公开(公告)号：WO2019197117A1

公开(公告)日：2019-10-17

申请号：PCT/EP2019/056776

申请日：2019-03-19

Applicant: STICHTING VU ,  STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN ,  UNIVERSITEIT VAN AMSTERDAM ,  ASML NETHERLANDS B.V.

Inventor： DE BOER, Johannes, Fitzgerald ,  TENNER, Vasco, Tomas ,  MESSINIS, Christos ,  DEN BOEF, Arie, Jeffrey

IPC: G03F7/20

Abstract: Methods and apparatus are disclosed for determining a characteristic of a structure. In one arrangement, the structure is illuminated with first illumination radiation to generate first scattered radiation. A first interference pattern is formed by interference between a portion of the first scattered radiation reaching a sensor and first reference radiation. The structure is also illuminated with second illumination radiation from a different direction. A second interference pattern is formed using second reference radiation. The first and second interference patterns are used to determine the characteristic of the structure. Azimuthal angles of the first and second reference radiations onto the sensor are different.

公开(公告)号：WO2019166190A1

公开(公告)日：2019-09-06

申请号：PCT/EP2019/052658

申请日：2019-02-04

Applicant: STICHTING VU ,  STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN ,  UNIVERSITEIT VAN AMSTERDAM ,  ASML NETHERLANDS B.V.

Inventor： TINNEMANS, Patricius, Aloysius, Jacobus ,  TENNER, Vasco, Tomas ,  DEN BOEF, Arie, Jeffrey ,  CRAMER, Hugo, Augustinus, Joseph ,  WARNAAR, Patrick ,  GRZELA, Grzegorz ,  JAK, Martin, Jacobus, Johan

IPC: G02B27/42 ,  G03F7/20 ,  G03H1/04 ,  G03H1/00

Abstract: Disclosed is a method and associated apparatus for measuring a characteristic of interest relating to a structure on a substrate. The method comprises calculating a value for the characteristic of interest directly from the effect of the characteristic of interest on at least the phase of illuminating radiation when scattered by the structure, subsequent to illuminating said structure with said illuminating radiation.

公开(公告)号：WO2019151864A1

公开(公告)日：2019-08-08

申请号：PCT/NL2019/050071

申请日：2019-02-05

Applicant: LUMICKS TECHNOLOGIES B.V. ,  STICHTING VU

Inventor： HELLER, Iddo ,  MEIJERING, Anna Elisabeth Christina ,  WUITE, Gijs Jan Lodewigjk ,  PETERMAN, Erwin Johannes Gerard ,  BIEBRICHER, Andreas Sebastian

IPC: G01N33/58

Abstract: One aspect of this disclosure relates to a method for determining a presence of at least one guest structure at a host structure. The method comprises a light-sensitive system receiving light from the host structure. The host structure hosts one or more optically active entities at at least one part of the host structure. Herein, the at least one part does not host the at least one guest structure. Furthermore, the optically active entities cause light emission from said at least one part. The method also comprises the light-sensitive system outputting a signal based on the received light. The method further comprises determining a light value based on the output signal. The light value indicates an amount of light from the host structure being incident on the light- sensitive system. The method also comprises determining on the basis of the light value at least one of a quantity and a position of the at least one guest structure at the host structure.

公开(公告)号：WO2019068459A1

公开(公告)日：2019-04-11

申请号：PCT/EP2018/075239

申请日：2018-09-18

Applicant: STICHTING VU ,  STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN ,  UNIVERSITEIT VAN AMSTERDAM ,  ASML NETHERLANDS B.V.

Inventor： TINNEMANS, Patricius, Aloysius, Jacobus ,  DEN BOEF, Arie, Jeffrey ,  KOOLEN, Armand, Eugene, Albert ,  PANDEY, Nitesh ,  TENNER, Vasco, Tomas ,  COENE, Willem, Marie, Julia, Marcel ,  WARNAAR, Patrick

IPC: G01B11/24 ,  G03F7/20

Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.

公开(公告)号：WO2018219585A1

公开(公告)日：2018-12-06

申请号：PCT/EP2018/061338

申请日：2018-05-03

Applicant: STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN ,  STICHTING VU ,  UNIVERSITEIT VAN AMSTERDAM ,  ASML NETHERLANDS B.V.

