公开(公告)号：US08198613B2

公开(公告)日：2012-06-12

申请号：US12469140

申请日：2009-05-20

Applicant: Masato Moriya ,  Osamu Wakabayashi ,  Georg Soumagne

Inventor： Masato Moriya ,  Osamu Wakabayashi ,  Georg Soumagne

IPC: G21K5/04 ,  G21K1/06

CPC classification number: G02B5/1838 ,  G02B5/0891 ,  G02B5/1857 ,  G03F7/70575 ,  G21K1/065 ,  G21K2201/064

Abstract: The EUV light source device eliminates radiation other than EUV radiation from the light which it emits, and supplies only the EUV radiation to an exposure device. A composite layer consisting of a plurality of Mo/Si pair layers is provided upon the front surface of an EUV collector mirror, and blazed grooves are formed in this composite layer. Radiation emitted from a plasma is incident upon this EUV collector mirror, and is reflected or diffracted. The reflected EUV radiation (including diffracted EUV) proceeds towards an intermediate focal point IF. The radiation of other wavelengths proceeds towards some position other than this focal point IF, because its reflection angle or diffraction angle is different. A SPF shield having an aperture portion is provided at the focal point IF. Accordingly, only the EUV radiation passes through the aperture portion and is supplied to the exposure device, while the other radiation is intercepted by the shield.

Abstract translation: EUV光源装置除去其发射的光之外的EUV辐射以外的辐射，并且仅将EUV辐射提供给曝光装置。 在EUV收集镜的前表面上设置由多个Mo / Si对层构成的复合层，在该复合层中形成闪耀槽。 从等离子体发射的辐射入射到该EUV收集镜上，并被反射或衍射。 反射的EUV辐射（包括衍射的EUV）进行到中间焦点IF。 由于其反射角或衍射角不同，其他波长的辐射进入除了该焦点IF之外的某个位置。 具有开口部分的SPF屏蔽设置在焦点IF处。 因此，只有EUV辐射通过开口部分并被提供给曝光装置，而另一辐射被屏蔽件遮挡。

公开(公告)号：US20120063569A1

公开(公告)日：2012-03-15

申请号：US13227517

申请日：2011-09-08

Applicant: Edwin G. Haas ,  Christopher Stelmach ,  Zhong Zhong

Inventor： Edwin G. Haas ,  Christopher Stelmach ,  Zhong Zhong

IPC: G21K1/06

CPC classification number: G21K1/06 ,  G21K2201/062 ,  G21K2201/064

Abstract: An x-ray focusing device and method for adjustably focusing x-rays in two orthogonal directions simultaneously. The device and method can be operated remotely using two pairs of orthogonal benders mounted on a rigid, open frame such that x-rays may pass through the opening in the frame. The added x-ray flux allows significantly higher brightness from the same x-ray source.

Abstract translation: 一种用于可同时在两个正交方向上可调整地聚焦X射线的X射线聚焦装置和方法。 该装置和方法可以使用安装在刚性开放框架上的两对正交弯曲器远程操作，使得X射线可以穿过框架中的开口。 添加的X射线通量允许来自相同x射线源的明显更高的亮度。

公开(公告)号：US08121258B2

公开(公告)日：2012-02-21

申请号：US12667464

申请日：2008-07-02

Applicant: Peter Hoghoj ,  Pascal Boulee ,  Paraskevi Ntova ,  Sergio Rodrigues

Inventor： Peter Hoghoj ,  Pascal Boulee ,  Paraskevi Ntova ,  Sergio Rodrigues

IPC: H01J35/10

CPC classification number: H01J35/10 ,  B82Y10/00 ,  G21K2201/061 ,  G21K2201/064 ,  H01J35/14 ,  H01J35/20

Abstract: The invention relates to X-ray analytical instruments (RX), more precisely a device for providing a high energy X-ray beam, typically above 4 keV, for X-ray analysis applications. The device comprises an X-ray tube with a turning anode and an X-ray lens for shaping the beam.

