公开(公告)号：JP2003151886A

公开(公告)日：2003-05-23

申请号：JP2001349991

申请日：2001-11-15

Applicant: SONY CORP

Inventor： OKAWACHI HIROKI ,  HATTORI TADASHI ,  FUJITA HIRONORI ,  ABE TETSUO ,  AKI YUICHI ,  TAKEDA MINORU

IPC: H01L21/66 ,  H01J37/20 ,  H01J37/28 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To miniaturize an inspection apparatus and to a shorten inspection/ measurement time in an inspection/measurement process of a semiconductor wafer. SOLUTION: The inspection apparatus has an SEM inspection unit 6, an optical inspection unit 5, and an appearance inspection unit 7. A local vacuum means 8 is provided in the SEM inspection unit, and at the same time, one X-Y stage (wafer conveyance means) 3 that is arranged opposite to each inspection unit is provided, and a semiconductor wafer 2 is conveyed among the inspection units by the X-Y stage (wafer conveyance means).

公开(公告)号：JP2002342987A

公开(公告)日：2002-11-29

申请号：JP2001143792

申请日：2001-05-14

Applicant: SONY CORP

Inventor： TAKEDA MINORU

IPC: G11B7/26

Abstract: PROBLEM TO BE SOLVED: To provide a method of manufacturing an optical recording medium which is capable of making groove patterns or information bit patterns fine and more particularly making the width of the grooves or information bits narrower and a method of manufacturing a master disk and stamper to be used for the same. SOLUTION: Resist films are formed according to the patterns of the guide grooves segmenting track regions or the patterns of the bits and rugged shapes are formed on a master disk substrate 10. Next, the side walls of the recessed parts 10a of the rugged shapes are formed with side walls 12a to narrow the width of the recessed parts, there by, the master disk is formed. The stamper 13 consisting of nickel, etc., transferred with the rugged shapes of the resultant master disk substrate 10 is formed. The medium substrate transferred with the rugged shapes of the resultant stamper is formed and an optical recording film and protective film are formed on the medium substrate.

公开(公告)号：JP2002342986A

公开(公告)日：2002-11-29

申请号：JP2001143711

申请日：2001-05-14

Applicant: SONY CORP

Inventor： TAKEDA MINORU

IPC: G11B11/105 ,  G11B7/26

Abstract: PROBLEM TO BE SOLVED: To provide a method for manufacturing an optical recording medium by which an information pit pattern or a groove pattern can be made fine and to provide a method for manufacturing a master disk and a stamper used therefor. SOLUTION: A resist master disk RD is exposed using enlarging masks MK along a rugged pattern by an electron beam(EB) plotting method in which lump-sum exposure is performed for each predetermined area while reducing the pattern of the enlarging masks. A resist film is developed to obtain the resist master disk in which the resist patterns are formed. The stamper consisting of nickel on which the rugged shape of the obtained resist master disk is transferred is formed. A medium substrate on which the rugged shape of the obtained stamper is transferred is formed, and then an optical recording film and a protective film are formed on the medium substrate.

公开(公告)号：JP2002150623A

公开(公告)日：2002-05-24

申请号：JP2000339482

申请日：2000-11-07

Applicant: SONY CORP

Inventor： SEGAWA YUJI ,  TAKEDA MINORU ,  TOYOKAWA MITSURU ,  IMANISHI SHINGO

IPC: B29C33/38 ,  C25D1/00 ,  G11B7/26

Abstract: PROBLEM TO BE SOLVED: To obtain a method for manufacturing a stamper for optical disk, which suppresses surface wobbling (focus error) of a disk after forming as much as possible and manufactures the disk at a low cost. SOLUTION: In this method for manufacturing a stamper for optical disk, a protection tape P is stuck to a signal recording face of a stamper 10A for optical disk to be ground, and the rear face of this stamper 10A is ground to obtain the stamper for optical disk.

公开(公告)号：JP2001056300A

公开(公告)日：2001-02-27

申请号：JP23102399

申请日：1999-08-18

Applicant: SONY CORP

Inventor： TAKEDA MINORU ,  IMANISHI SHINGO ,  RODERIC KEERE

IPC: G11B7/004 ,  G01N21/95 ,  G11B7/09 ,  G11B7/125 ,  G11B7/26

Abstract: PROBLEM TO BE SOLVED: To detect defects of specific size without omission in an area used for exposure by irradiating an evaluation object disc master with evaluation laser beams of specific wavelength through an objective lens with specific numerical aperture, receiving the return light by a specified light receiving element, and processing the detected result. SOLUTION: In this disc master evaluating device 50, an air spindle 51 is moved in the radial direction of a disc master 2 or a glass master by a radially moving mechanism 52 in the state of the disc master 2 or glass master being rotatory-driven at the high speed rotating peed of 450 rpm for instance by the air spindle 51. Further in this state, evaluation laser beams L2 of 480-680 nm in wavelength are applied to irradiate the disc master 2 or glass master through an objective lens 53 of 0.8 or more in numerical aperture, and the return light is received by a light receiving element 71. The disc master evaluating device 50 processes the light receiving result S1 of the light receiving element 71 to detect a defect of about 100 nm of the disc master 2 or glass master.