Inventor： WITTE, Stefan, Michiel ,  JANSEN, Gijsbert, Simon, Matthijs ,  FREISEM, Lars, Christian ,  EIKEMA, Kjeld, Sijbrand, Eduard ,  MATHIJSSEN, Simon, Gijsbert, Josephus

IPC: G03F7/20 ,  G01J9/00

Abstract: A metrology apparatus (302) includes a higher harmonic generation (HHG) radiation source for generating (310) EUV radiation. Operation of the HHG source is monitored using a wavefront sensor (420) which comprises an aperture array (424, 702) and an image sensor (426). A grating (706) disperses the radiation passing through each aperture so that the image detector captures positions and intensities of higher diffraction orders for different spectral components and different locations across the beam. In this way, the wavefront sensor can be arranged to measure a wavefront tilt for multiple harmonics at each location in said array. In one embodiment, the apertures are divided into two subsets (A) and (B), the gratings (706) of each subset having a different direction of dispersion. The spectrally resolved wavefront information (430) is used in feedback control (432) to stabilize operation of the HGG source, and/or to improve accuracy of metrology results.

公开(公告)号：WO2017076694A1

公开(公告)日：2017-05-11

申请号：PCT/EP2016/075671

申请日：2016-10-25

Applicant: STICHTING VOOR FUNDAMENTEEL ONDERZOEK DER MATERIE ,  UNIVERSITEIT VAN AMSTERDAM ,  STICHTING VU ,  ASML NETHERLANDS B.V.

Inventor： SAEDI, Amirmehdi ,  FRENKEN, Joost, Wilhelmus, Maria ,  SFILIGOJ, Cristina ,  VERHOEVEN, Jan

IPC: G03F7/20 ,  G03F1/24 ,  G02B5/08 ,  G21K1/06

CPC classification number: G03F7/70316 ,  G02B5/0875 ,  G02B5/0891 ,  G03F1/24 ,  G03F1/52 ,  G03F7/70958 ,  G21K1/062

Abstract: A multilayer reflector for use in EUV lithography, for example, comprises alternating layers of Mo and Rb x Si y . The Rb x Si y and Mo interface is thermodynamically stable, reducing intermingling of the layers and preventing reduction in reflectivity. The Rb x Si y layer can be hydrogenated to form RbSiH 3 . For the case of Mo/RbSiH 3 an interlayer of RbH between Mo and RbSiH 3 layers can be used. An Mo/RbH multilayer mirror is also useful.

Abstract translation: 例如，用于EUV光刻的多层反射器包括Mo和Rb _{x y 的交替层。 Rb Si 和Mo界面是热力学稳定的，减少了层间的混合并防止了反射率的降低。 Rb x y 层可以被氢化以形成RbSiH 3 。 对于Mo / RbSiH 3/3的情况，可以使用Mo和RbSiH 3层之间的RbH中间层。 Mo / RbH多层镜也很有用。}

公开(公告)号：WO2015165779A2

公开(公告)日：2015-11-05

申请号：PCT/EP2015/058614

申请日：2015-04-21

Applicant: STICHTING VU-VUMC ,  UNIVERSIDAD DE GRANADA

Inventor： PEGTEL, Dirk Michiel ,  KOPPERS-LALIC, Danijela ,  WURDINGER, Tom ,  BIJNSDORP, Irene ,  HACKENBERG, Michael

IPC: C12Q1/68

CPC classification number: C12Q1/6886 ,  A61K31/166 ,  A61K31/475 ,  A61K31/573 ,  A61K31/675 ,  A61K31/704 ,  A61K31/7048 ,  A61K35/545 ,  A61K38/14 ,  C12Q1/6809 ,  C12Q2600/118 ,  C12Q2600/178 ,  C12Q2525/207 ,  C12Q2535/122 ,  C12Q2537/165 ,  C12Q2545/101

Abstract: The present disclosure provides small ncRNAs as biomarkers for classifying the health status of an individual. The disclosure also provides screening methods for identifying ncRNA biomarkers.

