODUCTION OF OPAQUE QUARTZ GLASS, SIO2 GRANULATE SUITABLE FOR USE IN PERFORMING THE METHOD AND A COMPONENT MADE OF OPAQUE QUARTZ GLASS
    122.
    发明申请
    METHOD FOR THE PRODUCTION OF OPAQUE QUARTZ GLASS, SIO2 GRANULATE SUITABLE FOR USE IN PERFORMING THE METHOD AND A COMPONENT MADE OF OPAQUE QUARTZ GLASS 审中-公开
    用于生产不透明石英玻璃，具体实施不透明石英玻璃的方法中的SiO 2 SUITABLE颗粒状COMPONENT

    公开(公告)号：WO01046079A1

    公开(公告)日：2001-06-28

    申请号：PCT/EP2000/012687

    申请日：2000-12-14

    IPC: C03B20/00 ,  C01B33/12 ,  C03B19/00 ,  C03B19/09 ,  C03B19/10 ,  C03C1/02 ,  C03C3/06

    CPC classification number: C03C1/026 ,  C03B19/1065 ,  C03C3/06 ,  C03C2201/02 ,  C03C2201/24 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2201/80 ,  C03C2203/10 ,  C03C2203/54

    Abstract: The invention relates to a method for the production of opaque quartz glass wherein a blank is made from synthetic SiO2 crystals and heated to form a blank body made of opaque quartz glass at a given vitrification temperature. A method for the production of pure, opaque quartz glass is disclosed wherein said quartz glass has a homogeneous pore distribution and a high density, a high viscosity and a lower tendency to devitrify. According to the invention, the SiO2 crystals are formed from an at least partially porous agglomerate of SiO2 primary particles (21; 31) having a specific surface (according to BET) between 1.5 m /g and 40 m /g with a stamping density of at least 0.8 g/cm . SiO2 granulate (21; 31) suitable for use in performing the procedure is characterized in that it is composed of an at least partially porous agglomerate of SiO2 primary particles and has a specific surface (according to BET) between 1.5 m /g and 40 m /g in addition to a stamping density of at least 0.6 g/cm .

    Abstract translation: 在用于制造不透明石英玻璃公知的方法，成型是由合成的SiO 2颗粒尺寸，并加热在玻璃化温度以形成不透明石英玻璃制成的成型体的形成。 要指定此基础上，对于纯的，不透明的石英玻璃，其具有高密度，高粘度和低失透倾向的均匀的孔分布的制备方法，根据本发明中提出，以SiO 2的至少部分多孔附聚物的SiO 2颗粒一 形成的初级粒子的SiO 2颗粒（21; 31），其具有比表面积（按照BET）从1.5米<2> /克至40μm<2> /用至少0.8克/厘米<3的夯实密度克 使用>。 一种合适的用于该方法的实施的SiO 2颗粒（21; 31）的特征在于，它是由SiO 2一次粒子的至少部分多孔附聚物形成，并且其具有比表面积（按照BET）从1.5米<2 > /克至40μm<2> / g，并且具有厘米<用至少为0.6g / cc的夯实密度3>。

    PROCESS FOR PRODUCING QUARTZ GLASS
    123.
    发明申请
    PROCESS FOR PRODUCING QUARTZ GLASS 审中-公开
    生产石英玻璃的工艺

    公开(公告)号：WO1984002519A1

    公开(公告)日：1984-07-05

    申请号：PCT/JP1983000450

    申请日：1983-12-22

    Applicant: SUWA SEIKOSHA CO., LTD. ,  TOKI, Motoyuki ,  KANBE, Sadao ,  MIYASHITA, Satoru ,  TAKEUCHI, Tetsuhiko

    Inventor： SUWA SEIKOSHA CO., LTD.

    IPC: C03C01/02

    CPC classification number: C03C1/006 ,  C03B19/12 ,  C03C3/06 ,  C03C2201/02 ,  C03C2203/26 ,  C03C2203/34 ,  Y02P40/57 ,  Y10S65/901

    Abstract: A process for synthesizing poreless quartz glass at low temperatures, which comprises uniformly dispersing, in a sol solution prepared by hydrolyzing a metal alkoxide, 0.2 to 5 mol, per mol of the metal alkoxide, of superfine silica powder to gel, drying the obtained gel and sintering the dried gel. This process makes possibel the production of quartz glass of a practical size at low cost which has been believed to be impossible by the conventional sol-gel process. A larger dry gel can be obtained by adjusting the pH to 3 to 6 with a base. The yield of the dry gel can be improved by controlling the opening ratio of the lid of the sol solution-retaining vessel to 50% or less upon gelling and preparation of the dry gel, setting the gelling temperature at 5 to 60oC and the drying temperature at 20 to 120oC, and controlling the temperture-raising rate (from the gelling temperature to the drying temperature) at 120oC/hr or less. Further the yield upon sintering and the quality of the resulting quartz glass can be improved by raising the temperature upon sintering the dry gel to a predetermined temperature between 20 and 400oC at a rate of 400oC/hr or less, conducting the treatment of holding the gel at the same temperature for one hour or longer at least once to remove absorbed water, then raising the temperature to a predetermined temperature of 400 to 1100oC at a rate of 30 to 400oC/hr, conducting the treatment of holding it at the same temperature for 3 hours or longer at least once to remove carbon, then raising the temperature to a predetermined temperature between 1000 and 1400oC at a rate of 30 to 400oC/hr to remove any pores.

