公开(公告)号：US20110280530A1

公开(公告)日：2011-11-17

申请号：US13051708

申请日：2011-03-18

Applicant: Boris Verman ,  Licai Jiang

Inventor： Boris Verman ,  Licai Jiang

IPC: G02B6/04 ,  B82Y20/00

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G21K2201/061

Abstract: An x-ray generating system includes a source of x-ray radiation, a waveguide bundle optic for collimating the x-ray radiation produced by the source, a focusing optic for focusing the collimated x-ray radiation to a focal point.

Abstract translation: X射线产生系统包括X射线辐射源，用于准直由源产生的x射线辐射的波导束光学器件，用于将准直X射线辐射聚焦到焦点的聚焦光学器件。

公开(公告)号：US20110262699A1

公开(公告)日：2011-10-27

申请号：US13175865

申请日：2011-07-03

Applicant: Angelo Yializis ,  Gordon Goodyear ,  Steven Yializis

Inventor： Angelo Yializis ,  Gordon Goodyear ,  Steven Yializis

IPC: E04B1/94 ,  E04B1/62 ,  B32B5/18 ,  B32B3/10 ,  B32B15/04 ,  B32B27/06

CPC classification number: C23C14/022 ,  B32B5/022 ,  B32B5/024 ,  B32B5/026 ,  B32B5/18 ,  B32B15/046 ,  B32B15/08 ,  B32B15/12 ,  B32B15/14 ,  B32B27/32 ,  B32B29/002 ,  B32B2255/06 ,  B32B2255/20 ,  B32B2307/304 ,  B32B2307/3065 ,  B32B2307/416 ,  B32B2307/538 ,  B32B2307/546 ,  B32B2307/712 ,  B32B2307/714 ,  B32B2307/7145 ,  B32B2307/724 ,  B32B2307/7265 ,  B32B2307/732 ,  B82Y10/00 ,  C23C14/20 ,  C23C14/562 ,  C23C14/5826 ,  C23C14/5853 ,  G21K1/062 ,  G21K2201/061 ,  Y10T428/24331 ,  Y10T428/24851 ,  Y10T428/24975 ,  Y10T428/249976 ,  Y10T428/24998 ,  Y10T428/249987 ,  Y10T428/249991 ,  Y10T442/3398 ,  Y10T442/475 ,  Y10T442/657

Abstract: A multilayer radiant-barrier structure is formed on one or both sides of a substrate that can be attached to an insulating layer to produce a reflective insulating material. The metallized layer is protected from environmental degradation without interfering with flammability properties that are critical for radiant and reflective insulation materials used in housing applications. The metal layer is modified to insulate enclosures without blocking cellular communications and the protective functional layer in modified to minimize emissivity, create a hydrophobic and/or oleophobic surface, and/or prevent mold, fungi and bacteria growth. Solutions are provided to solve occupational-hazard problems associated with the use of these materials in enclosures that include power wires.

Abstract translation: 在衬底的一侧或两侧上形成多层辐射阻挡结构，该衬底可附接到绝缘层以产生反射绝缘材料。 金属化层被保护免受环境退化，而不会干扰对于在住房应用中使用的辐射和反射绝缘材料至关重要的可燃性。 金属层被修饰以绝缘外壳而不阻塞细胞通信，并且保护功能层被修饰以最小化发射率，产生疏水和/或疏油表面，和/或防止霉菌，真菌和细菌生长。 提供解决方案来解决与在包括电力线的外壳中使用这些材料相关的职业危害问题。

公开(公告)号：US20110188636A1

公开(公告)日：2011-08-04

申请号：US12699493

申请日：2010-02-03

Applicant: Boris Verman ,  Michael Young ,  Licai Jiang

Inventor： Boris Verman ,  Michael Young ,  Licai Jiang

IPC: H01J35/04 ,  G21K1/00 ,  H01J35/30 ,  G21K1/02

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067

Abstract: A multi-beam x-ray system includes an x-ray source which emits x-rays and a housing with a first part and a second part. The second part is moveable relative to the first part and includes a plurality of optics of different performance characteristics. Each optic, through the movement of the second part relative to the first part, is positioned to a working position so that the optic receives the x-rays from the x-ray source and directs the x-rays with the desired performance attributes to a desired location.

Abstract translation: 多光束X射线系统包括发射x射线的X射线源和具有第一部分和第二部分的壳体。 第二部分可相对于第一部分移动，并且包括具有不同性能特征的多个光学元件。 每个光学元件通过第二部分相对于第一部分的移动被定位到工作位置，使得光学器件接收来自x射线源的x射线，并将具有所需性能属性的x射线引导到 理想位置。

公开(公告)号：US07986455B2

公开(公告)日：2011-07-26

申请号：US12188603

申请日：2008-08-08

Applicant: Torsten Feigl ,  Nicolas Benoit ,  Sergiy Yulin ,  Nobert Kaiser

Inventor： Torsten Feigl ,  Nicolas Benoit ,  Sergiy Yulin ,  Nobert Kaiser

IPC: F21V9/04 ,  G02B1/10

CPC classification number: G02B5/0891 ,  B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067

Abstract: A multilayer mirror includes a layer sequence arranged on a substrate and a plurality of layer pairs. Each layer pair includes a first layer composed of a first material and a second layer composed of a second material. The first layers and the second layers each have a thickness of more than 2 nm, and the first material or the second material is a silicon boride or a molybdenum nitride.