Abstract translation: 本公开提供小的ncRNA作为用于分类个体的健康状况的生物标志物。 本公开还提供用于鉴定ncRNA生物标志物的筛选方法。

公开(公告)号：WO2014098593A1

公开(公告)日：2014-06-26

申请号：PCT/NL2013050925

申请日：2013-12-19

Applicant: STICHTING TECH WETENSCHAPP ,  STICHTING VU VUMC ,  UNIV GRONINGEN ,  GRONINGEN ACAD ZIEKENHUIS

Inventor： RAAPHORST RENSKE ,  LUURTSEMA GERT ,  WINDHORST ALBERT DIRK ,  LAMMERTSMA ADRIAAN

IPC: A61K51/04 ,  A61K31/277 ,  C07B59/00

CPC classification number: A61K31/277 ,  A61K51/04 ,  C07B59/001

Abstract: The invention is directed to a compound, a salt or a solvate thereof according to (I) wherein R1 is an optionally branched fluoroalkyl group or [18F]fluoroalkyl group, R2, R3, R4 and R5 are eacn independently a methyl, [3H]methyl, fluoroalkyl or [18F]fluoroalkyl group, and R6 is a (R)-cyano group or a (S)-cyano group; or wherein R1 is a methyl group, and R3 is a R3 is a fluoroalkyl group or a [18F]fluoroalkyl group, R2, R4 and R5 are each independently a methyl, [3H]methyl, fluoroalkyl or [18F]fluoroalkyl group, and R6 is a (R)-cyano group or a (S)-cyano group; or wherein if R1 is hydrogen, at least one of R2, R3, R4 is an optionally branched fluoroalkyl group or [18F]fluoroalkyl group.

Abstract translation: 本发明涉及根据（I）的化合物，其盐或溶剂合物，其中R 1是任选支链的氟代烷基或[18 F]氟代烷基，R 2，R 3，R 4和R 5独立地是甲基，[3 H] 甲基，氟代烷基或[18 F]氟烷基，R 6为（R） - 氰基或（S） - 氰基; 或其中R 1为甲基，R 3为R 3为氟烷基或[18 F]氟代烷基，R 2，R 4和R 5各自独立地为甲基，[3 H]甲基，氟代烷基或[18 F]氟代烷基，和 R6是（R） - 氰基或（S） - 氰基; 或其中如果R 1是氢，则R 2，R 3，R 4中的至少一个是任选支链的氟代烷基或[18 F]氟代烷基。

公开(公告)号：WO2013151440A3

公开(公告)日：2014-01-09

申请号：PCT/NL2013050256

申请日：2013-04-05

Applicant: STICHTING VU VUMC

Inventor： VAN STRAALEN NICOLAAS MARIA ,  ROELOFS THEODORUS FRANK MARIA

IPC: C12Q1/68

CPC classification number: C12Q1/689 ,  C12Q2600/142 ,  C12Q2600/158

Abstract: A method for determining toxicity of a sample, particularly a soil sample suspected of containing polycyclic aromatic hydrocarbon pollutants, is provided. The method allows for quantification of toxicity levels based on gene expression profiling of a test organism, for example Folsomia candida,exposed to the sample.

Abstract translation: 提供了一种确定样品毒性的方法，特别是怀疑含有多环芳烃污染物的土壤样品。 该方法允许基于暴露于样品的测试生物（例如，假丝酵母​​菌）的基因表达谱来定量毒性水平。

公开(公告)号：WO2013070079A8

公开(公告)日：2013-10-24

申请号：PCT/NL2012050793

申请日：2012-11-09

Applicant: VERENIGING VOOR CHRISTELIJK HOGER ONDERWIJS WETENSCHAPPELIJK ONDERZOEK EN PATIENTENZORG ,  STICHTING VU VUMC

Inventor： REIJERKERK ARIE ,  DE VRIES HELGA EVELINE

IPC: C12Q1/68

CPC classification number: C12Q1/6809 ,  C12Q2600/178

Abstract: The blood-brain barrier (BBB) separates the blood and the central nervous system (CNS). Here it is disclosed that blood-brain barrier function can be increased with particular nucleic acid sequences, in particular in patients suffering from or diagnosed with Multiple Sclerosis. The use of compounds comprising such nucleic acid sequences for increasing blood-brain barrier function is described.

Abstract translation: 血脑屏障（BBB）分离血液和中枢神经系统（CNS）。 这里公开了可以使用特定的核酸序列，特别是患有或诊断为多发性硬化症的患者来增加血脑屏障功能。 描述了包含这种核酸序列的化合物用于增加血脑屏障功能的用途。