Abstract:
A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C. A process for producing a silica glass containing TiO2, which comprises a step of forming a porous glass body on a target quartz glass particles obtained by flame hydrolysis of glass-forming materials, a step of obtaining a fluorine-containing porous glass body, a step of obtaining a fluorine-containing vitrified glass body, a step of obtaining a fluorine-containing formed glass body and a step of carrying out annealing treatment.
Abstract:
A low expansion silica-titania glass suitable for making extreme ultraviolet lithographic element, with the titania-containing silica glass having a titania content in the range of 5-10 wt. % and a including a further constituent of a viscosity reducing dopant having a content in the range of 0.001 to 1 wt %.
Abstract:
Disclosed are process and apparatus for making high purity fused silica glass materials. The process involves depositing soot particles onto an essentially planar deposition supporting surface and modulation of motion of the soot-generating device relative to the deposition supporting surface to result in a low local soot density variation. The apparatus is designed to implement the planar deposition process. The invention makes it possible to produce fused silica glass without the use of potentially contaminating refractory bricks.
Abstract:
The present invention provides doped titania-doped silica glass articles having low thermal expansions and low variations in thermal expansion. According to one embodiment of the invention, a titania-doped silica glass article has a titania content of between about 5 wt % and about 9 wt %; a coefficient of thermal expansion of between about −30 ppb/° C. and about +30 ppb/° C. at a temperature between 15° C. and 30° C.; and a variation in coefficient of thermal expansion of less than about 5 ppb/° C. at a temperature between 15° C. and 30° C.
Abstract:
The invention relates to an electric lamp provided with a light source in a light-transmitting lamp vessel which is closed in a vacuumtight manner, which light source has an envelope of light-transmitting, UV-absorbing quartz glass which comprises silicon oxide, aluminum oxide and cerium oxide, characterized in that the quartz glass of the envelope comprises the aluminum oxide and cerium oxide in a molar ratio of between 0.30 and 0.48. The invention further relates to the quartz glass which is used for said lamp.
Abstract:
The invention is directed to ultra-low expansion glasses to which adjustments have been made to selected variables in order to improve the properties of the glasses, and particularly to lower the expansivity of the glasses. The glasses are titania-doped silica glasses. The variables being adjusted include an adjustment in β-OH level; an adjustment to the cooling rate of the molten glass material through the setting point; and the addition of selected dopants to impact the CTE behavior.
Abstract:
Titania-containing silica glass bodies and extreme ultraviolet elements having low levels of striae are disclosed. Methods and apparatus for manufacturing and measuring striae in glass elements and extreme ultraviolet elements are also disclosed.
Abstract:
An electrodeless lamp and process for emitting ultraviolet and/or vacuum ultraviolet radiation comprises an envelope formed of an ultra-pure and/or low-defect quartz material and an ultraviolet and/or vacuum ultraviolet emissive material disposed in the interior region of the envelope. The electrodeless lamp formed of the ultra-pure and/or low-defect quartz material minimizes degradation during use.
Abstract:
The invention discloses an SiO2—TiO2 glass, which is preferably made by flame-hydrolysis and which distinguishes itself by increased resistance to radiation, especially in connection with EUV lithography. By purposefully reducing the hydrogen content, clearly improved resistance to radiation and reduced shrinking is achieved.
Abstract:
The invention relates to a silica yarn and to woven or nonwoven fabrics produced from said yarn, which comprises 30 to 1500 ppm by weight of aluminum and 10 to 200 ppm by weight of titanium in oxidized form, the sum of the mass of the chemical elements different from Si and O being less than 5000 ppm by weight, the following elements being absent or present in a very small quantity: boron, sodium, calcium, potassium and lithium. The fabrics comprising this silica yarn have an excellent high-temperature withstand and thus retain their flexibility for a long time at above 600° C. They are useful especially in uses requiring good high-temperature flexibility, such as for furnace seals.