公开(公告)号：JPH11238256A

公开(公告)日：1999-08-31

申请号：JP4045698

申请日：1998-02-23

Applicant: SONY CORP

Inventor： TAKEDA MINORU

IPC: G11B7/24 ,  G11B7/26

Abstract: PROBLEM TO BE SOLVED: To reduce the size of an optical disk while maintaining the recording capacity of the disk by making the outer diameter of the disk and the track pitch to be specific dimensions and forming a fine ruggedness pattern in a finer manner on at least one main surface of the disk substrate. SOLUTION: The pattern formed on a pattern mask plate 20 is reduced to a 1/4 size, for example, and reduction-projection exposed on a photoresist 31 of a substrate material 30. Then, 0.1 to 0.5 μm track pitches are formed on the material 30. Then, employing a similar method, fine reggedness having a 0.03 to 0.3 μm depth is formed. Then, a reflection film, a dielectric protection layer, a phase transition film and a dielectric protection layer are successively laminated in that order to form an information recording layer. Then, recording media having a 20 to 40 mm disk diameter are cut from the material 30. If the track pitch is set to 0.4 μm and the shortest pit length in the fine ruggendess is made to 0.2 μm, for example, the surface density becomes approximately 3.7 times, the areal ratio becomes 1/16 and the recording density is made to approximately 1 GB.

公开(公告)号：JPH1139728A

公开(公告)日：1999-02-12

申请号：JP18670697

申请日：1997-07-11

Applicant: SONY CORP

Inventor： YAMATSU HISAYUKI ,  TAKEDA MINORU ,  FURUKI MOTOHIRO

IPC: G11B7/125 ,  G03F7/20 ,  G11B7/26 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To suppress the dispersion of resist sensitivity, etc., based on the time difference between exposure and heat treatment and to improve productivity by executing exposure recording at a large power density by using an objective lens which is large in numerical aperture and simultaneously executing an exposure stage and a heat treatment stage. SOLUTION: The laser beam emitted from a light source laser 1 is modulated by the signal supplied from a signal generator 4 in an optical modulator 5 and the photoresist film 8 of an optical master disk 9 is irradiated with the objective lens 7. A fully solid-state laser consisting of a nonlinear optical crystal is used as the light source laser 1 and the laser beam of 300 nm wavelength is emitted. If the numerical aperture of the objective lens 7 is specified to >=0.85, the spot diameter condensed onto the photoresist film 8 is about 4×10 cm. When the film is exposed at a linear speed of about 10 to 10 cm/s, power density of optical beams of >=1.0×10 W/cm is obtd. The temp. of the exposed parts of the photoresist film 8 is raised to >=60 deg.C.

公开(公告)号：JPH09115192A

公开(公告)日：1997-05-02

申请号：JP26725195

申请日：1995-10-16

Applicant: SONY CORP

Inventor： YAMAZAKI TAKESHI ,  FURUKI MOTOHIRO ,  TAKEDA MINORU

IPC: G11B7/26 ,  G11B7/24

Abstract: PROBLEM TO BE SOLVED: To make it possible to effectively lessen the deformation of a substrate and to obtain an optical recording medium having excellent optical characteristics even in the formation of a multilayered optical recording medium having a thick photosetting resin layer between information recording layers. SOLUTION: A photosetting resin film 30 is superposed on the surface on the side having the first information recording layer of the substrate 1 having the first information recording layer and is press-bonded by a roller under heating to laminate the film thereon, in the production of the multilayered optical recording medium having at least the laminated first and second information recording layers. At this time, the substrate 1 is forcibly curved in the direction of compensating (correcting) the deformation generated in the substrate, i.e., so as to obtain the counter balance with the deformation in the stage of exposing and curing the photosetting resin film 30 and thereafter, the film is subjected to an exposure treatment.

公开(公告)号：JPH0871774A

公开(公告)日：1996-03-19

申请号：JP21085694

申请日：1994-09-05

Applicant: SONY CORP

Inventor： TAKEDA MINORU

IPC: G02C7/04 ,  B23K26/00 ,  B23K26/08

Abstract: PURPOSE: To reduce time and cost of newly designing and manufacturing a contact lens. CONSTITUTION: A UV laser beam from a UV laser beam source is reflected by a reflecting mirror 2 and then converged by a condensing lens 3, irradiating the surface of a contact lens 4 loaded on a lens fixing table 5 on an XY stage 6 that is twodimensionally moved and controlled by an XY stage controller 7. Thus, the refractive index of a currently used contact lens can be compensated.

公开(公告)号：JPH07142384A

公开(公告)日：1995-06-02

申请号：JP32932493

申请日：1993-12-27

Applicant: SONY CORP

Inventor： TAKEDA MINORU

IPC: G03F7/20 ,  H01L21/027

Abstract: PURPOSE:To satisfy fining of processing dimension, to improve use efficiency of a light amount of an exposure light source and to realize easiness of exposure amount control and compactness of a device. CONSTITUTION:Fourth harmonic wave of basic wave of a laser medium is projected by continuous oscillation by an ultraviolet laser beam projection part 10, a light amount of projection light is controlled by a shutter 11 according to monitor result by an integrating light amount detection part 12 which monitors an integrating light amount of the projection light and a reticle 14 is irradiated with light wherein lowering of coherence and light strength distribution are made uniform by a coherence removal device 13A and a fly's eye lens 13B, respectively. A pattern of the reticle 14 is transcribed to resist applied onto a wafer 16 by performing exposure and irradiation for the exposure light source through a reduction projection lens 15.