Abstract translation: 多层反射镜包括布置在基板和多个层对上的层序列。 每个层对包括由第一材料构成的第一层和由第二材料构成的第二层。 第一层和第二层各自具有大于2nm的厚度，并且第一材料或第二材料是硅化硼或氮化钼。

公开(公告)号：USRE42338E1

公开(公告)日：2011-05-10

申请号：US11390536

申请日：2006-03-28

Applicant: Mandeep Singh ,  Hugo M. Visser

Inventor： Mandeep Singh ,  Hugo M. Visser

IPC: G03B27/42 ,  G03B27/52 ,  G03B27/54

CPC classification number: B82Y10/00 ,  G02B5/0891 ,  G03F1/24 ,  G03F7/70058 ,  G03F7/70233 ,  G03F7/70958 ,  G03F7/70983 ,  G21K1/06 ,  G21K1/062 ,  G21K2201/061 ,  Y10S359/90 ,  Y10T428/24355

Abstract: Optical elements such as multilayered EUV mirrors are provided with protective capping layers of diamond-like carbon (C), boron nitride (BN), boron carbide (B4C), silicon nitride (Si3N4), silicon carbide (SiC), B, Pd, Ru, Rh, Au, MgF2, LiF, C2F4 and TiN and compounds and alloys thereof. The final period of a multilayer coating may also be modified to provide improved protective characteristics.

Abstract translation: 诸如多层EUV反射镜的光学元件设置有类金刚石碳（C），氮化硼（BN），碳化硼（B4C），氮化硅（Si3N4），碳化硅（SiC），B，Pd， Ru，Rh，Au，MgF 2，LiF，C 2 F 4和TiN及其化合物及其合金。 也可以修改多层涂层的最后期以提供改进的保护特性。

公开(公告)号：US07914955B2

公开(公告)日：2011-03-29

申请号：US12498226

申请日：2009-07-06

Applicant: Hans-Juergen Mann ,  Martin Lowisch ,  Wolfgang Singer

Inventor： Hans-Juergen Mann ,  Martin Lowisch ,  Wolfgang Singer

IPC: G03F1/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F7/70091 ,  G03F7/70191 ,  G21K2201/061

Abstract: One problem of projection optics concerns pupil apodization which leads to imaging defects. As here proposed, the illumination system is configured to illuminate the mask inhomogeneously. As a result, inhomogeneities in reflectivity caused by the mask itself are at least partly counteracted. This compensation not only makes the apodization over the pupil become more symmetric but also makes the intensity variation smaller overall.

Abstract translation: 投影光学的一个问题涉及导致成像缺陷的瞳孔变迹。 如这里提出的，照明系统被配置为不均匀地照亮掩模。 结果，由掩模本身引起的反射率的不均匀性至少部分被抵消。 这种补偿不仅使瞳孔变得更加对称，而且使得整体的强度变化更小。

公开(公告)号：US20110024651A1

公开(公告)日：2011-02-03

申请号：US12741978

申请日：2008-11-07

Applicant: Hendrikus Gijsbertus Schimmel ,  Tjarko Adriaan Rudolf Van Empel ,  Gerardus Hubertus Petrus Maria Swinkels ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Dzmitry Labetski

Inventor： Hendrikus Gijsbertus Schimmel ,  Tjarko Adriaan Rudolf Van Empel ,  Gerardus Hubertus Petrus Maria Swinkels ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Dzmitry Labetski

IPC: H05G2/00 ,  G21K5/04 ,  G02B5/26 ,  G02B5/18

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70575 ,  G03F7/70983 ,  G21K1/10 ,  G21K2201/061 ,  H05G2/003

Abstract: A radiation system configured to generate a radiation beam, the radiation system including a chamber including: a radiation source configured to generate radiation; a radiation beam emission aperture; a radiation collector configured to collect radiation generated by the source, and to transmit the collected radiation to the radiation beam emission aperture; and a spectral purity filter configured to enhance a spectral purity of the radiation to be emitted via the aperture, wherein the spectral purity filter is configured to divide the chamber into a high pressure region and a low pressure region.

