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    POLYMER MICROFILTERS AND METHODS OF MANUFACTURING THE SAME
    132.
    发明公开
    POLYMER MICROFILTERS AND METHODS OF MANUFACTURING THE SAME 审中-公开
    聚合物MIKROFILTER及其制造方法

    公开(公告)号：EP2566598A1

    公开(公告)日：2013-03-13

    申请号：EP11777762.3

    申请日：2011-04-01

    Applicant: Creatv Microtech, Inc.

    Inventor： MAKAROVA, Olga V. ,  TANG, Cha-Mei ,  AMSTUTZ, Platte T

    IPC: B01D39/00

    Abstract: A microfilter comprising a polymer layer formed from epoxy-based photo-definable dry film, and a plurality of apertures each extending through the polymer layer. A method of forming a microfilter is also disclosed. The method includes providing a first layer of epoxy-based photo-definable dry film disposed on a substrate, exposing the first layer to energy through a mask to form a pattern, defined by the mask, in the first layer of dry film, forming, from the exposed first layer of dry film, a polymer layer having a plurality of apertures extending therethrough, the plurality of apertures having a distribution defined by the pattern, and removing the polymer layer from the substrate.

    tNTI-SCATTER GRIDS AND COLLIMATOR DESIGNS, AND THEIR MOTION, FABRICATION AND ASSEMBLY
    137.
    发明公开
    tNTI-SCATTER GRIDS AND COLLIMATOR DESIGNS, AND THEIR MOTION, FABRICATION AND ASSEMBLY 审中-公开
    “TNTI杂散和格栅KOLLIMATORENTWÜRFE和你的举动，生产和组成”

    公开(公告)号：EP1364374A1

    公开(公告)日：2003-11-26

    申请号：EP02707629.8

    申请日：2002-02-01

    Applicant: Creatv Microtech, Inc.

    Inventor： TANG, Cha-Mei ,  MAKAROVA, Olga

    IPC: G21K1/00

    CPC classification number: G21K1/025

    Abstract: Grids (30) and collimators, for use with electromagnetic energy emitting devices (61), include at least a metal layer that is formed, for example, by electroplating/electroforming or casting. The metal layer includes top and bottom surfaces, and a plurality of solid integrated walls (32). Each of the solid integrated walls extends from the top to bottom surface and has a plurality of side surfaces. The side surfaces of the solid integrated walls are arranged to define a plurality of openings (31) extending entirely through the layer. At least some of the walls (32) also can include projections extending into the respective openings formed by the walls (32). The projections can be of various shapes and sizes, and are arranged so that a total amount of wall material intersected by a line propagating in a direction along an edge of the grid (30) is substantially the same as another total amount of wall material intersected by another line propagating in another direction substantially parallel to the edge of the grid (30) at any distance from the edge. Methods to fabricate these grids (30) using copper, lead, nickel, gold, any other electroplating/electroforming materials or low melting temperature metals are described.

    TWO-DIMENSIONAL, ANTI-SCATTER GRID AND COLLIMATOR DESIGNS, AND ITS MOTION, FABRICATION AND ASSEMBLY
    138.
    发明公开
    TWO-DIMENSIONAL, ANTI-SCATTER GRID AND COLLIMATOR DESIGNS, AND ITS MOTION, FABRICATION AND ASSEMBLY 审中-公开
    二维防散射格栅kollimatorentwürfe-and，和他们的运动，制造和安装。

    公开(公告)号：EP1249023A1

    公开(公告)日：2002-10-16

    申请号：EP00984257.6

    申请日：2000-12-13

    Applicant: Creatv Microtech, Inc.

    Inventor： TANG, Cha-Mei

    IPC: G21K1/00

    CPC classification number: G21K1/025

    Abstract: A grid (30), for use with electromagnetic energy emitting devices, includes at least metal layer, which is formed, for example, by electroplating. The metal layer includes top and bottom surfaces, and a plurality of solid integrated walls (32). Each of the solid integrated walls extends from the top to bottom surface and having a plurality of side surfaces. The side surfaces of the solid integrated walls (32), are arranged to define a plurality of openings extending entirely through the layer. At least some of the walls also can include projections extending into the respective openings formed by the walls. The projections can be of various shapes and sizes, and are arranged so that a total amount of wall material intersected by a line propagating in a direction along an edge of the grid is substantially the same as another total amount of wall material intersected by another line propagating in another direction substantially parallel to the edge of the grid at any distance from the edge.

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