Abstract translation: 本发明涉及X射线分析仪器（RX），更准确地说，一种用于提供通常高于4keV的高能X射线束用于X射线分析应用的装置。 该装置包括具有转向阳极的X射线管和用于使束成形的X射线透镜。

公开(公告)号：US20110317814A1

公开(公告)日：2011-12-29

申请号：US12823503

申请日：2010-06-25

Applicant: BORIS VERMAN

Inventor： BORIS VERMAN

IPC: G21K1/06

CPC classification number: G21K1/062 ,  B82Y10/00 ,  G21K1/04 ,  G21K2201/064 ,  G21K2201/067

Abstract: An x-ray optical system includes a multiple corner optic assembly including an adjustable aperture assembly located in close proximity to the optic assembly. The adjustable aperture assembly enables a user to easily and effectively adjust the convergence of an incident beam of x-rays or the optic focal spot size. The adjustable aperture assembly may further enable a user to condition x-rays of one wavelength and block x-rays of another wavelength and thereby reduce the amount of background radiation exhibited from x-rays of more than one wavelength.

Abstract translation: X射线光学系统包括多角度光学组件，其包括位于光学组件附近的可调节光圈组件。 可调孔径组件使得用户能够容易且有效地调整入射光束的X射线或光焦点尺寸的会聚。 可调整孔径组件还可以使用户能够调节一个波长的x射线并阻挡另一个波长的X射线，从而减少从多于一个波长的X射线显示的背景辐射的量。

公开(公告)号：US20110188636A1

公开(公告)日：2011-08-04

申请号：US12699493

申请日：2010-02-03

Applicant: Boris Verman ,  Michael Young ,  Licai Jiang

Inventor： Boris Verman ,  Michael Young ,  Licai Jiang

IPC: H01J35/04 ,  G21K1/00 ,  H01J35/30 ,  G21K1/02

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067

Abstract: A multi-beam x-ray system includes an x-ray source which emits x-rays and a housing with a first part and a second part. The second part is moveable relative to the first part and includes a plurality of optics of different performance characteristics. Each optic, through the movement of the second part relative to the first part, is positioned to a working position so that the optic receives the x-rays from the x-ray source and directs the x-rays with the desired performance attributes to a desired location.

Abstract translation: 多光束X射线系统包括发射x射线的X射线源和具有第一部分和第二部分的壳体。 第二部分可相对于第一部分移动，并且包括具有不同性能特征的多个光学元件。 每个光学元件通过第二部分相对于第一部分的移动被定位到工作位置，使得光学器件接收来自x射线源的x射线，并将具有所需性能属性的x射线引导到 理想位置。

公开(公告)号：US07986455B2

公开(公告)日：2011-07-26

申请号：US12188603

申请日：2008-08-08

Applicant: Torsten Feigl ,  Nicolas Benoit ,  Sergiy Yulin ,  Nobert Kaiser

Inventor： Torsten Feigl ,  Nicolas Benoit ,  Sergiy Yulin ,  Nobert Kaiser

IPC: F21V9/04 ,  G02B1/10

CPC classification number: G02B5/0891 ,  B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067

Abstract: A multilayer mirror includes a layer sequence arranged on a substrate and a plurality of layer pairs. Each layer pair includes a first layer composed of a first material and a second layer composed of a second material. The first layers and the second layers each have a thickness of more than 2 nm, and the first material or the second material is a silicon boride or a molybdenum nitride.

Abstract translation: 多层反射镜包括布置在基板和多个层对上的层序列。 每个层对包括由第一材料构成的第一层和由第二材料构成的第二层。 第一层和第二层各自具有大于2nm的厚度，并且第一材料或第二材料是硅化硼或氮化钼。

公开(公告)号：US20100061508A1

公开(公告)日：2010-03-11

申请号：US12585283

申请日：2009-09-10

Applicant: Kenji Takahashi

Inventor： Kenji Takahashi

IPC: G01T1/36

CPC classification number: A61B6/4014 ,  A61B6/00 ,  A61B6/032 ,  A61B6/4233 ,  A61B6/466 ,  A61B6/484 ,  G03B42/026 ,  G21K1/06 ,  G21K2201/06 ,  G21K2201/064 ,  G21K2201/067 ,  G21K2207/005

Abstract: A radiation phase image radiographing apparatus, including a radiation emission unit having multiple radiation sources for emitting radiation onto a subject, the radiation sources being distributed such that radiation emitted from each of the radiation sources and transmitted through the subject forms a part of a projected image of the subject, a first diffraction grating configured to be exposed to the radiation emitted from the multiple radiation sources of the radiation emission unit and to produce a Talbot effect by the exposure, a second diffraction grating for diffracting the radiation diffracted by the first diffraction grating, and a radiation image detector for detecting the radiation diffracted by the second diffraction grating.

