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    MOULDED BODY MADE OF QUARTZ GLASS AND PROCESS FOR THE MANUFACTURE THEREOF
    131.
    发明申请
    MOULDED BODY MADE OF QUARTZ GLASS AND PROCESS FOR THE MANUFACTURE THEREOF 审中-公开
    状体由石英玻璃及其制造方法成型体由石英玻璃

    公开(公告)号：WO1995013248A1

    公开(公告)日：1995-05-18

    申请号：PCT/EP1994003722

    申请日：1994-11-10

    Applicant: HERAEUS QUARZGLAS GMBH ,  ENGLISCH, Wolfgang ,  MORITZ, Stephan ,  HELLMANN, Dietmar

    Inventor： HERAEUS QUARZGLAS GMBH

    IPC: C03B19/06

    CPC classification number: C03C17/02 ,  B22C9/12 ,  C03B19/06 ,  C03B19/066 ,  C03B20/00 ,  C03B2201/23 ,  C03C3/06 ,  C03C11/00 ,  C03C2201/02 ,  C03C2201/80 ,  C03C2203/52 ,  C30B35/002 ,  G01J1/429 ,  Y10T428/131 ,  Y10T428/1317

    Abstract: Moulded bodies made of quartz glass with at least one surface region of tranparent quartz glass, whose free surfaces are smooth and which have a superficial microroughness of less than 8 mu m, are already known. To facilitate production of such a body having a simple structure, cost-effectively and without the need for the stocking or separate production of auxiliary components, it will consist of a core body, the base material of which is at least 99.9 % chemically pure and has a cristobalite content of no more than 1 %; is impermeable to gases, opaque, and porous, has a virtually constant direct spectral transmission in the wavelength range lambda = 190 nm - lambda = 2.650 nm of below 10 % for 1 mm of thickness, and has a density of at least 2.15 g/cm . The transparent surface region is formed from the base material which is heat treated at a temperature in excess of 1.650 DEG C, is at least 0.5 mm thick and has a direct spectral transmission of at least 60 % in the wavelength range lambda = 600 nm - lambda = 2.650 nm for 1 mm of thickness. The invention also relates to process for manufacturing a moulded body of this type from quartz glass.

    Abstract translation: 有由石英玻璃制成的模制品，其具有由透明的石英玻璃的至少一个表面部分，所述自由表面是平滑的并具有小于8微米一个Oberflächenmikrorauhigkeit，是已知的。 为了提供这种类型的，其具有简单的结构和它的生产是便宜的，并且避免了存储或独立的生产附加部件的成型体，它包括一个基体，其基体材料具有至少99.9％的化学纯度和至多一个方石英含量的 1％已，是不透气的和不透明的，包含孔，其特征在于，壁厚为1mm，在10％以下几乎恒定躺在的波长范围内的λ= 190nm至拉姆达的直接光谱透射=具有2650纳米，至少2.15的密度 克/厘米<3>，和所述透明表面部分的波长范围内的λ的热处理在高于1650℃的基底材料的温度时，它的厚度为至少0.5毫米，它的直接光谱透射在1mm的层厚度形成 = 600nm至2650纳米的λ=具有至少60％的值。 此外，本发明涉及一种用于制造石英玻璃这样的模塑制品的方法。

    METHOD FOR PRODUCING SYNTHETIC QUARTZ GLASS OF SIO2 GRANULATE AND SIO2 GRANULATE SUITED THEREFOR
    138.
    发明申请
    METHOD FOR PRODUCING SYNTHETIC QUARTZ GLASS OF SIO2 GRANULATE AND SIO2 GRANULATE SUITED THEREFOR 审中-公开
    生产SIO2颗粒和SIO2颗粒的合成石英玻璃的方法

    公开(公告)号：US20160090319A1

    公开(公告)日：2016-03-31

    申请号：US14864103

    申请日：2015-09-24

    Applicant: Heraeus Quarzglas GmbH & Co. KG

    Inventor： Achim HOFMANN ,  Thomas KAYSER ,  Matthias OTTER ,  Bodo KÜHN

    IPC: C03B19/06 ,  C03C3/06

    CPC classification number: C03B19/066 ,  C03B19/108 ,  C03B19/1095 ,  C03B2201/02 ,  C03C3/06 ,  C03C11/00 ,  C03C12/00 ,  C03C2201/02

    Abstract: A method for producing synthetic quartz glass by fusion of SiO2 granulate involves synthesizing amorphous SiO2 primary particles, granulating the amorphous SiO2 primary particles to form an open-pore SiO2 granulate, sintering the open-pore SiO2 granulate by heating in a sintering atmosphere at a sintering temperature and for a sintering period to form a densified SiO2 granulate, and melting the densified SiO2 granulate at a melting temperature to form the synthetic quartz glass. To provide an inexpensive production of low-bubble transparent components of quartz glass despite the use of still open-pore SiO2 granulate, the sintering atmosphere, sintering temperature and sintering duration are adjusted such that the densified SiO2 granulate still comprises open pores but manifests a material-specific infrared transmission T1700 at a wavelength of 1700 nm. This transmission is in the range of 50-95% of the infrared transmission T1700 of quartz glass granules of the same material.