    AN ACTIVE OPTICAL FIBRE
    125.
    发明申请
    AN ACTIVE OPTICAL FIBRE 审中-公开
    主动光纤

    公开(公告)号：WO2016127208A1

    公开(公告)日：2016-08-18

    申请号：PCT/AU2016/050072

    申请日：2016-02-08

    Applicant: COMMONWEALTH OF AUSTRALIA represented by DEPARTMENT OF DEFENCE, DEFENCE SCIENCE AND TECHNOLOGY ORGANISATION

    Inventor： DANIEL, Jae ,  CLARKSON, Andrew, W. ,  SIMAKOV, Nikita

    IPC: G02B6/036 ,  C03C3/04 ,  C03C25/42 ,  H01S3/067 ,  H01S3/09

    CPC classification number: H01S3/0405 ,  C03C3/04 ,  C03C3/06 ,  C03C13/045 ,  C03C25/1063 ,  C03C25/42 ,  C03C2201/02 ,  C03C2201/12 ,  C03C2201/14 ,  C03C2201/3488 ,  G02B6/02395 ,  G02B6/03633 ,  G02B6/0365 ,  G02B6/03694 ,  H01S3/06716 ,  H01S3/06733 ,  H01S3/094003

    Abstract: An active optical fibre, including: a core; an inner cladding substantially surrounding the core, whereby the core and the inner cladding form an area configured to propagate pump radiation; an outer cladding comprised of at least a third material with at least a third refractive index substantially surrounding the inner cladding, the third refractive index being smaller than the second refractive index, whereby the outer cladding confines pump radiation to the core and the inner cladding; and a coating comprised of a thermally conductive material substantially surrounding the outer cladding, wherein the inner cladding is configured to reduce impact of spatial hole-burning on absorption of the pump radiation as the pump radiation propagates through the active optical fibre, and wherein the thermally conductive material of the coating supports a reduced temperature increase between the area and an outer surface of the coating.

    Abstract translation: 一种有源光纤，包括：一个核心; 内包层，其基本上围绕所述芯，由此所述芯和所述内包层形成被配置为传播泵浦辐射的区域; 外包层由至少第三材料构成，具有至少第三折射率基本上围绕所述内包层，所述第三折射率小于所述第二折射率，由此所述外包层将泵辐射限制到所述芯和所述内包层; 以及由基本上围绕所述外包层的导热材料构成的涂层，其中所述内包层被配置为当所述泵浦辐射通过所述有源光纤传播时减少空间燃烧对所述泵浦辐射的吸收的影响，并且其中所述热包 涂层的导电材料支持在涂层的面积和外表面之间降低的温度升高。

    PROCESS FOR THE PRODUCTION OF MONOLITHS BY MEANS OF THE SOL-GEL PROCESS
    128.
    发明申请
    PROCESS FOR THE PRODUCTION OF MONOLITHS BY MEANS OF THE SOL-GEL PROCESS 审中-公开
    通过溶胶凝胶法生产单体的方法

    公开(公告)号：WO2006094869A1

    公开(公告)日：2006-09-14

    申请号：PCT/EP2006/050759

    申请日：2006-02-08

    Applicant: DEGUSSA NOVARA TECHNOLOGY S.P.A. ,  COSTA, Fulvio ,  BOARA, Giulio ,  RÜCKEMANN, Andreas

    Inventor： COSTA, Fulvio ,  BOARA, Giulio ,  RÜCKEMANN, Andreas

    IPC: C03B19/12 ,  C03B20/00 ,  C03C1/00 ,  C03C3/06

    CPC classification number: C03B19/12 ,  C03B2201/03 ,  C03C1/006 ,  C03C3/06 ,  C03C2201/02 ,  C03C2203/22 ,  C03C2203/26 ,  C03C2203/52

    Abstract: Process for the production of monoliths by means of the sol-gel process, comprising the following steps: a. hydrolysis of an alkoxide in aqueous solution to form a hydrolysate and optionally evaporation to optimum concentration of the same, b. addition of an oxide prepared by the pyrogenic route, c. mixing of the hydrolysate of the alkoxide with the oxide prepared by the pyrogenic route to form a colloidal sol, d. optional removal of coarse contents from the colloidal sol, e. gelling of the colloidal sol in a mould, f. optional replacement of the water contained in the resulting aerogel by an organic solvent, g. drying of the aerogel, h. heat treatment of the dried aerogel, the coarse content being removed from the colloidal sol.

    Abstract translation: 通过溶胶 - 凝胶法生产整料的方法，包括以下步骤：a。 在水溶液中水解醇盐以形成水解产物，并任选蒸发至最佳浓度，b。 添加通过热解法制备的氧化物，c。 将醇盐的水解产物与通过热解法制备的氧化物混合以形成胶体溶胶，d。 从胶体溶胶中任选去除粗含量， 胶体溶胶在模具中凝胶化，f。 用有机溶剂任选地替代所得气凝胶中所含的水，g。 干燥气凝胶，h。 干燥的气凝胶的热处理，从胶体溶胶中除去粗含量。

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