Abstract translation: 一种辐射相位图像摄影装置，包括具有用于向对象发射辐射的多个辐射源的辐射发射单元，辐射源被分布成使得从每个辐射源发射并透射通过对象的辐射形成投影图像的一部分 被配置为暴露于从辐射发射单元的多个辐射源发射的辐射并且通过曝光产生Talbot效应的第一衍射光栅，用于衍射由第一衍射光栅衍射的辐射的第二衍射光栅 以及用于检测由第二衍射光栅衍射的辐射的放射线图像检测器。

公开(公告)号：US20090161829A1

公开(公告)日：2009-06-25

申请号：US12063334

申请日：2006-07-26

Applicant: Zewu Chen ,  Ning Gao ,  Walter Gibson

Inventor： Zewu Chen ,  Ning Gao ,  Walter Gibson

IPC: G21K1/06

CPC classification number: G01N23/223 ,  B82Y10/00 ,  G01N2223/076 ,  G21K1/06 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064

Abstract: An x-ray system or method for exciting a sample under x-ray analysis, using a curved monochromating optic for directing a monochromatic x-ray beam from an x-ray source towards a first focal area. A second optic is positioned within, and receives, the monochromatic x-ray beam, and directs a focused x-ray beam towards a second focal area on the sample. A detector is positioned near the sample to collect radiation from the sample as a result of the focused x-ray beam. The curved monochromating optic produces a beam spot size at the first focal area larger than a beam spot size produced by the second optic at the second focal area, therefore, a beam spot size on the sample is thereby reduced using the second optic. Doubly-curved monochromating optics, and polycapillary optics, are disclosed as possible implementations of the optics.

Abstract translation: 一种用于在x射线分析下激发样本的X射线系统或方法，使用弯曲单色光学器件将来自x射线源的单色x射线束引导到第一焦点区域。 第二光学器件位于单色X射线束内并且接收单色X射线束，并将聚焦的X射线束引导到样品上的第二焦点区域。 检测器位于样品附近以由于聚焦的X射线束而从样品收集辐射。 弯曲单色光学器件在第一焦点区域处产生大于由第二焦点区域处的第二光学器件产生的光束尺寸的光束尺寸，因此，使用第二光学元件，样品上的光束尺寸因此减小。 公开了双折射单色光学器件和多毛细管光学器件作为光学器件的可能实现。

公开(公告)号：US07366374B1

公开(公告)日：2008-04-29

申请号：US11751844

申请日：2007-05-22

Applicant: Susanne Madeline Lee ,  Forrest Frank Hopkins ,  Peter Michael Edic ,  Joseph John Manak ,  William Eugene Powell, III

Inventor： Susanne Madeline Lee ,  Forrest Frank Hopkins ,  Peter Michael Edic ,  Joseph John Manak ,  William Eugene Powell, III

IPC: G02B6/42

CPC classification number: G21K1/06 ,  G21K2201/064 ,  G21K2201/067

Abstract: An optic device, system and method for imaging are described. The optic device includes a first solid phase layer having a first index of refraction with a first photon transmission property and a second solid phase layer having a second index of refraction with a second photon transmission property, the solid phase layers being situated between an output face and a non-flat input face. The first and second layers are conformal to each other. The imaging system includes a source of electrons and a target, with an array of the optic devices coupled thereto to form limited cone beams of X-ray radiation.

Abstract translation: 描述了用于成像的光学装置，系统和方法。 光学器件包括具有第一光子传输特性的第一折射率的第一固相层和具有第二光子透射特性的第二折射率的第二固相层，固相层位于输出面 和非平面输入面。 第一层和第二层彼此共形。 成像系统包括电子源和靶，其中耦合到其上的光学器件的阵列形成有限的X射线辐射的锥形束。

公开(公告)号：US07280634B2

公开(公告)日：2007-10-09

申请号：US11449208

申请日：2006-06-08

Applicant: Boris Verman ,  Jimpei Harada

Inventor： Boris Verman ,  Jimpei Harada

IPC: G21K1/06

CPC classification number: B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064

Abstract: An x-ray beam conditioning system with a first diffractive element and a second diffractive element. The two diffractive elements are arranged in a sequential configuration, and one of the diffractive elements is a crystal. The other diffractive element may be a multilayer optic.

Abstract translation: 一种具有第一衍射元件和第二衍射元件的X射线束调节系统。 两个衍射元件按顺序配置，其中一个衍射元件是晶体。 另一个衍射元件可以是多层光学元件。