Abstract translation: 一种被配置为产生辐射束的辐射系统，所述辐射系统包括腔室，所述腔室包括：被配置为产生辐射的辐射源; 辐射束发射孔; 辐射收集器，被配置为收集由源产生的辐射，并将收集的辐射传送到辐射束发射孔; 以及光谱纯度滤光器，其被配置为增强经由所述孔发射的辐射的光谱纯度，其中所述光谱纯度滤光器被配置为将所述室分成高压区域和低压区域。

公开(公告)号：US07869138B2

公开(公告)日：2011-01-11

申请号：US11689672

申请日：2007-03-22

Applicant: Hans-Juergen Mann ,  Wolfgang Singer

Inventor： Hans-Juergen Mann ,  Wolfgang Singer

IPC: G02B17/00

CPC classification number: G02B17/0615 ,  B82Y10/00 ,  G02B13/22 ,  G02B17/0657 ,  G03F7/70233 ,  G03F7/7025 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/067

Abstract: The disclosure concerns a projection objective, which can include an object plane in which an object field is formed, an entry pupil, a mirrored entry pupil (RE) in a mirrored entry pupil plane obtained by mirroring the entry pupil (VE) at the object plane, an image plane, an optical axis, at least a first mirror and a second mirror. The projection objective can have a negative back focus of the entry pupil, and a principal ray originating from a central point of the object field and traversing the objective from the object plane to the image plane can intersect the optical axis in at least one point of intersection, wherein the geometric locations of all points of intersection lie between the image plane and the mirrored entry pupil plane.

Abstract translation: 本公开涉及一种投影物镜，其可以包括其中形成物场的物平面，入射光瞳，通过在物体上镜像入射光瞳（VE）获得的镜像入射光瞳平面中的镜像入射光瞳（RE） 平面，图像平面，光轴，至少第一反射镜和第二反射镜。 投影物镜可以具有入射光瞳的负的后焦点，并且源自物场的中心点并且从物体平面向图像平面穿过物镜的主射线可以在光轴的至少一点 交叉点，其中所有交点交点的几何位置位于图像平面和镜像入射光瞳平面之间。

公开(公告)号：US20090279670A1

公开(公告)日：2009-11-12

申请号：US12421907

申请日：2009-04-10

Applicant: Boris Verman ,  Licai Jiang

Inventor： Boris Verman ,  Licai Jiang

IPC: G21K1/00

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G21K2201/061

Abstract: An x-ray generating system includes a source of x-ray radiation, a waveguide bundle optic for collimating the x-ray radiation produced by the source, a focusing optic for focusing the collimated x-ray radiation to a focal point.

Abstract translation: X射线产生系统包括X射线辐射源，用于准直由源产生的x射线辐射的波导束光学器件，用于将准直X射线辐射聚焦到焦点的聚焦光学器件。

公开(公告)号：US20090231707A1

公开(公告)日：2009-09-17

申请号：US12403233

申请日：2009-03-12

Applicant: Dirk Heinrich EHM ,  Stephan MUELLENDER ,  Thomas STEIN ,  Johannes Hubertus Josephina MOORS ,  Bastiaan Theodoor WOLSCHRIJN ,  Dieter KRAUS ,  Richard VERSLUIS ,  Marcus Gerhardus Hendrikus MEIJERINK

Inventor： Dirk Heinrich EHM ,  Stephan MUELLENDER ,  Thomas STEIN ,  Johannes Hubertus Josephina MOORS ,  Bastiaan Theodoor WOLSCHRIJN ,  Dieter KRAUS ,  Richard VERSLUIS ,  Marcus Gerhardus Hendrikus MEIJERINK

IPC: B60R1/06

CPC classification number: G03B27/16 ,  B82Y10/00 ,  G03F7/70841 ,  G03F7/70883 ,  G03F7/70916 ,  G21K2201/061

Abstract: An optical arrangement, in particular a projection exposure apparatus (1) for EUV lithography, includes: a housing (2) that encloses an interior space (15); at least one, in particular reflective, optical element (4 to 10, 12, 14.1 to 14.6) that is arranged in the housing (2); at least one vacuum generating unit (3) for generating a vacuum in the interior space (15) of the housing (2); and at least one vacuum housing (18, 18.1 to 18.10) that is arranged in the interior space (15) of the housing (2) and that encloses at least the optical surface (17, 17.1, 17.2) of the optical element (4 to 10, 12, 14.1 to 14.5), wherein a contamination reduction unit is associated with the vacuum housing (18.1 to 18.10), which contamination reduction unit reduces the partial pressure of contaminating substances, in particular of water and/or hydrocarbons, at least in close proximity to the optical surface (17, 17.1, 17.2) in relation to the partial pressure of the contaminating substances in the interior space (15).

Abstract translation: 光学装置，特别是用于EUV光刻的投影曝光装置（1）包括：封闭内部空间（15）的壳体（2）; 布置在壳体（2）中的至少一个特别是反射的光学元件（4至10,12,14.1至14.6）; 至少一个用于在所述壳体（2）的内部空间（15）中产生真空的真空发生单元（3）; 以及布置在所述壳体（2）的内部空间（15）中并且至少包围所述光学元件（4）的光学表面（17,17.1,17.2）的至少一个真空壳体（18,18.1至18.10） 至10,12,14.1至14.5），其中污染减少单元与真空壳体（18.1至18.10）相关联，该污染减少单元至少降低污染物质，特别是水和/或烃的分压 相对于内部空间（15）中的污染物质的分压紧邻光学表面（17,17.1,17.2）。