    Abstract translation: 通过SiO 2颗粒熔融制造合成石英玻璃的方法包括合成无定形SiO 2一次颗粒，造粒无定形SiO 2一次颗粒以形成开孔SiO 2颗粒，通过在烧结气氛中加热烧结开孔SiO 2颗粒 温度和烧结时间以形成致密化的SiO 2颗粒，并且在熔融温度下熔化致密的SiO 2颗粒以形成合成石英玻璃。 尽管使用仍然是开孔的SiO 2颗粒，为了提供石英玻璃的低气泡透明组分的廉价生产，调节烧结气氛，烧结温度和烧结持续时间，使得致密的SiO 2颗粒仍然包括开孔，但表现出一种材料 特定的红外透射T1700，波长为1700nm。 该透射率在相同材料的石英玻璃颗粒的红外透射率T1700的50-95％的范围内。

    Synthetic amorphous silica powder and method for producing same
    139.
    发明授权
    Synthetic amorphous silica powder and method for producing same 有权
    合成无定形二氧化硅粉末及其制造方法

    公开(公告)号：US09272918B2

    公开(公告)日：2016-03-01

    申请号：US13520798

    申请日：2010-12-24

    Applicant: Toshiaki Ueda

    Inventor： Toshiaki Ueda

    IPC: C01B33/12 ,  C01B33/18 ,  C01B33/14 ,  C03C3/06 ,  C03B19/10

    CPC classification number: C01B33/181 ,  C01B33/14 ,  C01P2002/02 ,  C01P2002/82 ,  C01P2004/03 ,  C01P2004/54 ,  C01P2004/61 ,  C01P2006/12 ,  C03B19/1025 ,  C03B19/1065 ,  C03C3/06 ,  C03C2201/02 ,  C03C2203/10 ,  C03C2203/27 ,  Y10T428/2982

    Abstract: The synthetic amorphous silica powder of the present invention is characterized in that it comprises a synthetic amorphous silica powder obtained by applying a spheroidizing treatment to a silica powder, and by subsequently cleaning and drying it so that the synthetic amorphous silica powder has an average particle diameter D50 of 10 to 2,000 μm; wherein the synthetic amorphous silica powder has: a quotient of 1.00 to 1.35 obtained by dividing a BET specific surface area of the powder by a theoretical specific surface area calculated from the average particle diameter D50; a real density of 2.10 to 2.20 g/cm3; an intra-particulate porosity of 0 to 0.05; a circularity of 0.75 to 1.00; and a spheroidization ratio of 0.55 to 1.00.

    Abstract translation: 本发明的合成无定形二氧化硅粉末的特征在于，其包含通过对二氧化硅粉末进行球化处理得到的合成无定形二氧化硅粉末，然后进行清洗和干燥，使得合成的无定形二氧化硅粉末的平均粒径 D50为10〜2000μm; 其中所述合成无定形二氧化硅粉末具有：通过将粉末的BET比表面积除以由平均粒径D50计算的理论比表面积获得的商为1.00至1.35的商; 实际密度为2.10〜2.20g / cm3; 颗粒内孔隙率为0至0.05; 0.75〜1.00的圆形度; 球化率为0.55〜1.00。

    Surface Nitrided Alkali-Free Glasses
    140.
    发明申请
    Surface Nitrided Alkali-Free Glasses 有权
    表面无氮化玻璃

    公开(公告)号：US20150329408A1

    公开(公告)日：2015-11-19

    申请号：US14710130

    申请日：2015-05-12

    Applicant: CORNING INCORPORATED

    Inventor： Andrea Weiss Bookbinder ,  Dana Craig Bookbinder ,  Timothy Michael Gross ,  Pushkar Tandon

    IPC: C03C3/091 ,  C03C21/00 ,  C03C3/06

    CPC classification number: C03C3/045 ,  C03C3/06 ,  C03C3/091 ,  C03C3/111 ,  C03C21/007 ,  C03C23/007 ,  C03C2201/02 ,  C03C2201/24 ,  Y10T428/315

    Abstract: Alkali-free glasses are disclosed having (in weight %) 50≦SiO2≦80%, 2≦Al2O3≦17%, 8≦B2O3≦36%, and greater than or equal to 2% and less than or equal to 25% of at least one of CaO, MgO, BaO, SrO or ZnO. The alkali-free glasses can have a surface layer with greater than 0.2 weight % N. Such alkali-free glasses are achieved by nitriding processes and exhibit increased strength, scratch resistance and chemical durability.

    Abstract translation: 公开了无碱玻璃，其重量百分比为50％，SiO 2和N 100; 80％，2％，Al 2 O 3和N 2; 17％，8％和10％; B 2 O 3和N 3; 36％，并且大于或等于2％且小于或等于 CaO，MgO，BaO，SrO或ZnO中的至少一种。 无碱玻璃可以具有大于0.2重量％N的表面层。这种无碱玻璃通过渗氮工艺实现，并且显示出增加的强度，耐划伤性和化学耐久性。

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